IL89635A0 - Benzophenone derivatives,their preparation and their use as photoinitiators - Google Patents
Benzophenone derivatives,their preparation and their use as photoinitiatorsInfo
- Publication number
- IL89635A0 IL89635A0 IL89635A IL8963589A IL89635A0 IL 89635 A0 IL89635 A0 IL 89635A0 IL 89635 A IL89635 A IL 89635A IL 8963589 A IL8963589 A IL 8963589A IL 89635 A0 IL89635 A0 IL 89635A0
- Authority
- IL
- Israel
- Prior art keywords
- group
- photoinitiators
- preparation
- benzophenone derivatives
- chem
- Prior art date
Links
- 150000008366 benzophenones Chemical class 0.000 title 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000004414 alkyl thio group Chemical group 0.000 abstract 1
- 150000001450 anions Chemical class 0.000 abstract 1
- 125000005110 aryl thio group Chemical group 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/385—Saturated compounds containing a keto group being part of a ring
- C07C49/457—Saturated compounds containing a keto group being part of a ring containing halogen
- C07C49/467—Saturated compounds containing a keto group being part of a ring containing halogen polycyclic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
- C07C225/02—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton
- C07C225/14—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated
- C07C225/16—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated and containing six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
- Y10S522/905—Benzophenone group
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB888806527A GB8806527D0 (en) | 1988-03-18 | 1988-03-18 | Benzophenone derivatives |
Publications (1)
Publication Number | Publication Date |
---|---|
IL89635A0 true IL89635A0 (en) | 1989-09-28 |
Family
ID=10633700
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL89635A IL89635A0 (en) | 1988-03-18 | 1989-03-16 | Benzophenone derivatives,their preparation and their use as photoinitiators |
Country Status (17)
Country | Link |
---|---|
US (1) | US4948819A (ko) |
EP (1) | EP0333291B1 (ko) |
JP (1) | JP2736678B2 (ko) |
KR (1) | KR890014431A (ko) |
CN (1) | CN1035822A (ko) |
AT (1) | ATE109763T1 (ko) |
AU (1) | AU609268B2 (ko) |
BR (1) | BR8901202A (ko) |
DE (1) | DE68917341T2 (ko) |
DK (1) | DK129189A (ko) |
GB (1) | GB8806527D0 (ko) |
HU (1) | HU202811B (ko) |
IL (1) | IL89635A0 (ko) |
IN (1) | IN174634B (ko) |
NZ (1) | NZ228363A (ko) |
PT (1) | PT90021B (ko) |
ZA (1) | ZA891995B (ko) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5512329A (en) * | 1982-09-29 | 1996-04-30 | Bsi Corporation | Substrate surface preparation |
US4977511A (en) * | 1985-11-20 | 1990-12-11 | The Mead Corporation | Photosensitive materials containing ionic dye compound as initiators |
US5484822A (en) * | 1991-06-24 | 1996-01-16 | Polaroid Corporation | Process and composition for cladding optic fibers |
FR2715157B1 (fr) * | 1994-01-20 | 1996-03-01 | Atochem Elf Sa | Latex acryliques susceptibles de former des films photoréticulables. |
US5998496A (en) * | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
US5714360A (en) * | 1995-11-03 | 1998-02-03 | Bsi Corporation | Photoactivatable water soluble cross-linking agents containing an onium group |
EP0869977A1 (en) * | 1995-12-29 | 1998-10-14 | Minnesota Mining And Manufacturing Company | Use of pendant photoreactive moieties on polymer precursors to prepare hydrophilic pressure sensitive adhesives |
US6086796A (en) * | 1997-07-02 | 2000-07-11 | Diamonex, Incorporated | Diamond-like carbon over-coats for optical recording media devices and method thereof |
US7863485B2 (en) * | 2004-12-10 | 2011-01-04 | Omnitech Environmental, Llc | Additive and vehicle for inks, paints, coatings and adhesives |
DE102009001966A1 (de) | 2009-03-30 | 2010-10-07 | Evonik Röhm Gmbh | Beschichtungszusammensetzung,(Meth)acryl-Polymer und Monomermischung zur Herstellung des(Meth)acryl-Polymers |
CN102206293B (zh) * | 2010-03-29 | 2013-09-18 | 比亚迪股份有限公司 | 一种光引发剂,一种光固化涂料和模内装饰方法 |
WO2014089680A1 (en) | 2012-12-11 | 2014-06-19 | Nano Safe Coatings Incorporated (A Florida Corporation 3 P14000024914) | Uv cured benzophenone terminated quaternary ammonium antimicrobials for surfaces |
US10040893B2 (en) | 2012-05-16 | 2018-08-07 | Coloplast A/S | Polymeric photoinitiators and photoinitiator monomers |
CN103926794B (zh) * | 2014-04-29 | 2017-11-14 | 常州强力电子新材料股份有限公司 | 一种含有二苯甲酮衍生物光引发剂的光固化组合物 |
CN110229253B (zh) * | 2015-01-05 | 2021-11-02 | Igm集团公司 | Led可固化的低迁移性光引发剂 |
CA3034286C (en) | 2015-08-27 | 2021-08-31 | Nano Safe Coatings Incorporated (A Florida Corporation 3 P 14000024914) | Preparation of sulfonamide-containing antimicrobials and substrate treating compositions of sulfonamide-containing antimicrobials |
AU2017221491B2 (en) | 2016-02-19 | 2019-06-27 | Avery Dennison Corporation | Two stage methods for processing adhesives and related compositions |
KR102182235B1 (ko) | 2016-10-25 | 2020-11-24 | 애버리 데니슨 코포레이션 | 백본에 광개시제기를 갖는 블록 폴리머 및 접착제 조성물에서의 그것의 용도 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4011259A (en) * | 1969-10-20 | 1977-03-08 | The Kendall Company | Monomeric emulsion stabilizers |
JPS5495691A (en) * | 1978-01-13 | 1979-07-28 | Toyo Ink Mfg Co Ltd | Photocurable resin composition |
DE2831263A1 (de) * | 1978-07-15 | 1980-01-31 | Basf Ag | Benzoinderivate mit quartaerer ammoniumgruppe |
US4310687A (en) * | 1980-07-10 | 1982-01-12 | Gaf Corporation | Copolymerizable ultraviolet light absorber monomers which are acrylate esters of 2-hydroxy, alkoxy, methylol benzophenones |
DE3331474A1 (de) * | 1983-09-01 | 1985-03-21 | Basf Ag, 6700 Ludwigshafen | Photopolymerisierbare mischungen mit speziellen diaminobenzophenon-verbindungen |
US4859727A (en) * | 1986-08-22 | 1989-08-22 | Mitsubishi Rayon Company Ltd. | Antistatic thermoplastic resin composition |
GB8703606D0 (en) * | 1987-02-17 | 1987-03-25 | Ward Blenkinsop & Co Ltd | Benzophenone derivatives |
-
1988
- 1988-03-18 GB GB888806527A patent/GB8806527D0/en active Pending
-
1989
- 1989-02-27 US US07/315,599 patent/US4948819A/en not_active Expired - Fee Related
- 1989-03-14 DE DE68917341T patent/DE68917341T2/de not_active Expired - Fee Related
- 1989-03-14 EP EP89200652A patent/EP0333291B1/en not_active Expired - Lifetime
- 1989-03-14 AT AT89200652T patent/ATE109763T1/de not_active IP Right Cessation
- 1989-03-15 CN CN89101369A patent/CN1035822A/zh active Pending
- 1989-03-15 KR KR1019890003218A patent/KR890014431A/ko not_active Application Discontinuation
- 1989-03-16 NZ NZ228363A patent/NZ228363A/xx unknown
- 1989-03-16 BR BR898901202A patent/BR8901202A/pt unknown
- 1989-03-16 AU AU31358/89A patent/AU609268B2/en not_active Ceased
- 1989-03-16 IL IL89635A patent/IL89635A0/xx unknown
- 1989-03-16 JP JP1062373A patent/JP2736678B2/ja not_active Expired - Lifetime
- 1989-03-16 IN IN250DE1989 patent/IN174634B/en unknown
- 1989-03-16 HU HU891241A patent/HU202811B/hu not_active IP Right Cessation
- 1989-03-16 PT PT90021A patent/PT90021B/pt not_active IP Right Cessation
- 1989-03-16 ZA ZA891995A patent/ZA891995B/xx unknown
- 1989-03-16 DK DK129189A patent/DK129189A/da not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
AU609268B2 (en) | 1991-04-26 |
CN1035822A (zh) | 1989-09-27 |
PT90021A (pt) | 1989-11-10 |
JP2736678B2 (ja) | 1998-04-02 |
DK129189D0 (da) | 1989-03-16 |
PT90021B (pt) | 1994-06-30 |
ZA891995B (en) | 1989-10-25 |
DK129189A (da) | 1989-09-19 |
GB8806527D0 (en) | 1988-04-20 |
HUT50094A (en) | 1989-12-28 |
ATE109763T1 (de) | 1994-08-15 |
JPH024745A (ja) | 1990-01-09 |
DE68917341D1 (de) | 1994-09-15 |
NZ228363A (en) | 1991-01-29 |
US4948819A (en) | 1990-08-14 |
BR8901202A (pt) | 1989-10-31 |
EP0333291B1 (en) | 1994-08-10 |
DE68917341T2 (de) | 1995-01-05 |
EP0333291A2 (en) | 1989-09-20 |
HU202811B (en) | 1991-04-29 |
IN174634B (ko) | 1995-01-28 |
EP0333291A3 (en) | 1990-11-28 |
AU3135889A (en) | 1989-09-21 |
KR890014431A (ko) | 1989-10-23 |
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