KR890005914A - 박판 제방법 - Google Patents
박판 제방법 Download PDFInfo
- Publication number
- KR890005914A KR890005914A KR870010993A KR870010993A KR890005914A KR 890005914 A KR890005914 A KR 890005914A KR 870010993 A KR870010993 A KR 870010993A KR 870010993 A KR870010993 A KR 870010993A KR 890005914 A KR890005914 A KR 890005914A
- Authority
- KR
- South Korea
- Prior art keywords
- thin film
- substrate
- sodium chloride
- lamination method
- film layer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 종래기술에 따른 박판 제조방법을 이용하여 제조된 박판의 단면도.
제2도는 본 발명에 따른 제조방법을 설명한 설명도.
Claims (1)
- 표면처리된 유리. 세라믹 또는 금속등의 기판위에 진공증착법으로 염화나트륨과 같은 수용성 물질을 증착하고 요구된 바에 따라 각종 금속이나 절연물 박막을 형성한 후 염화나트륨층을 용해하여 기판과 박막층을 형성함으로써 박막 또는 박막층의 제조함을 특징으로 하는 박판 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR870010993A KR890005914A (ko) | 1987-09-30 | 1987-09-30 | 박판 제방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR870010993A KR890005914A (ko) | 1987-09-30 | 1987-09-30 | 박판 제방법 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR890005914A true KR890005914A (ko) | 1989-05-17 |
Family
ID=68343924
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR870010993A KR890005914A (ko) | 1987-09-30 | 1987-09-30 | 박판 제방법 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR890005914A (ko) |
-
1987
- 1987-09-30 KR KR870010993A patent/KR890005914A/ko not_active Application Discontinuation
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| BG101818A (en) | Multilayer moisture barrier for elecirochemical cell tester | |
| ES2083154T3 (es) | Procedimiento de deposito de una capa de oxido de silicio unida a un sustrato de material polimero. | |
| KR850003370A (ko) | 디스플레이용 유리판 및 그 제조방법 | |
| KR850006055A (ko) | 반사판 | |
| KR890005914A (ko) | 박판 제방법 | |
| KR910006513A (ko) | 슬라이딩 베어링의 제조방법 | |
| KR910007386A (ko) | 전자발광소자의 제조방법 | |
| KR860001216A (ko) | 유색경질피막의 형성방법 | |
| JPS575372A (en) | Thin film diode and manufacture thereof | |
| KR910008792A (ko) | 양면가공반도체소자의 제조방법 | |
| KR920014363A (ko) | 박막 el소자의 제조방법 | |
| JPS52131751A (en) | Measuring method for thickness of transparent film | |
| JPS51126384A (en) | A method of forming a thin film by sputtering | |
| KR890004397A (ko) | 집적회로의 이중메탈 형성방법 | |
| KR920001678A (ko) | 금속 배선의 알루미늄 산화막 형성 제조방법 | |
| KR900015576A (ko) | 박막 전장 발광표시소자 및 제조방법 | |
| KR920014365A (ko) | 박막 el 소자의 제조방법 | |
| JPS6414891A (en) | Thin film el element | |
| KR910019202A (ko) | Ni-Co 박막의 제조방법 | |
| KR920005369A (ko) | 리세트 게이트 제조방법 | |
| KR910013385A (ko) | 형광표시관의 양극 패턴 및 그 형성방법 | |
| KR910010633A (ko) | 반도체장치의 제조방법 | |
| KR930018759A (ko) | 포토다이오드의 제조방법 | |
| JPS5636120A (en) | Manufacture of magnetic bubble device | |
| KR910002019A (ko) | 포토레지스터 리프트업을 이용한 콘텍트 메탈층 형성방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |