KR880002413A - 프린트배선판의 제조방법 - Google Patents
프린트배선판의 제조방법 Download PDFInfo
- Publication number
- KR880002413A KR880002413A KR1019860007119A KR860007119A KR880002413A KR 880002413 A KR880002413 A KR 880002413A KR 1019860007119 A KR1019860007119 A KR 1019860007119A KR 860007119 A KR860007119 A KR 860007119A KR 880002413 A KR880002413 A KR 880002413A
- Authority
- KR
- South Korea
- Prior art keywords
- printed wiring
- wiring board
- manufacturing
- electrolytic cell
- resist film
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/13—Moulding and encapsulation; Deposition techniques; Protective layers
- H05K2203/1333—Deposition techniques, e.g. coating
- H05K2203/135—Electrophoretic deposition of insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 이 발명의 일실시예의 실시사항을 표시하는 단면도.
제2도는 상기 실시예에 있어서의 전해조를 자동처리라인에 조성한 응용예를 표시하는 개념적 측면도.
제5도는 이 드라이필름의 첨부상황을 표시하는 원리적 측면도.
Claims (3)
- 관통공등의 구멍이 있는 프린트배선판에 있어서, 이 관통공내 및 프린트배선용 동박적층절연판의 표면에 감광성 레지스트막을 형성하는 경우에 상기 동박적층절연판을 전착도장용 전해조에 수용한 전착도료화 수용성 감광수지에 침지하고 직류전해에 의하여 감광성 레지스트막을 석출시키는 공정이 있는 것을 특징으로 하는 프린트배선판의 제조방법.
- 제1항에 있어서, 동박적층절연판을 수용성이나 수분산성의 광경화성수지를 주성분으로 하는 전착도료의 도장용 전해조에 침지하는 것을 특징으로 하는 프린트배선판의 제조방법.
- 제1항 또는 제2항에 있어서, 자동처리용 탱크군중에 조정된 전착도장용 전해조에 있어서 자동처리의 1단계로서 감광성 레지스트막을 형성하는 것을 특징으로 하는 프린트배선판의 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP161422 | 1986-07-09 | ||
JP61161422A JPS6317592A (ja) | 1986-07-09 | 1986-07-09 | プリント配線板の製造方法 |
JP86-161422 | 1986-07-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR880002413A true KR880002413A (ko) | 1988-04-30 |
KR900001798B1 KR900001798B1 (ko) | 1990-03-24 |
Family
ID=15734800
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019860007119A KR900001798B1 (ko) | 1986-07-09 | 1986-08-27 | 프린트배선판의 제조방법 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS6317592A (ko) |
KR (1) | KR900001798B1 (ko) |
CN (1) | CN86105392A (ko) |
DE (1) | DE3628340A1 (ko) |
GB (1) | GB2193727A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100465613B1 (ko) * | 2002-11-01 | 2005-01-13 | 태창엔지니어링 주식회사 | 전착 레지스트 코팅장치 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4943346A (en) * | 1988-09-29 | 1990-07-24 | Siemens Aktiengesellschaft | Method for manufacturing printed circuit boards |
EP0370133A1 (de) * | 1988-11-24 | 1990-05-30 | Siemens Aktiengesellschaft | Verfahren zur Herstellung von Leiterplatten |
US5268256A (en) * | 1990-08-02 | 1993-12-07 | Ppg Industries, Inc. | Photoimageable electrodepositable photoresist composition for producing non-tacky films |
DE69130691T2 (de) * | 1990-08-02 | 1999-07-22 | Ppg Industries Inc | Lichtempfindliche, elektroabscheidbare Photoresistzusammensetzung |
JPH04146687A (ja) * | 1990-10-08 | 1992-05-20 | Nippon Paint Co Ltd | ソルダーマスクされた回路基板の製法 |
US5223116A (en) * | 1992-05-11 | 1993-06-29 | Siemens Aktiengesellschaft | Apparatus for electrophoretic application of a lacquer onto plate-shaped work pieces |
CN101144967B (zh) * | 2007-06-28 | 2011-04-06 | 武汉立胜超滤科技发展有限公司 | 正性电泳涂料在印制板的图形转移上的电泳涂装方法及成套设备 |
CN108811359B (zh) * | 2018-07-03 | 2019-11-08 | 刘平 | 一种双面和多层印制电路板的生产方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3586263D1 (de) * | 1984-03-07 | 1992-08-06 | Ciba Geigy Ag | Verfahren zur herstellung von abbildungen. |
US4592816A (en) * | 1984-09-26 | 1986-06-03 | Rohm And Haas Company | Electrophoretic deposition process |
-
1986
- 1986-07-09 JP JP61161422A patent/JPS6317592A/ja active Pending
- 1986-08-21 DE DE19863628340 patent/DE3628340A1/de not_active Ceased
- 1986-08-26 CN CN198686105392A patent/CN86105392A/zh active Pending
- 1986-08-27 KR KR1019860007119A patent/KR900001798B1/ko not_active IP Right Cessation
- 1986-08-28 GB GB08620789A patent/GB2193727A/en not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100465613B1 (ko) * | 2002-11-01 | 2005-01-13 | 태창엔지니어링 주식회사 | 전착 레지스트 코팅장치 |
Also Published As
Publication number | Publication date |
---|---|
JPS6317592A (ja) | 1988-01-25 |
DE3628340A1 (de) | 1988-01-21 |
KR900001798B1 (ko) | 1990-03-24 |
GB8620789D0 (en) | 1986-10-08 |
CN86105392A (zh) | 1988-01-27 |
GB2193727A (en) | 1988-02-17 |
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