KR910002710A - 저탄소함량의 실리콘 디이미드의 제조방법 - Google Patents
저탄소함량의 실리콘 디이미드의 제조방법 Download PDFInfo
- Publication number
- KR910002710A KR910002710A KR1019900009705A KR900009705A KR910002710A KR 910002710 A KR910002710 A KR 910002710A KR 1019900009705 A KR1019900009705 A KR 1019900009705A KR 900009705 A KR900009705 A KR 900009705A KR 910002710 A KR910002710 A KR 910002710A
- Authority
- KR
- South Korea
- Prior art keywords
- silicon diimide
- carbon content
- low carbon
- producing low
- ammonia
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/087—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/068—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Glass Compositions (AREA)
- Ceramic Products (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (3)
- a) 탄화수소와 혼합물로 액체 클로로실란을 입구단면에 대해 100㎏/m2s 이상의 질량 유동 밀도로 액체 암모니아 함유 반응 용기로 도입하고, b)5℃ 이상에서 반응을 수행하여 실리콘 디이미드를 제공하고, c)실리콘 디이미드를 액체 암모니아로 세척한 후 100℃ 이상의 진공에서 건조시킴을 특징으로 하여, 암모니아 압력하에 암모니아를 탄화수소로 희석된 하기 일반식의 클로로실란과 반응시켜 저탄소 함량의 실리콘 디이미드를 제조하는 방법.SiHn C14-a상기식에서, n은 0, 1, 2 또는 3이다.
- 제1항에 있어서, 질량 유동 밀도가 1,000 내지 8,000㎏/m2s인 방법.
- 제1항 또는 2항에 있어서, 반응을 14℃ 이상에서 수행하는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3924361A DE3924361A1 (de) | 1989-07-22 | 1989-07-22 | Verfahren zur herstellung von siliciumdiimid mit geringem kohlenstoffgehalt |
| DEP3924361.3 | 1989-07-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR910002710A true KR910002710A (ko) | 1991-02-26 |
Family
ID=6385663
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019900009705A KR910002710A (ko) | 1989-07-22 | 1990-06-29 | 저탄소함량의 실리콘 디이미드의 제조방법 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0410107B1 (ko) |
| JP (1) | JPH0354105A (ko) |
| KR (1) | KR910002710A (ko) |
| AT (1) | ATE90925T1 (ko) |
| DE (2) | DE3924361A1 (ko) |
| NO (1) | NO903263L (ko) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19651731B4 (de) * | 1995-12-12 | 2012-08-16 | Ube Industries, Ltd. | Verfahren zur Herstellung einer Stickstoff enthaltenden Silanverbindung |
| JP4723759B2 (ja) * | 2001-06-27 | 2011-07-13 | ニューデルタ工業株式会社 | 管理機 |
| JP5589295B2 (ja) * | 2009-03-30 | 2014-09-17 | 宇部興産株式会社 | 含窒素シラン化合物粉末及びその製造方法 |
| JP5589294B2 (ja) * | 2009-03-30 | 2014-09-17 | 宇部興産株式会社 | 含窒素シラン化合物粉末及びその製造方法 |
| EP2415708B1 (en) * | 2009-03-30 | 2017-12-20 | Ube Industries, Ltd. | Nitrogen-containing silane compound powder and method for producing same |
| JP5407999B2 (ja) * | 2010-03-31 | 2014-02-05 | 宇部興産株式会社 | 結晶質窒化ケイ素粉末の製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS608967B2 (ja) * | 1978-04-11 | 1985-03-07 | 旭硝子株式会社 | 窒化珪素を製造する方法 |
| JPS5888110A (ja) * | 1981-11-17 | 1983-05-26 | Ube Ind Ltd | 窒化ケイ素質粉末の製法 |
| JPS60195099A (ja) * | 1984-03-13 | 1985-10-03 | Kobe Steel Ltd | ウイスカ−状窒化珪素の製造法 |
| DE3717285A1 (de) * | 1987-05-22 | 1988-12-01 | Basf Ag | Verfahren zur herstellung von pulverfoermigem siliciumnitrid |
| DE3720572A1 (de) * | 1987-06-22 | 1989-01-05 | Basf Ag | Amorphes pulverfoermiges siliciumnitrid |
| CN1013659B (zh) * | 1989-08-24 | 1991-08-28 | 国家建筑材料工业局山东工业陶瓷研究设计院 | 氮化硅粉末的制造方法及设备 |
-
1989
- 1989-07-22 DE DE3924361A patent/DE3924361A1/de not_active Withdrawn
-
1990
- 1990-05-25 AT AT90109940T patent/ATE90925T1/de not_active IP Right Cessation
- 1990-05-25 EP EP90109940A patent/EP0410107B1/de not_active Expired - Lifetime
- 1990-05-25 DE DE9090109940T patent/DE59001847D1/de not_active Expired - Fee Related
- 1990-06-29 KR KR1019900009705A patent/KR910002710A/ko not_active Application Discontinuation
- 1990-07-20 NO NO90903263A patent/NO903263L/no unknown
- 1990-07-23 JP JP2193199A patent/JPH0354105A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE3924361A1 (de) | 1991-01-24 |
| NO903263L (no) | 1991-01-23 |
| NO903263D0 (no) | 1990-07-20 |
| EP0410107B1 (de) | 1993-06-23 |
| EP0410107A3 (en) | 1992-01-29 |
| EP0410107A2 (de) | 1991-01-30 |
| DE59001847D1 (de) | 1993-07-29 |
| ATE90925T1 (de) | 1993-07-15 |
| JPH0354105A (ja) | 1991-03-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |