KR880002669B1 - 주사형 전자현미경 또는 유사장치내의 대물렌즈를 제어하기 위한 방법 - Google Patents
주사형 전자현미경 또는 유사장치내의 대물렌즈를 제어하기 위한 방법 Download PDFInfo
- Publication number
- KR880002669B1 KR880002669B1 KR1019810003372A KR810003372A KR880002669B1 KR 880002669 B1 KR880002669 B1 KR 880002669B1 KR 1019810003372 A KR1019810003372 A KR 1019810003372A KR 810003372 A KR810003372 A KR 810003372A KR 880002669 B1 KR880002669 B1 KR 880002669B1
- Authority
- KR
- South Korea
- Prior art keywords
- objective lens
- excitation current
- sample
- focal length
- controlling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55126812A JPS5750756A (en) | 1980-09-12 | 1980-09-12 | Objective lens current control method for scan type electron microscope |
| JP126812 | 1980-09-12 | ||
| JP55126812 | 1980-09-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR830008389A KR830008389A (ko) | 1983-11-18 |
| KR880002669B1 true KR880002669B1 (ko) | 1988-12-17 |
Family
ID=14944563
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019810003372A Expired KR880002669B1 (ko) | 1980-09-12 | 1981-09-10 | 주사형 전자현미경 또는 유사장치내의 대물렌즈를 제어하기 위한 방법 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4393309A (enExample) |
| JP (1) | JPS5750756A (enExample) |
| KR (1) | KR880002669B1 (enExample) |
| GB (1) | GB2084837B (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3428802A1 (de) * | 1984-08-04 | 1986-02-13 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und vorrichtung zur steuerung des fokussierungszustandes eines abgelenkten elektronenstrahls |
| JPS61253756A (ja) * | 1985-05-07 | 1986-11-11 | Hitachi Ltd | 走査形電子顕微鏡 |
| GB8622976D0 (en) * | 1986-09-24 | 1986-10-29 | Trialsite Ltd | Scanning electron microscopes |
| JPS63231856A (ja) * | 1987-03-19 | 1988-09-27 | Jeol Ltd | 電子顕微鏡等の制御方法 |
| US4845362A (en) * | 1988-02-02 | 1989-07-04 | North American Philips Corporation | In situ differential imaging and method utilizing a scanning electron microscope |
| JPH01255142A (ja) * | 1988-04-01 | 1989-10-12 | Nichidenshi Tekunikusu:Kk | 電子顕微鏡のオートフォーカス回路 |
| JPH02174046A (ja) * | 1988-12-27 | 1990-07-05 | Hitachi Ltd | 電子顕微鏡およびこれに用いる試料微動装置の制御方法 |
| JPH0766770B2 (ja) * | 1989-03-10 | 1995-07-19 | 株式会社日立製作所 | 電子線照射装置 |
| US5057689A (en) * | 1989-09-20 | 1991-10-15 | Matsushita Electric Industrial Co., Ltd. | Scanning electron microscope and a method of displaying cross sectional profiles using the same |
| JP2685603B2 (ja) * | 1989-10-20 | 1997-12-03 | 日本電子株式会社 | 電子線装置 |
| JPH0582067A (ja) * | 1991-09-20 | 1993-04-02 | Jeol Ltd | 対物レンズの励磁電流発生方式 |
| FR2737785B1 (fr) * | 1995-08-11 | 1997-10-17 | Matra Mhs | Procede et dispositif de positionnement d'un objet par rapport au point de focalisation d'un microscope |
| US6278114B1 (en) | 1997-12-19 | 2001-08-21 | Kabushiki Kaisha Toshiba | Method and apparatus for measuring dimensions of a feature of a specimen |
| JP4121849B2 (ja) * | 2002-12-26 | 2008-07-23 | オリンパス株式会社 | 欠陥検査装置及び欠陥検査方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3715582A (en) * | 1970-02-13 | 1973-02-06 | Hitachi Ltd | Method of and apparatus for attaining focusing following variation in magnification in electron microscope |
| US3842236A (en) * | 1970-03-28 | 1974-10-15 | Steigerwald Strahltech | Process to control the movement of a workpiece with respect to a beam of a stock processing machine operating by means of controllable power irradiation |
| JPS55110044A (en) * | 1979-02-16 | 1980-08-25 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron beam projector |
-
1980
- 1980-09-12 JP JP55126812A patent/JPS5750756A/ja active Granted
-
1981
- 1981-09-03 US US06/299,009 patent/US4393309A/en not_active Expired - Lifetime
- 1981-09-10 KR KR1019810003372A patent/KR880002669B1/ko not_active Expired
- 1981-09-10 GB GB8127353A patent/GB2084837B/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| KR830008389A (ko) | 1983-11-18 |
| GB2084837B (en) | 1984-03-14 |
| JPS5750756A (en) | 1982-03-25 |
| GB2084837A (en) | 1982-04-15 |
| JPH0366777B2 (enExample) | 1991-10-18 |
| US4393309A (en) | 1983-07-12 |
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