DK129189D0 - Benzophenonderivater - Google Patents

Benzophenonderivater

Info

Publication number
DK129189D0
DK129189D0 DK129189A DK129189A DK129189D0 DK 129189 D0 DK129189 D0 DK 129189D0 DK 129189 A DK129189 A DK 129189A DK 129189 A DK129189 A DK 129189A DK 129189 D0 DK129189 D0 DK 129189D0
Authority
DK
Denmark
Prior art keywords
group
chem
methyl
independently represents
hydrogen
Prior art date
Application number
DK129189A
Other languages
English (en)
Other versions
DK129189A (da
Inventor
Peter Nicholl Green
William Arthur Green
Original Assignee
Ward Blenkinsop & Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ward Blenkinsop & Co Ltd filed Critical Ward Blenkinsop & Co Ltd
Publication of DK129189D0 publication Critical patent/DK129189D0/da
Publication of DK129189A publication Critical patent/DK129189A/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/385—Saturated compounds containing a keto group being part of a ring
    • C07C49/457—Saturated compounds containing a keto group being part of a ring containing halogen
    • C07C49/467—Saturated compounds containing a keto group being part of a ring containing halogen polycyclic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
    • C07C225/02—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C225/14—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated
    • C07C225/16—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated and containing six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
    • Y10S522/905—Benzophenone group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
DK129189A 1988-03-18 1989-03-16 Benzophenonderivater DK129189A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB888806527A GB8806527D0 (en) 1988-03-18 1988-03-18 Benzophenone derivatives

Publications (2)

Publication Number Publication Date
DK129189D0 true DK129189D0 (da) 1989-03-16
DK129189A DK129189A (da) 1989-09-19

Family

ID=10633700

Family Applications (1)

Application Number Title Priority Date Filing Date
DK129189A DK129189A (da) 1988-03-18 1989-03-16 Benzophenonderivater

Country Status (17)

Country Link
US (1) US4948819A (da)
EP (1) EP0333291B1 (da)
JP (1) JP2736678B2 (da)
KR (1) KR890014431A (da)
CN (1) CN1035822A (da)
AT (1) ATE109763T1 (da)
AU (1) AU609268B2 (da)
BR (1) BR8901202A (da)
DE (1) DE68917341T2 (da)
DK (1) DK129189A (da)
GB (1) GB8806527D0 (da)
HU (1) HU202811B (da)
IL (1) IL89635A0 (da)
IN (1) IN174634B (da)
NZ (1) NZ228363A (da)
PT (1) PT90021B (da)
ZA (1) ZA891995B (da)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5512329A (en) * 1982-09-29 1996-04-30 Bsi Corporation Substrate surface preparation
US4977511A (en) * 1985-11-20 1990-12-11 The Mead Corporation Photosensitive materials containing ionic dye compound as initiators
US5484822A (en) * 1991-06-24 1996-01-16 Polaroid Corporation Process and composition for cladding optic fibers
FR2715157B1 (fr) * 1994-01-20 1996-03-01 Atochem Elf Sa Latex acryliques susceptibles de former des films photoréticulables.
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
US5714360A (en) * 1995-11-03 1998-02-03 Bsi Corporation Photoactivatable water soluble cross-linking agents containing an onium group
EP0869977A1 (en) * 1995-12-29 1998-10-14 Minnesota Mining And Manufacturing Company Use of pendant photoreactive moieties on polymer precursors to prepare hydrophilic pressure sensitive adhesives
US6086796A (en) * 1997-07-02 2000-07-11 Diamonex, Incorporated Diamond-like carbon over-coats for optical recording media devices and method thereof
US7863485B2 (en) * 2004-12-10 2011-01-04 Omnitech Environmental, Llc Additive and vehicle for inks, paints, coatings and adhesives
DE102009001966A1 (de) 2009-03-30 2010-10-07 Evonik Röhm Gmbh Beschichtungszusammensetzung,(Meth)acryl-Polymer und Monomermischung zur Herstellung des(Meth)acryl-Polymers
CN102206293B (zh) * 2010-03-29 2013-09-18 比亚迪股份有限公司 一种光引发剂,一种光固化涂料和模内装饰方法
WO2013170857A1 (en) 2012-05-16 2013-11-21 Coloplast A/S Novel polymeric photoinitiators and photoinitiator monomers
AP2015008512A0 (en) 2012-12-11 2015-06-30 Nano Safe Coatings Inc A Florida Corp 3 P14000024914 UV cured benzophenone terminated quaternary ammonium antimicrobials for surfaces
CN103926794B (zh) * 2014-04-29 2017-11-14 常州强力电子新材料股份有限公司 一种含有二苯甲酮衍生物光引发剂的光固化组合物
EP3242898A4 (en) * 2015-01-05 2018-10-24 IGM Group B.V. Led-curable low migration photoinitiators
CA3034286C (en) 2015-08-27 2021-08-31 Nano Safe Coatings Incorporated (A Florida Corporation 3 P 14000024914) Preparation of sulfonamide-containing antimicrobials and substrate treating compositions of sulfonamide-containing antimicrobials
CA3082141C (en) 2016-02-19 2022-06-14 Eric L. Bartholomew Two stage methods for processing adhesives and related compositions
KR102182235B1 (ko) 2016-10-25 2020-11-24 애버리 데니슨 코포레이션 백본에 광개시제기를 갖는 블록 폴리머 및 접착제 조성물에서의 그것의 용도

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4011259A (en) * 1969-10-20 1977-03-08 The Kendall Company Monomeric emulsion stabilizers
JPS5495691A (en) * 1978-01-13 1979-07-28 Toyo Ink Mfg Co Ltd Photocurable resin composition
DE2831263A1 (de) * 1978-07-15 1980-01-31 Basf Ag Benzoinderivate mit quartaerer ammoniumgruppe
US4310687A (en) * 1980-07-10 1982-01-12 Gaf Corporation Copolymerizable ultraviolet light absorber monomers which are acrylate esters of 2-hydroxy, alkoxy, methylol benzophenones
DE3331474A1 (de) * 1983-09-01 1985-03-21 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare mischungen mit speziellen diaminobenzophenon-verbindungen
US4859727A (en) * 1986-08-22 1989-08-22 Mitsubishi Rayon Company Ltd. Antistatic thermoplastic resin composition
GB8703606D0 (en) * 1987-02-17 1987-03-25 Ward Blenkinsop & Co Ltd Benzophenone derivatives

Also Published As

Publication number Publication date
HUT50094A (en) 1989-12-28
NZ228363A (en) 1991-01-29
ZA891995B (en) 1989-10-25
DK129189A (da) 1989-09-19
BR8901202A (pt) 1989-10-31
EP0333291B1 (en) 1994-08-10
AU3135889A (en) 1989-09-21
PT90021B (pt) 1994-06-30
ATE109763T1 (de) 1994-08-15
GB8806527D0 (en) 1988-04-20
JP2736678B2 (ja) 1998-04-02
KR890014431A (ko) 1989-10-23
DE68917341D1 (de) 1994-09-15
HU202811B (en) 1991-04-29
IL89635A0 (en) 1989-09-28
JPH024745A (ja) 1990-01-09
EP0333291A2 (en) 1989-09-20
EP0333291A3 (en) 1990-11-28
US4948819A (en) 1990-08-14
DE68917341T2 (de) 1995-01-05
PT90021A (pt) 1989-11-10
IN174634B (da) 1995-01-28
CN1035822A (zh) 1989-09-27
AU609268B2 (en) 1991-04-26

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment