KR900005606A - 반도체장치 - Google Patents

반도체장치

Info

Publication number
KR900005606A
KR900005606A KR1019890013712A KR890013712A KR900005606A KR 900005606 A KR900005606 A KR 900005606A KR 1019890013712 A KR1019890013712 A KR 1019890013712A KR 890013712 A KR890013712 A KR 890013712A KR 900005606 A KR900005606 A KR 900005606A
Authority
KR
South Korea
Prior art keywords
source
layer
drain
semiconductor device
electrode
Prior art date
Application number
KR1019890013712A
Other languages
English (en)
Inventor
마사노리 오치
Original Assignee
아오이 죠이치
가부시키가이샤 도시바
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 아오이 죠이치, 가부시키가이샤 도시바 filed Critical 아오이 죠이치
Publication of KR900005606A publication Critical patent/KR900005606A/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0843Source or drain regions of field-effect devices
    • H01L29/0891Source or drain regions of field-effect devices of field-effect transistors with Schottky gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Junction Field-Effect Transistors (AREA)

Abstract

내용 없음

Description

반도체장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따른 1실시예의 단면구성도,
제3도는 본 발명과 종래의 구성을 비교한 특성도이다.

Claims (1)

  1. 반절연성기판(31)에 형성된 제1도전형 동작층(32)과, 이 동작층(32)의 양측에 설치되고 제1도전형 저저항층으로 이루어진 소스와 드레인층(331,332), 상기 동작층(32)의 상부에 설치된 게이트전극(35), 상기 소스와 드레인층(331,332)의 상부에 각각 설치된 소스와 드레인전극((331,332)을 구비하여 구성되어, 상기 소스와 드레인층(331,332)간의 거리가 1.0㎛~2.0㎛이고, 상기 게이트전극(35)과 드레인층 (332)간의 거리가 0.5㎛~1.0㎛인 것을 특징으로 하는 반도체장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890013712A 1988-09-24 1989-09-23 반도체장치 KR900005606A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP88-239327 1988-09-24
JP63239327A JPH0287533A (ja) 1988-09-24 1988-09-24 半導体装置

Publications (1)

Publication Number Publication Date
KR900005606A true KR900005606A (ko) 1990-04-14

Family

ID=17043073

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890013712A KR900005606A (ko) 1988-09-24 1989-09-23 반도체장치

Country Status (3)

Country Link
EP (1) EP0364762A1 (ko)
JP (1) JPH0287533A (ko)
KR (1) KR900005606A (ko)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57177566A (en) * 1981-04-24 1982-11-01 Nec Corp Schottky barrier gate type field effect transistor
US4956308A (en) * 1987-01-20 1990-09-11 Itt Corporation Method of making self-aligned field-effect transistor
DE3609274A1 (de) * 1986-03-19 1987-09-24 Siemens Ag Verfahren zur herstellung eines selbstjustiert positionierten metallkontaktes

Also Published As

Publication number Publication date
EP0364762A1 (en) 1990-04-25
JPH0287533A (ja) 1990-03-28

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