JPS5473872A - Surface modification of silicone substrate - Google Patents

Surface modification of silicone substrate

Info

Publication number
JPS5473872A
JPS5473872A JP14120277A JP14120277A JPS5473872A JP S5473872 A JPS5473872 A JP S5473872A JP 14120277 A JP14120277 A JP 14120277A JP 14120277 A JP14120277 A JP 14120277A JP S5473872 A JPS5473872 A JP S5473872A
Authority
JP
Japan
Prior art keywords
substrate
silicone substrate
compound
polar
surface modification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14120277A
Other languages
Japanese (ja)
Inventor
Shigeo Tatsuki
Hitoshi Kimura
Hiroyuki Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kansai Paint Co Ltd
Original Assignee
Kansai Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kansai Paint Co Ltd filed Critical Kansai Paint Co Ltd
Priority to JP14120277A priority Critical patent/JPS5473872A/en
Publication of JPS5473872A publication Critical patent/JPS5473872A/en
Pending legal-status Critical Current

Links

Landscapes

  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

PURPOSE: To improve the adhesiveness and printability of a silicone substrate, by bringing the substrate into contact with a polar radically polymerizable compound, etc., and by grafting the compound onto the substrate with irradiation of active ray of light.
CONSTITUTION: (A) a silicone substrate having 50 % or more of group of formula (R is methyl, ethyl, propyl, butyl, aryl, or phnyl group; n is an integer ≥2) in the molecule is brought into contact with (B) a photopolymerizable composition comprising a polar radically polymerizable compound, and, if necessary, a sensitizer, a thickener, a surfactant, and a solvent by dipping, etc. The system thus formed is irradiated with active ray of light, preferably of wavelength 250W700 nm, to graft the compound of the composition (B) onto the substrate (A).
COPYRIGHT: (C)1979,JPO&Japio
JP14120277A 1977-11-25 1977-11-25 Surface modification of silicone substrate Pending JPS5473872A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14120277A JPS5473872A (en) 1977-11-25 1977-11-25 Surface modification of silicone substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14120277A JPS5473872A (en) 1977-11-25 1977-11-25 Surface modification of silicone substrate

Publications (1)

Publication Number Publication Date
JPS5473872A true JPS5473872A (en) 1979-06-13

Family

ID=15286513

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14120277A Pending JPS5473872A (en) 1977-11-25 1977-11-25 Surface modification of silicone substrate

Country Status (1)

Country Link
JP (1) JPS5473872A (en)

Similar Documents

Publication Publication Date Title
JPS51119727A (en) A composition for use in surface coating and a process for preparing i t
GB8610951D0 (en) Organic compounds
JPS5225651A (en) Process for fabricating an optical curved surface using a photopolymer izable adhesive
JPS5473872A (en) Surface modification of silicone substrate
JPS57202534A (en) Negative type resist composition
JPS5427369A (en) Pattern formation method
JPS5413777A (en) Photo resist coater of semiconductor wafers
JPS53147549A (en) Forming method of antireflection film
JPS5259111A (en) Process for preparation of acid-fluoride-containing fluoride having an ester group
JPS55164825A (en) Polymer positive image forming method
JPS51132222A (en) Thermosetting coating composition
SE7701645L (en) COAGULATION TRANSFER PROCEDURE
JPS5277671A (en) Method and equipment of masking
JPS51115764A (en) Manufacturing method of a magnetron
JPS51112355A (en) Reflection prevented lens
JPS5415944A (en) Formation of heat-resistant film
JPS5399772A (en) Optical mask
AU519116B2 (en) Method of masking a semiconductor against proton bombardment
JPS52151175A (en) Gamma-pyrone and gamma-pyridone derivatives
JPS5415943A (en) Formation of heat-resistant film
JPS5220997A (en) Coloring method of sodium percarbonate
JPS52119179A (en) Electron beam exposing method
SU806721A1 (en) Composition for removing paint-varnish coatings
JPS5244601A (en) Method for treatment of surface of turn-table sheet etc.
JPS51111847A (en) A method for treating a coating film coated with an inorganic coating compound