KR880003177A - 반도체 압력센서 - Google Patents
반도체 압력센서 Download PDFInfo
- Publication number
- KR880003177A KR880003177A KR1019870008157A KR870008157A KR880003177A KR 880003177 A KR880003177 A KR 880003177A KR 1019870008157 A KR1019870008157 A KR 1019870008157A KR 870008157 A KR870008157 A KR 870008157A KR 880003177 A KR880003177 A KR 880003177A
- Authority
- KR
- South Korea
- Prior art keywords
- pressure sensor
- circuit
- bridge circuit
- semiconductor pressure
- bridge
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims description 4
- 230000035945 sensitivity Effects 0.000 claims description 5
- 238000009792 diffusion process Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000012535 impurity Substances 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 230000003321 amplification Effects 0.000 claims 1
- 239000013078 crystal Substances 0.000 claims 1
- 238000003199 nucleic acid amplification method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/84—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of applied mechanical force, e.g. of pressure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
- G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
- G01L9/0054—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements integral with a semiconducting diaphragm
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/02—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning
- G01L9/06—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning of piezo-resistive devices
- G01L9/065—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning of piezo-resistive devices with temperature compensating means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본원 발명에 의한 반도체 압력센서의 일실시예를 나타내는 회로도.
제2도는 제1도의 브리지회로가 형성된 실리콘기판을 나타내는 사시도.
제3도는 본원 발명을 설명하기 위한 실리콘기판상에 형성된 확산 저항의 표면 불순물농도와 감도온도계수 변화율의 관계를 나타내는 특성도. 여기에서 감도온도계수 변화율을 -40℃ 내지 125℃의 감도계수변화율은 100℃당 감도계수변화율로 환산함으로써 얻는다.
Claims (2)
- 인가압력에 의하여 표면장력이 변화하는 실리콘 단결정 탄성기판(20)과 상기 기판 표면에 P형 확산층으로 형성된 변형게이지(1)와 이 변형게이지를 포함하는 브리지회로(2)와, 상기 브리지회로에 구동전류를 공급하기 위한 정전류회로(5)와, 상기 브리지회로의 출력단자(D),(E)의 브리지출력을 증폭하여 출력신호를 형성하는 증폭회로(7)로 이루어지는 반도체 압력센서에 있어서, 상기 브리지회로(2)를 구성하는 변형게이지(RG1, RG2, RG3, RG4)는 그 표면 불순몰농도가 2.3X1018내지 2.5X1018atoms/㎤인 확산저항층으로 형성되고, 상기 확산저항층의 온도변화율에 대략 유사한 온도저항특성을 가진 서미스터는 상기 정전류회로내에 포함되고, 이들의 특성을 상호간 상쇄함으로써 감도온도보상을 하는 것을 특징으로 하는 반도체 압력센서.
- 제1항에 있어서, 상기 서미스터의 B정수는 1400K 내지 2400K가 되도록 선정되는 것을 특징으로 하는 반도체 압력센서.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61-179983 | 1986-08-01 | ||
JP179983 | 1986-08-01 | ||
JP61179983A JPH0691265B2 (ja) | 1986-08-01 | 1986-08-01 | 半導体圧力センサ |
Publications (2)
Publication Number | Publication Date |
---|---|
KR880003177A true KR880003177A (ko) | 1988-05-14 |
KR920001226B1 KR920001226B1 (ko) | 1992-02-06 |
Family
ID=16075402
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019870008157A KR920001226B1 (ko) | 1986-08-01 | 1987-07-27 | 반도체 압력센서 |
Country Status (6)
Country | Link |
---|---|
US (1) | US4813272A (ko) |
JP (1) | JPH0691265B2 (ko) |
KR (1) | KR920001226B1 (ko) |
DE (1) | DE3725311A1 (ko) |
FR (1) | FR2602335B1 (ko) |
GB (1) | GB2193577B (ko) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3612810A1 (de) * | 1986-04-16 | 1987-10-22 | Bosch Gmbh Robert | Schaltungsanordnung zur messung einer mechanischen verformung, insbesondere unter einwirkung eines drucks |
JPH0777266B2 (ja) * | 1988-12-28 | 1995-08-16 | 株式会社豊田中央研究所 | 半導体歪み検出装置 |
DE3925177A1 (de) * | 1989-07-27 | 1991-02-07 | Siemens Ag | Schaltungsanordnung zur temperaturstabilen verstaerkung einer differenzspannung |
GB2238132A (en) * | 1989-11-13 | 1991-05-22 | Nat Res Dev | Transducer power supply |
US5178016A (en) * | 1989-11-15 | 1993-01-12 | Sensym, Incorporated | Silicon pressure sensor chip with a shear element on a sculptured diaphragm |
US5259248A (en) * | 1990-03-19 | 1993-11-09 | Hitachi Ltd. | Integrated multisensor and static and differential pressure transmitter and plant system using the integrated multisensor |
JP2595829B2 (ja) * | 1991-04-22 | 1997-04-02 | 株式会社日立製作所 | 差圧センサ、及び複合機能形差圧センサ |
US5343755A (en) * | 1993-05-05 | 1994-09-06 | Rosemount Inc. | Strain gage sensor with integral temperature signal |
DE4334080C2 (de) * | 1993-10-06 | 1996-05-02 | Telefunken Microelectron | Piezoresistive Sensorstruktur |
US8280682B2 (en) | 2000-12-15 | 2012-10-02 | Tvipr, Llc | Device for monitoring movement of shipped goods |
US7386401B2 (en) * | 1994-11-21 | 2008-06-10 | Phatrat Technology, Llc | Helmet that reports impact information, and associated methods |
US6266623B1 (en) * | 1994-11-21 | 2001-07-24 | Phatrat Technology, Inc. | Sport monitoring apparatus for determining loft time, speed, power absorbed and other factors such as height |
US7171331B2 (en) | 2001-12-17 | 2007-01-30 | Phatrat Technology, Llc | Shoes employing monitoring devices, and associated methods |
JP2003294559A (ja) | 2002-03-29 | 2003-10-15 | Denso Corp | センサ回路 |
JP3969228B2 (ja) * | 2002-07-19 | 2007-09-05 | 松下電工株式会社 | 機械的変形量検出センサ及びそれを用いた加速度センサ、圧力センサ |
US20040016981A1 (en) * | 2002-07-26 | 2004-01-29 | Matsushita Electric Works, Ltd. | Semiconductor acceleration sensor using doped semiconductor layer as wiring |
JP3915715B2 (ja) * | 2003-03-07 | 2007-05-16 | 株式会社デンソー | 半導体圧力センサ |
US7171880B2 (en) * | 2004-11-19 | 2007-02-06 | Powell Michael S | Dust collection for panel saw |
US20060225550A1 (en) * | 2004-08-31 | 2006-10-12 | Sam Walters | Control system method of operation for electric power tools |
JP2010107500A (ja) * | 2008-09-30 | 2010-05-13 | Ngk Spark Plug Co Ltd | 圧力検出装置 |
US8878598B2 (en) | 2010-12-28 | 2014-11-04 | British Virgin Islands Central Digital Inc. | Sensing module |
TW201227753A (en) * | 2010-12-28 | 2012-07-01 | British Virgin Islands Central Digital Inc | Sensor temperature compensation circuit and method thereof |
CN106197814B (zh) * | 2016-09-10 | 2018-12-18 | 杭州电子科技大学 | 一种基于双桥臂稳流的电阻应变式张力检测电路 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL7414459A (nl) * | 1974-11-06 | 1976-05-10 | Philips Nv | Drukopnemer. |
JPS5453877A (en) * | 1977-10-07 | 1979-04-27 | Hitachi Ltd | Temperature compensation circuit of semiconductor strain gauge |
JPS55113904A (en) * | 1979-02-26 | 1980-09-02 | Hitachi Ltd | Method of zero point temperature compensation for strain-electric signal transducer |
JPS58140604A (ja) * | 1982-02-17 | 1983-08-20 | Hitachi Ltd | 温度補償回路付き集積化センサ |
JPS5961736A (ja) * | 1982-10-01 | 1984-04-09 | Hitachi Ltd | 集積化圧力センサ |
DE3503489A1 (de) * | 1985-01-30 | 1986-07-31 | Siemens AG, 1000 Berlin und 8000 München | Schaltungsanordnung zur kompensation der temperaturabhaengigkeit von empfindlichkeit und nullpunkt eines piezoresistiven drucksensors |
JPH113379A (ja) * | 1997-06-10 | 1999-01-06 | Oki Electric Ind Co Ltd | 自動取引装置 |
-
1986
- 1986-08-01 JP JP61179983A patent/JPH0691265B2/ja not_active Expired - Lifetime
-
1987
- 1987-07-27 KR KR1019870008157A patent/KR920001226B1/ko not_active Application Discontinuation
- 1987-07-27 GB GB8717779A patent/GB2193577B/en not_active Expired - Lifetime
- 1987-07-30 DE DE19873725311 patent/DE3725311A1/de active Granted
- 1987-07-30 FR FR878710818A patent/FR2602335B1/fr not_active Expired - Lifetime
- 1987-07-31 US US07/080,102 patent/US4813272A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPS6337673A (ja) | 1988-02-18 |
GB8717779D0 (en) | 1987-09-03 |
KR920001226B1 (ko) | 1992-02-06 |
FR2602335B1 (fr) | 1990-12-28 |
FR2602335A1 (fr) | 1988-02-05 |
US4813272A (en) | 1989-03-21 |
GB2193577B (en) | 1990-04-18 |
DE3725311C2 (ko) | 1991-12-19 |
DE3725311A1 (de) | 1988-02-04 |
JPH0691265B2 (ja) | 1994-11-14 |
GB2193577A (en) | 1988-02-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
WITB | Written withdrawal of application |