KR850006229A - 진공처리장치의 폐기가스 배기장치 - Google Patents

진공처리장치의 폐기가스 배기장치 Download PDF

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Publication number
KR850006229A
KR850006229A KR1019850001823A KR850001823A KR850006229A KR 850006229 A KR850006229 A KR 850006229A KR 1019850001823 A KR1019850001823 A KR 1019850001823A KR 850001823 A KR850001823 A KR 850001823A KR 850006229 A KR850006229 A KR 850006229A
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KR
South Korea
Prior art keywords
pump
exhaust system
gas
vacuum processing
processing apparatus
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Application number
KR1019850001823A
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English (en)
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KR900006081B1 (en
Inventor
쓰도무 쓰까다 (외3)
Original Assignee
오다 젠지로오
니찌덴 아네르바 가부시끼가이샤
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Application filed by 오다 젠지로오, 니찌덴 아네르바 가부시끼가이샤 filed Critical 오다 젠지로오
Publication of KR850006229A publication Critical patent/KR850006229A/ko
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Publication of KR900006081B1 publication Critical patent/KR900006081B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C27/00—Sealing arrangements in rotary-piston pumps specially adapted for elastic fluids
    • F04C27/02—Liquid sealing for high-vacuum pumps or for compressors

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Drying Of Semiconductors (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Non-Positive Displacement Air Blowers (AREA)
  • Treating Waste Gases (AREA)

Abstract

내용 없음

Description

진공처리 장치의 폐기가스 배기장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 종래에 사용했던 알루미늄 드라이 에칭장치(Aluminum dry etching apparatus)의 배기장치를 보여주는 개략선도.
제2도는 본 발명 실시예인 알루미늄 드라이 에칭장치의 배기장치를 보여주는 개략선도.
* 도면의 주요부분에 대한 부호의 설명
101,210 : 반응챔버(reaction chamber)
106 : 루트 송풍기 펌프(roots blower pump)
108,208 : 먼지트램(dust trap)
110,210 : 오일시일 로터리 펌프(oil-sealed rotary pump)
122 : 기체(substrates: 基體)
206 : 축류 터어보분자 펌프(axial-flow turbomolecular pump)
213 : 건식 흡착탑(dry absorption column)

Claims (8)

  1. 진공처리장치의 부스터 펌프 및 보조펌프를 사용하고, 진공중에서 기체(基體)를 처리하기 위한 염소계열의 가스를 사용하는 진공처리장치용 배기장치에 있어서, 대기압 이상 압력의 불활성가스를 갖는 공기배출 측상 보조펌프의 용기를 채우기 위한 수단; 및 염소계열의 가스를 흡수할 수 있으며 보조펌프의 공기배출 파이프에 연결된 건식 흡착탑으로 구성되는 것을 특징으로 하는 진공처리장치의 배기장치.
  2. 제1항에 있어서, 보조펌프가 오일시일 로터리 펌프인 것을 특징으로 하는 진공처리장치의 배기장치.
  3. 제1항에 있어서, 부스터 펌프가 터어보분자 펌프인 것을 특징으로 하는 진공처리장치의 배기장치.
  4. 제1항에 있어서, 부스터 펌프가 루트 송풍기 펌프인 것을 특징으로 하는 진공처리장치의 배기장치.
  5. 진공처리장치의 부스터 펌프와 보조펌프를 사용하고 진공에서 기체(基體)를 처리하기 위한 염소계열의 가스를 사용하는 진공처리장치의 배기장치에 있어서, 냉각표면(cooling surface)을 갖고 있고 부스터 펌프와 가스트랩 사이에 설치된 먼지트랩; 부스터 펌프와 가스트랩 사이 가스통로의 벽표면을 가열하기 위한 수단; 대기압이상 압력의 불활성가스를 갖는 공기배출축 보조펌프의 용기를 채우기 위한 수단; 및 보조펌프의 공기배출 파이프에 연결되고 염소계열의 가스를 흡입할 수 있는 건식 흡착탑으로 구성되는 것을 특징으로 하는 진공처리장치의 배기장치.
  6. 제5항에 있어서, 보조펌프가 오일시일 로터리펌프인 것을 특징으로 하는 배기장치.
  7. 제5항에 있어서, 부스터 펌프가 터어보분자 펌프인 것을 특징으로 하는 배기장치.
  8. 제5항에 있어서, 부스터 펌프가 루트 송풍기 펌프인 것을 특징으로 하는 배기장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR8501823A 1984-03-21 1985-03-20 Waste gas extruding apparatus KR900006081B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59053894A JPS60198394A (ja) 1984-03-21 1984-03-21 真空処理装置の排気装置
JP53894 1984-03-21

Publications (2)

Publication Number Publication Date
KR850006229A true KR850006229A (ko) 1985-10-02
KR900006081B1 KR900006081B1 (en) 1990-08-22

Family

ID=12955430

Family Applications (1)

Application Number Title Priority Date Filing Date
KR8501823A KR900006081B1 (en) 1984-03-21 1985-03-20 Waste gas extruding apparatus

Country Status (4)

Country Link
US (1) US4655800A (ko)
JP (1) JPS60198394A (ko)
KR (1) KR900006081B1 (ko)
GB (1) GB2156236B (ko)

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US6784033B1 (en) * 1984-02-15 2004-08-31 Semiconductor Energy Laboratory Co., Ltd. Method for the manufacture of an insulated gate field effect semiconductor device
US5780313A (en) 1985-02-14 1998-07-14 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating semiconductor device
JPH0752718B2 (ja) * 1984-11-26 1995-06-05 株式会社半導体エネルギー研究所 薄膜形成方法
US6786997B1 (en) 1984-11-26 2004-09-07 Semiconductor Energy Laboratory Co., Ltd. Plasma processing apparatus
JPS63291624A (ja) * 1987-05-23 1988-11-29 Showa Denko Kk ガリウム・ヒ素ウェハ−のドライエッチング排ガスの処理方法
JPS6419198A (en) * 1987-07-15 1989-01-23 Hitachi Ltd Vacuum pump
JP2564663B2 (ja) * 1989-10-30 1996-12-18 株式会社半導体エネルギー研究所 気相エッチング装置
JP2564664B2 (ja) * 1989-10-30 1996-12-18 株式会社半導体エネルギー研究所 気相エッチング方法
JP2580928Y2 (ja) * 1991-08-22 1998-09-17 日本電気株式会社 気相成長装置
TW241375B (ko) * 1993-07-26 1995-02-21 Air Prod & Chem
US5714011A (en) * 1995-02-17 1998-02-03 Air Products And Chemicals Inc. Diluted nitrogen trifluoride thermal cleaning process
DE19601436A1 (de) * 1996-01-17 1997-07-24 Siegfried Dr Ing Straemke Verfahren und Vorrichtung zur Oberflächenbehandlung von Werkstücken
KR0183912B1 (ko) * 1996-08-08 1999-05-01 김광호 다중 반응 챔버에 연결된 펌핑 설비 및 이를 사용하는 방법
US6161575A (en) * 1998-08-28 2000-12-19 Taiwan Semiconductor Manufacturing Company, Ltd Apparatus and method for preventing chamber contamination
JP2004537844A (ja) * 2001-01-09 2004-12-16 アプライド　マテリアルズ　インコーポレイテッド 基板処理における白色粉末排気除去用装置
DE10136022B4 (de) * 2001-07-24 2006-01-12 Robert Bosch Gmbh Verfahren zur Vermeidung oder Beseitigung von Ausscheidungen im Abgasbereich einer Vakuumanlage
KR100809852B1 (ko) * 2007-05-17 2008-03-04 (주)엘오티베큠 일체형 진공발생장치
US20230034561A1 (en) * 2020-01-10 2023-02-02 Lam Research Corporation Ammonia abatement for improved roughing pump performance

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Also Published As

Publication number Publication date
GB2156236B (en) 1987-10-28
KR900006081B1 (en) 1990-08-22
GB8507314D0 (en) 1985-05-01
US4655800A (en) 1987-04-07
JPH0339198B2 (ko) 1991-06-13
JPS60198394A (ja) 1985-10-07
GB2156236A (en) 1985-10-09

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