KR910005329A - 수용액 중에서 현상가능한 감광성 구리 전도체 조성물 - Google Patents

수용액 중에서 현상가능한 감광성 구리 전도체 조성물 Download PDF

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Publication number
KR910005329A
KR910005329A KR1019900012796A KR900012796A KR910005329A KR 910005329 A KR910005329 A KR 910005329A KR 1019900012796 A KR1019900012796 A KR 1019900012796A KR 900012796 A KR900012796 A KR 900012796A KR 910005329 A KR910005329 A KR 910005329A
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South Korea
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weight
composition
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organic
organic polymer
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KR1019900012796A
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존 네브 윌리엄
제리 오스본 제임스
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제임스 제이. 플린
이.아이.듀우판 드 네모아 앤드 캄파니
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Publication of KR910005329A publication Critical patent/KR910005329A/ko

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0047Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/111Polymer of unsaturated acid or ester
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/118Initiator containing with inhibitor or stabilizer

Abstract

내용 없음

Description

수용액 중에서 현상가능한 감광성 구리 전도체 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (9)

  1. (a)중량대 표면적인 비가 20㎡/g 이하이고, 입자의 80중량% 이상이 0.5 내지 10㎛의 입도를 갖는 미분구리 입자 및 (b)유리 전이 온도가 550 내지 825℃이고, 중량 대 표면적의 비가 10㎡/g이하이며, 입자의 90중량%이상이 1 내지 10㎛의 입도를 가지고, 상기 (a)성분에 대한 (b)의 중량비가 0.0001 내지 0.25이며, (i)유기 중합체 결합체, (ii)광개시제계, (ⅲ)광경화성 모너머 및 (ⅳ)유기 매질로 이루어진 유기 비히클 중에 분산된 무기 결합제의 미분 입자의 혼합물로 이루어지며, 상기 유기 중합체 결합제는 (1)C1-10알킬 아크릴레이트 또는 C1-10알킬 메타크릴레이트, 스티렌, 치환 스티렌 또는 이들의 혼합물로 이루어진 비산계 코모노머 및 (2)에틸렌계 불포화 카르복실산으로 이루어진 산계 코모노모로 이루어진 공중합체 또는 이원 공중합체로서, 다만, 산계 고모노머가 중합체의 15중량% 이상을 구성하고, 유기 중합체 결합체는 50,000이하의 분자량을 가지며, 상기 조성물을 화학선에 화상 방향으로 노출시킨 후 0.8중량%의 탄산 나트륨을 함유하는 수용액 중에서 현상가능함을 특징으로 하는, 실질적인 비산화성 분위기 하에서 연소 가능한 수용액에서 현상가능한 개선된 감광성 구리 전도체 조성물.
  2. 제1항에 있어서, 상기 유기 중합체 결합제가 메틸메타크릴레이트의 공중합체인 것이 특징인 조성물.
  3. 제1항에 있어서, 산계 코모노머가 결합제의 30중량% 이하를 구성하는 것이 특징인 조성물.
  4. 제3항에 있어서, 유기 중합체 결합제의 분자량이 25,000이하인 것이 특징인 조성물.
  5. 제4항에 있어서, 상기 분자량이 15,000 이하인 것이 특징인 조성물.
  6. 제1항에 있어서, 상기 유기 매질이 부틸 카르비톨 아세테이트인 것이 특징인 조성물.
  7. 제1항에 있어서, 상기 유기 매질이 분산제를 함유하는 것이 특징인 조성물.
  8. (a)중량 대 표면적의 비가 20㎡/g 이하이고, 입자의 80중량% 이상이 0.5 내지 10㎛의 입도를 갖는 미분 구리 입자 및 (b)유리 전이 온도가 550 내지 825℃이고, 중량 대 표면적의 비가 10㎡/g이하이며, 입자의 90중량%이상이 1 내지 10㎛의 입도를 가지고, 상기 (a)성분에 대한 (b)의 중량비가 0.0001 내지 0.25이고, (i)유기 중합체 결합제, (ⅱ)광개시제계, (ⅲ)광경화성 단량체 및 (ⅳ)유기 매질로 이루어진 유기 비히클 중에 분산된 무기 결합제의 미분 입자의 혼합물로 이루어지며, 상기 유기 중합체 결합제는 (1)C1-10알킬 아크릴레이트 또는 C1-10알킬메타크릴레이트, 스티렌, 치환 스티렌 또는 이들의 혼합물로 이루어진 비산계 코모노머 및 (2)에틸렌계 불포화 카르복실산으로 이루어진 산계 코모너머로 이루어진 공중합체 또는 이원 공중합체로서, 다만, 산계 고모노머가 중합체의 15중량% 이상을 구성하고, 유기 중합체 결합제는 50,000 이하의 분자량을 가지며, 상기 조성물을 화학선에 화상 방향에서 노출시킨 다음, 0.8중량%의 탄산 나트륨을 함유하는 수용액 중에서 현상가능하고, 또한 상기 성분들을 혼합시키기 전에 상기 성분(b)인 무기 결합제의 미분 입자를 동결 건조시킴을 특징으로 하는 실질적인 비산화성 분위기하에서 연소가능하고 수용액에서 현상가능한 감광성 구리 전도체 조성물을 제조하는 방법.
  9. 제8항에 있어서, 상기 유기 매질이 분산제를 함유하는 것이 특징인 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900012796A 1989-08-21 1990-08-20 수용액 중에서 현상가능한 감광성 구리 전도체 조성물 KR910005329A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/397,153 US5032490A (en) 1989-08-21 1989-08-21 Photosensitive aqueous developable copper conductor composition
US397,153 1989-08-21

Publications (1)

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KR910005329A true KR910005329A (ko) 1991-03-30

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Country Link
US (1) US5032490A (ko)
EP (1) EP0414167B1 (ko)
JP (1) JPH0619925B2 (ko)
KR (1) KR910005329A (ko)
CN (1) CN1050447A (ko)
AT (1) ATE121551T1 (ko)
CA (1) CA2023628A1 (ko)
DE (1) DE69018733T2 (ko)

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Publication number Publication date
DE69018733T2 (de) 1995-11-09
CA2023628A1 (en) 1991-02-22
EP0414167A3 (en) 1991-04-24
JPH03210703A (ja) 1991-09-13
ATE121551T1 (de) 1995-05-15
EP0414167A2 (en) 1991-02-27
US5032490A (en) 1991-07-16
JPH0619925B2 (ja) 1994-03-16
EP0414167B1 (en) 1995-04-19
DE69018733D1 (de) 1995-05-24
CN1050447A (zh) 1991-04-03

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