PT90021A - Processo para a preparacao de derivados de benzofenona - Google Patents
Processo para a preparacao de derivados de benzofenonaInfo
- Publication number
- PT90021A PT90021A PT90021A PT9002189A PT90021A PT 90021 A PT90021 A PT 90021A PT 90021 A PT90021 A PT 90021A PT 9002189 A PT9002189 A PT 9002189A PT 90021 A PT90021 A PT 90021A
- Authority
- PT
- Portugal
- Prior art keywords
- group
- benzofenone
- derivatives
- preparation
- chem
- Prior art date
Links
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000004414 alkyl thio group Chemical group 0.000 abstract 1
- 150000001450 anions Chemical class 0.000 abstract 1
- 125000005110 aryl thio group Chemical group 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/385—Saturated compounds containing a keto group being part of a ring
- C07C49/457—Saturated compounds containing a keto group being part of a ring containing halogen
- C07C49/467—Saturated compounds containing a keto group being part of a ring containing halogen polycyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
- C07C225/02—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton
- C07C225/14—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated
- C07C225/16—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated and containing six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
- Y10S522/905—Benzophenone group
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB888806527A GB8806527D0 (en) | 1988-03-18 | 1988-03-18 | Benzophenone derivatives |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| PT90021A true PT90021A (pt) | 1989-11-10 |
| PT90021B PT90021B (pt) | 1994-06-30 |
Family
ID=10633700
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PT90021A PT90021B (pt) | 1988-03-18 | 1989-03-16 | Processo para a preparacao de derivados de benzofenona |
Country Status (17)
| Country | Link |
|---|---|
| US (1) | US4948819A (pt) |
| EP (1) | EP0333291B1 (pt) |
| JP (1) | JP2736678B2 (pt) |
| KR (1) | KR890014431A (pt) |
| CN (1) | CN1035822A (pt) |
| AT (1) | ATE109763T1 (pt) |
| AU (1) | AU609268B2 (pt) |
| BR (1) | BR8901202A (pt) |
| DE (1) | DE68917341T2 (pt) |
| DK (1) | DK129189A (pt) |
| GB (1) | GB8806527D0 (pt) |
| HU (1) | HU202811B (pt) |
| IL (1) | IL89635A0 (pt) |
| IN (1) | IN174634B (pt) |
| NZ (1) | NZ228363A (pt) |
| PT (1) | PT90021B (pt) |
| ZA (1) | ZA891995B (pt) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5512329A (en) * | 1982-09-29 | 1996-04-30 | Bsi Corporation | Substrate surface preparation |
| US4977511A (en) * | 1985-11-20 | 1990-12-11 | The Mead Corporation | Photosensitive materials containing ionic dye compound as initiators |
| US5484822A (en) * | 1991-06-24 | 1996-01-16 | Polaroid Corporation | Process and composition for cladding optic fibers |
| FR2715157B1 (fr) * | 1994-01-20 | 1996-03-01 | Atochem Elf Sa | Latex acryliques susceptibles de former des films photoréticulables. |
| US5998496A (en) * | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| US5714360A (en) * | 1995-11-03 | 1998-02-03 | Bsi Corporation | Photoactivatable water soluble cross-linking agents containing an onium group |
| AU4743696A (en) * | 1995-12-29 | 1997-07-28 | Minnesota Mining And Manufacturing Company | Use of pendant photoreactive moieties on polymer precursors to prepare hydrophilic pressure sensitive adhesives |
| US6086796A (en) * | 1997-07-02 | 2000-07-11 | Diamonex, Incorporated | Diamond-like carbon over-coats for optical recording media devices and method thereof |
| US7863485B2 (en) * | 2004-12-10 | 2011-01-04 | Omnitech Environmental, Llc | Additive and vehicle for inks, paints, coatings and adhesives |
| DE102009001966A1 (de) | 2009-03-30 | 2010-10-07 | Evonik Röhm Gmbh | Beschichtungszusammensetzung,(Meth)acryl-Polymer und Monomermischung zur Herstellung des(Meth)acryl-Polymers |
| CN102206293B (zh) * | 2010-03-29 | 2013-09-18 | 比亚迪股份有限公司 | 一种光引发剂,一种光固化涂料和模内装饰方法 |
| US10040893B2 (en) | 2012-05-16 | 2018-08-07 | Coloplast A/S | Polymeric photoinitiators and photoinitiator monomers |
| AP2015008512A0 (en) | 2012-12-11 | 2015-06-30 | Nano Safe Coatings Inc A Florida Corp 3 P14000024914 | UV cured benzophenone terminated quaternary ammonium antimicrobials for surfaces |
| CN103926794B (zh) * | 2014-04-29 | 2017-11-14 | 常州强力电子新材料股份有限公司 | 一种含有二苯甲酮衍生物光引发剂的光固化组合物 |
| JP6576454B2 (ja) * | 2015-01-05 | 2019-09-18 | アイ ジー エム マルタ リミテッド | Ｌｅｄ硬化性低移行性光開始剤 |
| WO2017031599A1 (en) | 2015-08-27 | 2017-03-02 | Nano Safe Coatings Incorporated (A Florida Corporation 3 P 14000024914) | Preparation of sulfonamide-containing antimicrobials and substrate treating compositions of sulfonamide-containing antimicrobials |
| WO2017143316A1 (en) | 2016-02-19 | 2017-08-24 | Avery Dennison Corporation | Two stage methods for processing adhesives and related compositions |
| EP3532520A1 (en) | 2016-10-25 | 2019-09-04 | Avery Dennison Corporation | Block polymers with photoinitiator groups in backbone and their use in adhesive compositions |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4011259A (en) * | 1969-10-20 | 1977-03-08 | The Kendall Company | Monomeric emulsion stabilizers |
| JPS5495691A (en) * | 1978-01-13 | 1979-07-28 | Toyo Ink Mfg Co Ltd | Photocurable resin composition |
| DE2831263A1 (de) * | 1978-07-15 | 1980-01-31 | Basf Ag | Benzoinderivate mit quartaerer ammoniumgruppe |
| US4310687A (en) * | 1980-07-10 | 1982-01-12 | Gaf Corporation | Copolymerizable ultraviolet light absorber monomers which are acrylate esters of 2-hydroxy, alkoxy, methylol benzophenones |
| DE3331474A1 (de) * | 1983-09-01 | 1985-03-21 | Basf Ag, 6700 Ludwigshafen | Photopolymerisierbare mischungen mit speziellen diaminobenzophenon-verbindungen |
| US4859727A (en) * | 1986-08-22 | 1989-08-22 | Mitsubishi Rayon Company Ltd. | Antistatic thermoplastic resin composition |
| GB8703606D0 (en) * | 1987-02-17 | 1987-03-25 | Ward Blenkinsop & Co Ltd | Benzophenone derivatives |
-
1988
- 1988-03-18 GB GB888806527A patent/GB8806527D0/en active Pending
-
1989
- 1989-02-27 US US07/315,599 patent/US4948819A/en not_active Expired - Fee Related
- 1989-03-14 DE DE68917341T patent/DE68917341T2/de not_active Expired - Fee Related
- 1989-03-14 AT AT89200652T patent/ATE109763T1/de not_active IP Right Cessation
- 1989-03-14 EP EP89200652A patent/EP0333291B1/en not_active Expired - Lifetime
- 1989-03-15 CN CN89101369A patent/CN1035822A/zh active Pending
- 1989-03-15 KR KR1019890003218A patent/KR890014431A/ko not_active Application Discontinuation
- 1989-03-16 IN IN250DE1989 patent/IN174634B/en unknown
- 1989-03-16 IL IL89635A patent/IL89635A0/xx unknown
- 1989-03-16 DK DK129189A patent/DK129189A/da not_active Application Discontinuation
- 1989-03-16 BR BR898901202A patent/BR8901202A/pt unknown
- 1989-03-16 PT PT90021A patent/PT90021B/pt not_active IP Right Cessation
- 1989-03-16 ZA ZA891995A patent/ZA891995B/xx unknown
- 1989-03-16 JP JP1062373A patent/JP2736678B2/ja not_active Expired - Lifetime
- 1989-03-16 HU HU891241A patent/HU202811B/hu not_active IP Right Cessation
- 1989-03-16 NZ NZ228363A patent/NZ228363A/xx unknown
- 1989-03-16 AU AU31358/89A patent/AU609268B2/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| KR890014431A (ko) | 1989-10-23 |
| PT90021B (pt) | 1994-06-30 |
| EP0333291A2 (en) | 1989-09-20 |
| EP0333291A3 (en) | 1990-11-28 |
| JPH024745A (ja) | 1990-01-09 |
| US4948819A (en) | 1990-08-14 |
| DK129189D0 (da) | 1989-03-16 |
| GB8806527D0 (en) | 1988-04-20 |
| ATE109763T1 (de) | 1994-08-15 |
| JP2736678B2 (ja) | 1998-04-02 |
| AU609268B2 (en) | 1991-04-26 |
| IN174634B (pt) | 1995-01-28 |
| DE68917341T2 (de) | 1995-01-05 |
| HU202811B (en) | 1991-04-29 |
| ZA891995B (en) | 1989-10-25 |
| IL89635A0 (en) | 1989-09-28 |
| CN1035822A (zh) | 1989-09-27 |
| AU3135889A (en) | 1989-09-21 |
| EP0333291B1 (en) | 1994-08-10 |
| BR8901202A (pt) | 1989-10-31 |
| NZ228363A (en) | 1991-01-29 |
| DK129189A (da) | 1989-09-19 |
| HUT50094A (en) | 1989-12-28 |
| DE68917341D1 (de) | 1994-09-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG3A | Patent granted, date of granting |
Effective date: 19931209 |
|
| MM3A | Annulment or lapse |
Free format text: LAPSE DUE TO NON-PAYMENT OF FEES Effective date: 19950630 |