KR890007395A - 방 진 막 - Google Patents

방 진 막 Download PDF

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Publication number
KR890007395A
KR890007395A KR1019880013854A KR880013854A KR890007395A KR 890007395 A KR890007395 A KR 890007395A KR 1019880013854 A KR1019880013854 A KR 1019880013854A KR 880013854 A KR880013854 A KR 880013854A KR 890007395 A KR890007395 A KR 890007395A
Authority
KR
South Korea
Prior art keywords
dustproof membrane
film
cellulose
average molecular
propionic acid
Prior art date
Application number
KR1019880013854A
Other languages
English (en)
Other versions
KR910009610B1 (ko
Inventor
무네유끼 마쓰모도
히로아끼 나까가와
Original Assignee
다께바야시 쇼오고
미쓰이 세끼유 가가꾸 고오교오 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP26988887A external-priority patent/JPH0798869B2/ja
Priority claimed from JP62290882A external-priority patent/JPH01133052A/ja
Application filed by 다께바야시 쇼오고, 미쓰이 세끼유 가가꾸 고오교오 가부시끼가이샤 filed Critical 다께바야시 쇼오고
Publication of KR890007395A publication Critical patent/KR890007395A/ko
Application granted granted Critical
Publication of KR910009610B1 publication Critical patent/KR910009610B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Inorganic Insulating Materials (AREA)
  • Fluid-Damping Devices (AREA)

Abstract

내용 없음

Description

방진막
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 셀루로오즈 에스텔 박막의 제조방법에 사용하는 장치의 사시도.

Claims (5)

  1. 폴리스틸렌 표준에 의한 중량 평균 분자량이 60,000-400,000의 프로피온산 셀루로오즈로 된 방진막.
  2. 막두께가 2.85μm인 청구의 범위 제1항 기재의 방진막.
  3. 셀루로오즈 에스텔류로 되고, 파장 365nm 및 436nm의 광의 투과율이 다 같이 98% 이상인 것을 특징으로 하고 있는 방진막.
  4. 상기 셀루로오즈 에스텔이 폴리스틸렌 표준에 의한 중량 평균 분자량이 60,000-400,000의 프로피온산 셀루로오즈인 것을 특징으로 하는 청구의 범위 제3항 기재의 방진막.
  5. 막두께가 1.45-1.48μm, 2.18-2.21μm, 2.92-2.95μm, 3.65-3.68μm, 4.39-4.41μm중 어느 범위에 속하는 것이 특징인 청구의 범위 제3항 기재의 방진막.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019880013854A 1987-10-26 1988-10-24 방진막 KR910009610B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP62-269888 1987-10-26
JP?62-269888 1987-10-26
JP26988887A JPH0798869B2 (ja) 1987-10-26 1987-10-26 フォトマスク保護用防塵膜
JP62290882A JPH01133052A (ja) 1987-11-18 1987-11-18 防塵膜
JP?62-290882 1987-11-18
JP62-290882 1987-11-18

Publications (2)

Publication Number Publication Date
KR890007395A true KR890007395A (ko) 1989-06-19
KR910009610B1 KR910009610B1 (ko) 1991-11-23

Family

ID=26548963

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880013854A KR910009610B1 (ko) 1987-10-26 1988-10-24 방진막

Country Status (10)

Country Link
US (1) US5028702A (ko)
EP (1) EP0314418B1 (ko)
KR (1) KR910009610B1 (ko)
AT (1) ATE171550T1 (ko)
CA (1) CA1330860C (ko)
DE (1) DE3856253T2 (ko)
ES (1) ES2124686T3 (ko)
HK (1) HK1003950A1 (ko)
MY (1) MY103629A (ko)
SG (1) SG47433A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5339197A (en) * 1989-03-31 1994-08-16 Yen Yung Tsai Optical pellicle with controlled transmission peaking
DE69327286T2 (de) * 1992-09-24 2000-05-11 Daicel Chem Verfahren zur Herstellung eines Fettsäureesters von Cellulose
US5741576A (en) * 1995-09-06 1998-04-21 Inko Industrial Corporation Optical pellicle with controlled transmission peaks and anti-reflective coatings

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1119873A (en) * 1976-10-22 1982-03-16 Scott Paper Company Diazo composition containing an azo coupling component precursor, a light sensitive acid progenitor and a carboxylic anhydride
US4756007A (en) * 1984-03-08 1988-07-05 Codex Corporation Adaptive communication rate modem
GB2165545B (en) * 1984-10-16 1988-03-30 Du Pont Pellicle structure for transmission of mid ultraviolet light
JPS61130346A (ja) * 1984-11-28 1986-06-18 Daicel Chem Ind Ltd 樹脂薄膜
JPS6235359A (ja) * 1985-08-09 1987-02-16 Daicel Chem Ind Ltd コ−テツド薄膜の製造法
DE3750353T2 (de) * 1986-06-12 1994-12-08 Mitsui Petrochemical Ind Verfahren zur Herstellung von Celluloseesterfolien.

Also Published As

Publication number Publication date
DE3856253T2 (de) 1999-04-08
ATE171550T1 (de) 1998-10-15
US5028702A (en) 1991-07-02
DE3856253D1 (de) 1998-10-29
CA1330860C (en) 1994-07-26
HK1003950A1 (en) 1998-11-13
MY103629A (en) 1993-08-28
ES2124686T3 (es) 1999-02-16
KR910009610B1 (ko) 1991-11-23
EP0314418B1 (en) 1998-09-23
EP0314418A3 (en) 1991-01-30
SG47433A1 (en) 1998-04-17
EP0314418A2 (en) 1989-05-03

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