KR910005329A - 수용액 중에서 현상가능한 감광성 구리 전도체 조성물 - Google Patents
수용액 중에서 현상가능한 감광성 구리 전도체 조성물 Download PDFInfo
- Publication number
- KR910005329A KR910005329A KR1019900012796A KR900012796A KR910005329A KR 910005329 A KR910005329 A KR 910005329A KR 1019900012796 A KR1019900012796 A KR 1019900012796A KR 900012796 A KR900012796 A KR 900012796A KR 910005329 A KR910005329 A KR 910005329A
- Authority
- KR
- South Korea
- Prior art keywords
- weight
- composition
- less
- organic
- organic polymer
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/118—Initiator containing with inhibitor or stabilizer
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (9)
- (a)중량대 표면적인 비가 20㎡/g 이하이고, 입자의 80중량% 이상이 0.5 내지 10㎛의 입도를 갖는 미분구리 입자 및 (b)유리 전이 온도가 550 내지 825℃이고, 중량 대 표면적의 비가 10㎡/g이하이며, 입자의 90중량%이상이 1 내지 10㎛의 입도를 가지고, 상기 (a)성분에 대한 (b)의 중량비가 0.0001 내지 0.25이며, (i)유기 중합체 결합체, (ii)광개시제계, (ⅲ)광경화성 모너머 및 (ⅳ)유기 매질로 이루어진 유기 비히클 중에 분산된 무기 결합제의 미분 입자의 혼합물로 이루어지며, 상기 유기 중합체 결합제는 (1)C1-10알킬 아크릴레이트 또는 C1-10알킬 메타크릴레이트, 스티렌, 치환 스티렌 또는 이들의 혼합물로 이루어진 비산계 코모노머 및 (2)에틸렌계 불포화 카르복실산으로 이루어진 산계 코모노모로 이루어진 공중합체 또는 이원 공중합체로서, 다만, 산계 고모노머가 중합체의 15중량% 이상을 구성하고, 유기 중합체 결합체는 50,000이하의 분자량을 가지며, 상기 조성물을 화학선에 화상 방향으로 노출시킨 후 0.8중량%의 탄산 나트륨을 함유하는 수용액 중에서 현상가능함을 특징으로 하는, 실질적인 비산화성 분위기 하에서 연소 가능한 수용액에서 현상가능한 개선된 감광성 구리 전도체 조성물.
- 제1항에 있어서, 상기 유기 중합체 결합제가 메틸메타크릴레이트의 공중합체인 것이 특징인 조성물.
- 제1항에 있어서, 산계 코모노머가 결합제의 30중량% 이하를 구성하는 것이 특징인 조성물.
- 제3항에 있어서, 유기 중합체 결합제의 분자량이 25,000이하인 것이 특징인 조성물.
- 제4항에 있어서, 상기 분자량이 15,000 이하인 것이 특징인 조성물.
- 제1항에 있어서, 상기 유기 매질이 부틸 카르비톨 아세테이트인 것이 특징인 조성물.
- 제1항에 있어서, 상기 유기 매질이 분산제를 함유하는 것이 특징인 조성물.
- (a)중량 대 표면적의 비가 20㎡/g 이하이고, 입자의 80중량% 이상이 0.5 내지 10㎛의 입도를 갖는 미분 구리 입자 및 (b)유리 전이 온도가 550 내지 825℃이고, 중량 대 표면적의 비가 10㎡/g이하이며, 입자의 90중량%이상이 1 내지 10㎛의 입도를 가지고, 상기 (a)성분에 대한 (b)의 중량비가 0.0001 내지 0.25이고, (i)유기 중합체 결합제, (ⅱ)광개시제계, (ⅲ)광경화성 단량체 및 (ⅳ)유기 매질로 이루어진 유기 비히클 중에 분산된 무기 결합제의 미분 입자의 혼합물로 이루어지며, 상기 유기 중합체 결합제는 (1)C1-10알킬 아크릴레이트 또는 C1-10알킬메타크릴레이트, 스티렌, 치환 스티렌 또는 이들의 혼합물로 이루어진 비산계 코모노머 및 (2)에틸렌계 불포화 카르복실산으로 이루어진 산계 코모너머로 이루어진 공중합체 또는 이원 공중합체로서, 다만, 산계 고모노머가 중합체의 15중량% 이상을 구성하고, 유기 중합체 결합제는 50,000 이하의 분자량을 가지며, 상기 조성물을 화학선에 화상 방향에서 노출시킨 다음, 0.8중량%의 탄산 나트륨을 함유하는 수용액 중에서 현상가능하고, 또한 상기 성분들을 혼합시키기 전에 상기 성분(b)인 무기 결합제의 미분 입자를 동결 건조시킴을 특징으로 하는 실질적인 비산화성 분위기하에서 연소가능하고 수용액에서 현상가능한 감광성 구리 전도체 조성물을 제조하는 방법.
- 제8항에 있어서, 상기 유기 매질이 분산제를 함유하는 것이 특징인 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/397,153 US5032490A (en) | 1989-08-21 | 1989-08-21 | Photosensitive aqueous developable copper conductor composition |
US397,153 | 1989-08-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR910005329A true KR910005329A (ko) | 1991-03-30 |
Family
ID=23570043
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019900012796A KR910005329A (ko) | 1989-08-21 | 1990-08-20 | 수용액 중에서 현상가능한 감광성 구리 전도체 조성물 |
Country Status (8)
Country | Link |
---|---|
US (1) | US5032490A (ko) |
EP (1) | EP0414167B1 (ko) |
JP (1) | JPH0619925B2 (ko) |
KR (1) | KR910005329A (ko) |
CN (1) | CN1050447A (ko) |
AT (1) | ATE121551T1 (ko) |
CA (1) | CA2023628A1 (ko) |
DE (1) | DE69018733T2 (ko) |
Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3239847B2 (ja) * | 1994-11-17 | 2001-12-17 | 東レ株式会社 | 感光性導電ペーストおよび電極の製造方法 |
TW367504B (en) * | 1996-05-21 | 1999-08-21 | Du Pont | Photosensitive aqueous developable thick film composition employing vinylpyrrolidone polymer |
US5851732A (en) * | 1997-03-06 | 1998-12-22 | E. I. Du Pont De Nemours And Company | Plasma display panel device fabrication utilizing black electrode between substrate and conductor electrode |
WO1998043268A1 (en) * | 1997-03-25 | 1998-10-01 | E.I. Du Pont De Nemours And Company | Field emitter cathode backplate structures for display panels |
JP4050370B2 (ja) * | 1998-01-07 | 2008-02-20 | 株式会社Kri | 無機質含有感光性樹脂組成物および無機パターン形成方法 |
US6360562B1 (en) | 1998-02-24 | 2002-03-26 | Superior Micropowders Llc | Methods for producing glass powders |
US6569602B1 (en) | 1998-10-05 | 2003-05-27 | E. I. Du Pont De Nemours And Company | Ionization radiation imageable photopolymer compositions |
DE69910335T2 (de) | 1998-12-11 | 2004-07-01 | E.I. Du Pont De Nemours And Co., Wilmington | Zusammensetzung für ein Silber enthaltendes, lichtempfindliches, leitendes Band und das damit behandelte Band |
US20060208621A1 (en) * | 1999-09-21 | 2006-09-21 | Amey Daniel I Jr | Field emitter cathode backplate structures for display panels |
US7265161B2 (en) * | 2002-10-02 | 2007-09-04 | 3M Innovative Properties Company | Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
US7005229B2 (en) * | 2002-10-02 | 2006-02-28 | 3M Innovative Properties Company | Multiphoton photosensitization method |
US7381516B2 (en) * | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
US7052824B2 (en) * | 2000-06-30 | 2006-05-30 | E. I. Du Pont De Nemours And Company | Process for thick film circuit patterning |
JP2002296777A (ja) * | 2001-03-29 | 2002-10-09 | Tamura Kaken Co Ltd | 感光性樹脂組成物 |
US6599681B2 (en) | 2001-07-13 | 2003-07-29 | Shielding Express | Electromagnetic filter for display screens |
US6994948B2 (en) | 2001-10-12 | 2006-02-07 | E.I. Du Pont De Nemours And Company, Inc. | Aqueous developable photoimageable thick film compositions |
US6762009B2 (en) * | 2001-10-12 | 2004-07-13 | E. I. Du Pont De Nemours And Company | Aqueous developable photoimageable thick film compositions with photospeed enhancer |
US7232650B2 (en) * | 2002-10-02 | 2007-06-19 | 3M Innovative Properties Company | Planar inorganic device |
JP3975932B2 (ja) * | 2003-02-12 | 2007-09-12 | 株式会社村田製作所 | 光反応性樹脂組成物、回路基板の製造方法、およびセラミック多層基板の製造方法 |
US7303854B2 (en) * | 2003-02-14 | 2007-12-04 | E.I. Du Pont De Nemours And Company | Electrode-forming composition for field emission type of display device, and method using such a composition |
US20050037278A1 (en) * | 2003-08-15 | 2005-02-17 | Jun Koishikawa | Photosensitive thick-film paste materials for forming light-transmitting electromagnetic shields, light-transmitting electromagnetic shields formed using the same, and method of manufacture thereof |
US7294449B1 (en) | 2003-12-31 | 2007-11-13 | Kovio, Inc. | Radiation patternable functional materials, methods of their use, and structures formed therefrom |
KR100611446B1 (ko) * | 2004-05-18 | 2006-08-10 | 제일모직주식회사 | 수성 현상가능한 감광성 코팅액 조성물의 제조방법 |
US7381353B2 (en) * | 2005-03-09 | 2008-06-03 | E.I. Du Pont De Nemours And Company | Black conductive thick film compositions, black electrodes, and methods of forming thereof |
US7326370B2 (en) * | 2005-03-09 | 2008-02-05 | E. I. Du Pont De Nemours And Company | Black conductive thick film compositions, black electrodes, and methods of forming thereof |
US7384577B2 (en) * | 2005-03-09 | 2008-06-10 | E.I. Du Pont De Nemours And Company | Black conductive thick film compositions, black electrodes, and methods of forming thereof |
US20070238036A1 (en) * | 2006-03-22 | 2007-10-11 | Keiichiro Hayakawa | Dielectric, display equipped with dielectric, and method for manufacturing said dielectric |
US7678457B2 (en) * | 2006-03-23 | 2010-03-16 | E.I. Du Pont De Nemours And Company | Dielectric and display device having a dielectric and dielectric manufacturing method |
US7678296B2 (en) * | 2006-05-04 | 2010-03-16 | E. I. Du Pont De Nemours And Company | Black conductive thick film compositions, black electrodes, and methods of forming thereof |
US7655864B2 (en) * | 2006-07-13 | 2010-02-02 | E.I Du Pont De Nemours And Company | Photosensitive conductive paste for electrode formation and electrode |
US7608784B2 (en) * | 2006-07-13 | 2009-10-27 | E. I. Du Pont De Nemours And Company | Photosensitive conductive paste for electrode formation and electrode |
US7749321B2 (en) * | 2007-06-28 | 2010-07-06 | E. I. Du Pont De Nemours And Company | Black pigment compositions, thick film black pigment compositions, conductive single layer thick film compositions, and black and conductive electrodes formed therefrom |
JP5303127B2 (ja) * | 2007-08-03 | 2013-10-02 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 黒色バス電極用導電組成物およびプラズマディスプレイパネルの前面板 |
US20090039781A1 (en) * | 2007-08-08 | 2009-02-12 | E. I. Dupont De Nemours And Company | Electrode paste for plasma display panel and black bus electrode for plasma display panel |
US7648655B2 (en) * | 2007-10-30 | 2010-01-19 | E. I. Du Pont De Nemours And Company | Conductive composition for black bus electrode, and front panel of plasma display panel |
US8193707B2 (en) * | 2007-11-06 | 2012-06-05 | E. I. Du Pont De Nemours And Company | Conductive composition for black bus electrode, and front panel of plasma display panel |
US7887992B2 (en) | 2008-12-23 | 2011-02-15 | E. I. Du Pont De Nemours And Company | Photosensitive paste and process for production of pattern using the same |
US20100167032A1 (en) | 2008-12-29 | 2010-07-01 | E.I.Du Pont De Nemours And Company | Front electrode for pdp |
US8753160B2 (en) | 2011-01-14 | 2014-06-17 | E. I. Du Pont De Nemours And Company | Method for forming front electrode of PDP |
US8647815B1 (en) | 2012-07-26 | 2014-02-11 | E I Du Pont De Nemours And Company | Method of manufacturing copper electrode |
US9480166B2 (en) | 2013-04-16 | 2016-10-25 | E I Du Pont De Nemours And Company | Method of manufacturing non-firing type electrode |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3443944A (en) * | 1963-10-23 | 1969-05-13 | United Aircraft Corp | Method of depositing conductive patterns on a substrate |
US3833384A (en) * | 1972-04-26 | 1974-09-03 | Eastman Kodak Co | Photopolymerizable compositions and elements and uses thereof |
US3923504A (en) * | 1973-01-29 | 1975-12-02 | Xerox Corp | Migration imaging member and method |
US4032698A (en) * | 1973-02-02 | 1977-06-28 | E. I. Du Pont De Nemours And Company | Polymeric materials with substituted urea end groups |
US3958996A (en) * | 1973-05-07 | 1976-05-25 | E. I. Du Pont De Nemours And Company | Photopolymerizable paste composition |
US4239849A (en) * | 1978-06-19 | 1980-12-16 | Dynachem Corporation | Polymers for aqueous processed photoresists |
JPH0642073B2 (ja) * | 1984-04-10 | 1994-06-01 | 三菱レイヨン株式会社 | 光重合性樹脂組成物 |
US4598037A (en) * | 1984-12-21 | 1986-07-01 | E. I. Du Pont De Nemours And Company | Photosensitive conductive metal composition |
US4613560A (en) * | 1984-12-28 | 1986-09-23 | E. I. Du Pont De Nemours And Company | Photosensitive ceramic coating composition |
US4912019A (en) * | 1988-05-31 | 1990-03-27 | E. I. Du Pont De Nemours And Company | Photosensitive aqueous developable ceramic coating composition |
US4925771A (en) * | 1988-05-31 | 1990-05-15 | E. I. Dupont De Nemours And Company | Process of making photosensitive aqueous developable ceramic coating composition including freeze drying the ceramic solid particles |
-
1989
- 1989-08-21 US US07/397,153 patent/US5032490A/en not_active Expired - Lifetime
-
1990
- 1990-08-18 AT AT90115856T patent/ATE121551T1/de not_active IP Right Cessation
- 1990-08-18 EP EP90115856A patent/EP0414167B1/en not_active Expired - Lifetime
- 1990-08-18 DE DE69018733T patent/DE69018733T2/de not_active Expired - Fee Related
- 1990-08-20 KR KR1019900012796A patent/KR910005329A/ko not_active Application Discontinuation
- 1990-08-20 CA CA002023628A patent/CA2023628A1/en not_active Abandoned
- 1990-08-21 CN CN90108178A patent/CN1050447A/zh active Pending
- 1990-08-21 JP JP2218295A patent/JPH0619925B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69018733T2 (de) | 1995-11-09 |
CA2023628A1 (en) | 1991-02-22 |
EP0414167A3 (en) | 1991-04-24 |
JPH03210703A (ja) | 1991-09-13 |
ATE121551T1 (de) | 1995-05-15 |
EP0414167A2 (en) | 1991-02-27 |
US5032490A (en) | 1991-07-16 |
JPH0619925B2 (ja) | 1994-03-16 |
EP0414167B1 (en) | 1995-04-19 |
DE69018733D1 (de) | 1995-05-24 |
CN1050447A (zh) | 1991-04-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR910005329A (ko) | 수용액 중에서 현상가능한 감광성 구리 전도체 조성물 | |
KR910005331A (ko) | 감광성 반수성 현상 가능한 구리 전도체 조성물 | |
KR910005328A (ko) | 감광성 수성 현상 가능한 금 전도체 조성물 | |
KR890017303A (ko) | 감광성 세라믹 피복 조성물 및 이들의 제조방법 | |
MY131673A (en) | Partially polymerized resins | |
KR870011507A (ko) | 카르복시 벤조트리아졸을 함유한 감광성 조성물 | |
CN1211750A (zh) | 热助光敏组合物及其方法 | |
KR890014711A (ko) | 인페이스트 조성물 및 그로부터 수득된 인피복 | |
DK7784D0 (da) | Overtraeksmaterialer | |
KR920013026A (ko) | 용매 또는 분산제로서 물을 함유하는 감광성 조성물 및 그의 제조방법 | |
KR890017302A (ko) | 개선된 감광성 세라믹 피복 조성물 및 이들의 제조 방법 | |
JPS56126830A (en) | Silver halide photographic sensitive material | |
KR840006080A (ko) | 열저항성이 높은 중합체의 안전 구조형성용 광저항제 | |
KR920018520A (ko) | 옵셋 인쇄용 감광성 조성물 | |
ATE64477T1 (de) | Lichtempfindliches aufzeichnungselement. | |
KR970076083A (ko) | 비닐피롤리돈 중합체를 사용하는 수성 현상가능한 감광성 후막 조성물 | |
KR900018253A (ko) | 미립자 집합체 에멀션 및 그의 제조방법 | |
KR910006781A (ko) | 방사선-중합성 혼합물 및 땜납 내식막 마스크의 제조방법 | |
KR910005330A (ko) | 감광성 반수성 현상 가능한 금 전도체 조성물 | |
KR860001139A (ko) | 방사선 중합성 혼합물 | |
EP0280295A3 (en) | A heat-resistant photosensitive resin composition | |
KR860008476A (ko) | 심부 자외선 석판인쇄 내식막 조성물 및 그의 이용법 | |
KR850001789A (ko) | 방사- 중합성 혼합물 및 그로부터 제조된 복물 | |
KR930012181A (ko) | 후막 구리 페이스트 조성물 | |
ATE64219T1 (de) | Lichtempfindliches aufzeichnungselement. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |