KR890014431A - 벤조페논 유도체 및 그 제조방법 - Google Patents

벤조페논 유도체 및 그 제조방법 Download PDF

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Publication number
KR890014431A
KR890014431A KR1019890003218A KR890003218A KR890014431A KR 890014431 A KR890014431 A KR 890014431A KR 1019890003218 A KR1019890003218 A KR 1019890003218A KR 890003218 A KR890003218 A KR 890003218A KR 890014431 A KR890014431 A KR 890014431A
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KR
South Korea
Prior art keywords
group
compound
hydrogen atom
atom
alkyl
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KR1019890003218A
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English (en)
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니콜 그린 피터
아서 그린 윌리엄
Original Assignee
니콜라스 리차드 리안
워드 블렝킨삽 앤드 캄파니 리미팃드
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Application filed by 니콜라스 리차드 리안, 워드 블렝킨삽 앤드 캄파니 리미팃드 filed Critical 니콜라스 리차드 리안
Publication of KR890014431A publication Critical patent/KR890014431A/ko

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/385—Saturated compounds containing a keto group being part of a ring
    • C07C49/457—Saturated compounds containing a keto group being part of a ring containing halogen
    • C07C49/467—Saturated compounds containing a keto group being part of a ring containing halogen polycyclic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
    • C07C225/02—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C225/14—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated
    • C07C225/16—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated and containing six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
    • Y10S522/905—Benzophenone group

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)

Abstract

내용 없음.

Description

벤조페논 유도체 및 그 제조방법
내용없음

Claims (10)

  1. 하기 일반식(I)의 화합물 :
    상기식에서 X-는 1당량의 음이온을 나타내고 ; R5는 수소원자 또는 메틸기를 나타내고 ; 각 R4는 독립적으로 메틸 또는 에틸기를 나타내고 ; 각 R1, R2, 및 R3는 독립적으로 수소 또는 할로겐원자, 1-4개의 탄소원자를 갖는 알킬, 알콕시 또는 알킬티오기, 아릴티오기, 또는 R4, R5및 X-가 상기 주어진 의미를 갖는 일반식
    의 기를 나타낸다.
  2. 제1항에 있어서, 각 R1, R2및 R3가 독립적으로 수소원자, 할로겐원자, 1-4개 탄소원자를 갖는 알킬 또는 알콕시기 또는 R4, R5및 X-가 제1항에 주어진 의미를 갖는 일반식
    의 기를 나타내는 화합물.
  3. 제2항에 있어서, R2및 R3둘다 수소원자를 나타내고, R1이 수소원자, 할로겐원자, 1-4개의 탄소원자를 갖는 알킬 또는 알콕시기 또는 일반식
    의 기를 나타내는 화합물.
  4. 제3항에 있어서, R1이 수소원자, 염소원자, 메톡시기 또는 삼차 부틸기를 나타내는 화합물.
  5. 제1항 내지 제4항중 어느 한 항에 있어서, 각 R4가 메틸기를 나타내는 화합물.
  6. 제1항 내지 제5항중 어느 한 항에 있어서, X-가 할로겐 이온을 나타내는 화합물.
  7. 일반식
    (상기식에서, 각 R6, R7및 R8은 독립적으로 수소원자 할로겐원자, 1-4개의 탄소원자를 갖는 알킬, 알콕시 또는 알킬티오기, 아릴티오기, 또는 기 CH2X1를 나타내고, X1은 이탈원자 또는 기를 나타낸다)의 화합물을 일반식
    (상기식에서, R4및 R5는 상기와 같다.)의 화합물과 반응시키는 것을 포함하는, 제1항에 따른 화합물의 제조방법.
  8. 적어도 하나의 중합가능한 프리폴리머의 수성용액 및 광개시제로서, 제1항 내지 제6항중 어느 하나에 따른 화합물을 포함하는 수성 광중합가능한 조성물.
  9. 기판의 표면에 제8항에 따른 조성물을 적용시키고 자외선에 노출시키는 것을 포함하는, U.V-경화 래커 필름으로 피복된 기판의 제조방법.
  10. 제9항에 방법에 따라 제조되는 경우, U.V-경화 래커 필름으로 피복된 기판.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890003218A 1988-03-18 1989-03-15 벤조페논 유도체 및 그 제조방법 KR890014431A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB8806527 1988-03-18
GB888806527A GB8806527D0 (en) 1988-03-18 1988-03-18 Benzophenone derivatives

Publications (1)

Publication Number Publication Date
KR890014431A true KR890014431A (ko) 1989-10-23

Family

ID=10633700

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890003218A KR890014431A (ko) 1988-03-18 1989-03-15 벤조페논 유도체 및 그 제조방법

Country Status (17)

Country Link
US (1) US4948819A (ko)
EP (1) EP0333291B1 (ko)
JP (1) JP2736678B2 (ko)
KR (1) KR890014431A (ko)
CN (1) CN1035822A (ko)
AT (1) ATE109763T1 (ko)
AU (1) AU609268B2 (ko)
BR (1) BR8901202A (ko)
DE (1) DE68917341T2 (ko)
DK (1) DK129189A (ko)
GB (1) GB8806527D0 (ko)
HU (1) HU202811B (ko)
IL (1) IL89635A0 (ko)
IN (1) IN174634B (ko)
NZ (1) NZ228363A (ko)
PT (1) PT90021B (ko)
ZA (1) ZA891995B (ko)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5512329A (en) * 1982-09-29 1996-04-30 Bsi Corporation Substrate surface preparation
US4977511A (en) * 1985-11-20 1990-12-11 The Mead Corporation Photosensitive materials containing ionic dye compound as initiators
US5484822A (en) * 1991-06-24 1996-01-16 Polaroid Corporation Process and composition for cladding optic fibers
FR2715157B1 (fr) * 1994-01-20 1996-03-01 Atochem Elf Sa Latex acryliques susceptibles de former des films photoréticulables.
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
US5714360A (en) * 1995-11-03 1998-02-03 Bsi Corporation Photoactivatable water soluble cross-linking agents containing an onium group
WO1997024376A1 (en) * 1995-12-29 1997-07-10 Minnesota Mining And Manufacturing Company Use of pendant photoreactive moieties on polymer precursors to prepare hydrophilic pressure sensitive adhesives
US6086796A (en) * 1997-07-02 2000-07-11 Diamonex, Incorporated Diamond-like carbon over-coats for optical recording media devices and method thereof
US7863485B2 (en) * 2004-12-10 2011-01-04 Omnitech Environmental, Llc Additive and vehicle for inks, paints, coatings and adhesives
DE102009001966A1 (de) 2009-03-30 2010-10-07 Evonik Röhm Gmbh Beschichtungszusammensetzung,(Meth)acryl-Polymer und Monomermischung zur Herstellung des(Meth)acryl-Polymers
CN102206293B (zh) * 2010-03-29 2013-09-18 比亚迪股份有限公司 一种光引发剂,一种光固化涂料和模内装饰方法
WO2013170857A1 (en) 2012-05-16 2013-11-21 Coloplast A/S Novel polymeric photoinitiators and photoinitiator monomers
MX2015007211A (es) 2012-12-11 2015-10-29 Nano Safe Coatings Inc Antimicrobianos de amonio cuaternario con terminacion de benzofenona curados por uv para superficies.
CN103926794B (zh) * 2014-04-29 2017-11-14 常州强力电子新材料股份有限公司 一种含有二苯甲酮衍生物光引发剂的光固化组合物
JP6576454B2 (ja) * 2015-01-05 2019-09-18 アイ ジー エム マルタ リミテッド Ｌｅｄ硬化性低移行性光開始剤
WO2017031599A1 (en) 2015-08-27 2017-03-02 Nano Safe Coatings Incorporated (A Florida Corporation 3 P 14000024914) Preparation of sulfonamide-containing antimicrobials and substrate treating compositions of sulfonamide-containing antimicrobials
AR107674A1 (es) 2016-02-19 2018-05-23 Avery Dennison Corp Método de dos etapas para procesamiento de adhesivos y composiciones relacionadas
WO2018081268A1 (en) 2016-10-25 2018-05-03 Avery Dennison Corporation Block polymers with photoinitiator groups in backbone and their use in adhesive compositions

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4011259A (en) * 1969-10-20 1977-03-08 The Kendall Company Monomeric emulsion stabilizers
JPS5495691A (en) * 1978-01-13 1979-07-28 Toyo Ink Mfg Co Ltd Photocurable resin composition
DE2831263A1 (de) * 1978-07-15 1980-01-31 Basf Ag Benzoinderivate mit quartaerer ammoniumgruppe
US4310687A (en) * 1980-07-10 1982-01-12 Gaf Corporation Copolymerizable ultraviolet light absorber monomers which are acrylate esters of 2-hydroxy, alkoxy, methylol benzophenones
DE3331474A1 (de) * 1983-09-01 1985-03-21 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare mischungen mit speziellen diaminobenzophenon-verbindungen
US4859727A (en) * 1986-08-22 1989-08-22 Mitsubishi Rayon Company Ltd. Antistatic thermoplastic resin composition
GB8703606D0 (en) * 1987-02-17 1987-03-25 Ward Blenkinsop & Co Ltd Benzophenone derivatives

Also Published As

Publication number Publication date
PT90021B (pt) 1994-06-30
AU3135889A (en) 1989-09-21
JP2736678B2 (ja) 1998-04-02
US4948819A (en) 1990-08-14
DK129189D0 (da) 1989-03-16
BR8901202A (pt) 1989-10-31
AU609268B2 (en) 1991-04-26
HU202811B (en) 1991-04-29
IN174634B (ko) 1995-01-28
DE68917341D1 (de) 1994-09-15
ATE109763T1 (de) 1994-08-15
IL89635A0 (en) 1989-09-28
PT90021A (pt) 1989-11-10
GB8806527D0 (en) 1988-04-20
DE68917341T2 (de) 1995-01-05
EP0333291A2 (en) 1989-09-20
JPH024745A (ja) 1990-01-09
ZA891995B (en) 1989-10-25
HUT50094A (en) 1989-12-28
CN1035822A (zh) 1989-09-27
EP0333291A3 (en) 1990-11-28
NZ228363A (en) 1991-01-29
DK129189A (da) 1989-09-19
EP0333291B1 (en) 1994-08-10

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