KR830008197A - 광(光)경화성 혼합물 및 감광복사물질 - Google Patents
광(光)경화성 혼합물 및 감광복사물질 Download PDFInfo
- Publication number
- KR830008197A KR830008197A KR1019810003577A KR810003577A KR830008197A KR 830008197 A KR830008197 A KR 830008197A KR 1019810003577 A KR1019810003577 A KR 1019810003577A KR 810003577 A KR810003577 A KR 810003577A KR 830008197 A KR830008197 A KR 830008197A
- Authority
- KR
- South Korea
- Prior art keywords
- photocurable
- compound
- group
- polymer
- aromatic
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims 5
- 239000000463 material Substances 0.000 title claims 2
- 229920000642 polymer Polymers 0.000 claims 7
- -1 alkenylsulfonyl isocyanate Chemical class 0.000 claims 4
- 239000007795 chemical reaction product Substances 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 4
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical group OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 claims 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims 3
- 239000012954 diazonium Substances 0.000 claims 3
- 238000006068 polycondensation reaction Methods 0.000 claims 3
- 239000007864 aqueous solution Substances 0.000 claims 2
- 239000011230 binding agent Substances 0.000 claims 2
- 150000001989 diazonium salts Chemical class 0.000 claims 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical group [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 claims 2
- 150000002148 esters Chemical class 0.000 claims 2
- AOCYHPQXGJBAQQ-UHFFFAOYSA-N ethyl n-sulfonylcarbamate Chemical compound CCOC(=O)N=S(=O)=O AOCYHPQXGJBAQQ-UHFFFAOYSA-N 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- 239000012948 isocyanate Substances 0.000 claims 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 claims 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 claims 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 claims 1
- 150000004982 aromatic amines Chemical class 0.000 claims 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims 1
- 125000000852 azido group Chemical group *N=[N+]=[N-] 0.000 claims 1
- 150000001728 carbonyl compounds Chemical class 0.000 claims 1
- 229920002678 cellulose Polymers 0.000 claims 1
- 239000001913 cellulose Substances 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 239000003822 epoxy resin Substances 0.000 claims 1
- 150000002513 isocyanates Chemical class 0.000 claims 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims 1
- 150000007524 organic acids Chemical class 0.000 claims 1
- 150000008379 phenol ethers Chemical class 0.000 claims 1
- 150000002989 phenols Chemical class 0.000 claims 1
- 229920000647 polyepoxide Polymers 0.000 claims 1
- 229920001290 polyvinyl ester Polymers 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 229920001897 terpolymer Polymers 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Electroluminescent Light Sources (AREA)
- Polyesters Or Polycarbonates (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (6)
- 감광성 화합물로써는 디아조니움염 중축합 반응생성물 또는 유기아지도 화합물을, 결합제로써는, 설포닐우레탄부그룹을 가지며 알카리성 수용액내에서 가용성이거나 적어도 팽창성이 있으며 알케닐설포닐우레탄 또는 사이클로알케닐설포닐우레탄부그룹을 포함하는 고분자 중합체를, 함유함을 특징으로 하는 광(光)경화성 화합물.
- 제1항에 있어서, 중합체가 유리하이드록실그룹으로 된 단을 함유하는 중합체와 알케닐설포닐이소시아네이트 또는 사이클로알케닐설포닐이소시아네이트의 반응생성물인 광경화인 혼합물.
- 제2항에 있어서, 유리하이드록실그룹으로 된 단을 함유하는 중합체가 부분적으로 하이드록실화된 폴리비닐에스테르, 미전환된 비닐알콜단으로된 폴리비닐아세탈, 엑폭시드수지, 셀룰로우즈의 에스테르 또는 부분에스테르, 또는 비닐클로라이드, 비닐아세테이트 및 비닐알콜의 단으로 된 테르중합체인 광경화성 혼합물.
- 제3항에 있어서, 중합체가 미전환된 비닐알콜단으로 된 폴리비닐포르만 또는 폴리비닐부티탈인 광경화성 혼합물.
- 제1항에 있어서, 디아조니움염 중축합 반응생성물은 메틸렌그룹과 같은 중간물질로 교차될 수 있으며, 포름알데히드와 같이 축합될 수 있는 카보닐 화합물로부터 유도된 순환단 A-N2X 및 B을 특징으로 하는 광경화성 혼합물.상기식에서 A는 포름알데히드로 응축시킬 수 있는 방향족 디아조니움 화합물이고, B는 디아조니움 그룹으로부터 유리되며 포름알데히드, 특히 방향족 아민, 페놀, 페놀에테르, 방향족 티오에테르, 방향족탄화수소, 방향족 이환화합물 또는 유기산아미드로 축합시킬 수 있는 화합물의 기이다.
- 감광성 화합물로써는 디아조니움열 중축합 반응생성물 또는 유기아지도 화합물을 결합제로써는 설포닐우레탄부그룹을 가지며 알카리성 수용액내에서 가용성이거나 적어도 팽창성이 있으며, 알케닐설포닐우레탄 또는 사이클로알케닐설포닐우레탄부그룹을 갖는 고분자 중합체를 함유하는 광경화성층 및 지지체로 구성됨을 특징으로 인쇄판을 제조하기 위한 감광성 복사물질.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEP3036077.1 | 1980-09-25 | ||
DE19803036077 DE3036077A1 (de) | 1980-09-25 | 1980-09-25 | Lichthaertbares gemisch und damit hergestelltes lichtempfindliches kopiermaterial |
Publications (2)
Publication Number | Publication Date |
---|---|
KR830008197A true KR830008197A (ko) | 1983-11-16 |
KR880001192B1 KR880001192B1 (ko) | 1988-07-02 |
Family
ID=6112777
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019810003577A KR880001192B1 (ko) | 1980-09-25 | 1981-09-24 | 광(光)경화성 혼합물 및 감광성 복사재료 |
Country Status (14)
Country | Link |
---|---|
US (1) | US4387151A (ko) |
EP (1) | EP0048876B1 (ko) |
JP (1) | JPS5794747A (ko) |
KR (1) | KR880001192B1 (ko) |
AT (1) | ATE7084T1 (ko) |
AU (1) | AU539603B2 (ko) |
BR (1) | BR8106124A (ko) |
CA (1) | CA1164711A (ko) |
DE (2) | DE3036077A1 (ko) |
DK (1) | DK421781A (ko) |
FI (1) | FI68130C (ko) |
IL (1) | IL63915A (ko) |
SG (1) | SG28985G (ko) |
ZA (1) | ZA816566B (ko) |
Families Citing this family (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3130987A1 (de) * | 1981-08-05 | 1983-02-24 | Hoechst Ag, 6000 Frankfurt | Verfahren zur herstellung von flachdruckformen aus einem lichtempfindlichen material auf basis von diazoniumsalz-polykondensationsprodukten |
GB2127573A (en) * | 1981-08-24 | 1984-04-11 | Commw Scient Ind Res Org | Fine line photographic transfers |
DE3210577A1 (de) * | 1982-03-23 | 1983-10-06 | Hoechst Ag | Elektrophotographisches aufzeichnungsmaterial |
DE3404366A1 (de) * | 1984-02-08 | 1985-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
DE3409888A1 (de) * | 1984-03-17 | 1985-09-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches aufzeichnungsmaterial und dessen verwendung in einem verfahren zum herstellen einer druckform oder einer gedruckten schaltung |
JPS6120939A (ja) * | 1984-07-10 | 1986-01-29 | Fuji Photo Film Co Ltd | 平版印刷版用感光性組成物 |
DE3445276A1 (de) * | 1984-12-12 | 1986-06-19 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform |
US4780392A (en) * | 1985-08-02 | 1988-10-25 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer |
US4822720A (en) * | 1985-08-02 | 1989-04-18 | Hoechst Celanese Corporation | Water developable screen printing composition |
US4670507A (en) * | 1985-08-02 | 1987-06-02 | American Hoechst Corporation | Resin |
US4652604A (en) * | 1985-08-02 | 1987-03-24 | American Hoechst Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4707437A (en) * | 1985-08-02 | 1987-11-17 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4895788A (en) * | 1985-08-02 | 1990-01-23 | Hoechst Celanese Corporation | Water developable lithographic composition |
DE3528309A1 (de) * | 1985-08-07 | 1987-02-12 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
JPS6238471A (ja) * | 1985-08-14 | 1987-02-19 | Fuji Photo Film Co Ltd | 感光性平版印刷版の製造方法 |
JPH0642071B2 (ja) * | 1985-11-09 | 1994-06-01 | コニカ株式会社 | 感光性組成物および感光性平版印刷版 |
DE3541723A1 (de) * | 1985-11-26 | 1987-05-27 | Hoechst Ag | Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt |
DE3615613A1 (de) * | 1986-05-09 | 1987-11-12 | Hoechst Ag | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
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US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
DE3617499A1 (de) * | 1986-05-24 | 1987-11-26 | Hoechst Ag | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
DE3635303A1 (de) | 1986-10-17 | 1988-04-28 | Hoechst Ag | Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten |
JPH07120039B2 (ja) * | 1986-11-14 | 1995-12-20 | 富士写真フイルム株式会社 | 感光性組成物 |
DE3644160A1 (de) * | 1986-12-23 | 1988-07-14 | Hoechst Ag | Lichtempfindliches aufzeichnungsmaterial mit einer lichtempfindlichen zwischenschicht |
DE3644162A1 (de) * | 1986-12-23 | 1988-07-07 | Hoechst Ag | Polyvinylacetal, dieses enthaltendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3644163A1 (de) * | 1986-12-23 | 1988-07-07 | Hoechst Ag | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
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US5254431A (en) * | 1988-02-03 | 1993-10-19 | Vickers Plc | Radiation-sensitive polymers having sulfonyl urthane side chains and azide containing side chains in a mixture with diazo compounds containing |
GB8802314D0 (en) * | 1988-02-03 | 1988-03-02 | Vickers Plc | Improvements in/relating to radiation-sensitive compounds |
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EP0363817A3 (de) * | 1988-10-14 | 1990-09-26 | Hoechst Aktiengesellschaft | Negativ arbeitendes strahlungsempfindliches Gemisch, enthaltend ein Polymeres mit 1,2,3-Thiadiazolgruppen, sowie dieses enthaltendes Aufzeichnungsmaterial |
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US5242779A (en) * | 1989-06-21 | 1993-09-07 | Hoechst Aktiengesellschaft | Photosensitive mixture containing photocurable compound and polyurethane binder with grafted vinyl alcohol units, carboxylic acid vinyl ester units and vinyl acetal units |
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GB9326150D0 (en) * | 1993-12-22 | 1994-02-23 | Alcan Int Ltd | Electrochemical roughening method |
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DE19524851C2 (de) * | 1995-07-07 | 1998-05-07 | Sun Chemical Corp | Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und für lithographische Druckplatten |
DE19525050C2 (de) * | 1995-07-10 | 1999-11-11 | Kodak Polychrome Graphics Llc | Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten |
CA2191055A1 (en) | 1995-12-04 | 1997-06-05 | Major S. Dhillon | Aqueous developable negative acting photosensitive composition having improved image contrast |
EP0778292A3 (en) | 1995-12-04 | 1998-11-04 | Bayer Corporation | Method for the production of anhydride modified polyvinyl acetals useful for photosensitive compositions |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3660097A (en) * | 1969-11-28 | 1972-05-02 | Polychrome Corp | Diazo-polyurethane light-sensitive compositions |
DE2053363C3 (de) * | 1970-10-30 | 1980-09-18 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Gemisch |
DE2053364A1 (de) * | 1970-10-30 | 1972-05-04 | Kalle Ag, 6202 Wiesbaden-Biebrich | Lichtempfindliche Kopiermasse |
US4289838A (en) * | 1972-12-14 | 1981-09-15 | Polychrome Corporation | Diazo-unsaturated monomer light sensitive compositions |
LU75749A1 (ko) * | 1976-09-08 | 1978-04-27 | ||
DE2822887A1 (de) * | 1978-05-26 | 1979-11-29 | Hoechst Ag | Lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen |
-
1980
- 1980-09-25 DE DE19803036077 patent/DE3036077A1/de not_active Withdrawn
-
1981
- 1981-08-25 AU AU75665/81A patent/AU539603B2/en not_active Ceased
- 1981-09-12 DE DE8181107212T patent/DE3163089D1/de not_active Expired
- 1981-09-12 AT AT81107212T patent/ATE7084T1/de not_active IP Right Cessation
- 1981-09-12 EP EP81107212A patent/EP0048876B1/de not_active Expired
- 1981-09-18 CA CA000386257A patent/CA1164711A/en not_active Expired
- 1981-09-22 ZA ZA816566A patent/ZA816566B/xx unknown
- 1981-09-22 US US06/304,686 patent/US4387151A/en not_active Expired - Lifetime
- 1981-09-23 IL IL63915A patent/IL63915A/xx unknown
- 1981-09-23 FI FI812958A patent/FI68130C/fi not_active IP Right Cessation
- 1981-09-24 DK DK421781A patent/DK421781A/da not_active Application Discontinuation
- 1981-09-24 JP JP56149659A patent/JPS5794747A/ja active Granted
- 1981-09-24 KR KR1019810003577A patent/KR880001192B1/ko active
- 1981-09-24 BR BR8106124A patent/BR8106124A/pt not_active IP Right Cessation
-
1985
- 1985-04-22 SG SG289/85A patent/SG28985G/en unknown
Also Published As
Publication number | Publication date |
---|---|
FI812958L (fi) | 1982-03-26 |
IL63915A (en) | 1984-07-31 |
ZA816566B (en) | 1982-09-29 |
DE3163089D1 (en) | 1984-05-17 |
DK421781A (da) | 1982-03-26 |
FI68130B (fi) | 1985-03-29 |
JPS64686B2 (ko) | 1989-01-09 |
ATE7084T1 (de) | 1984-04-15 |
EP0048876A1 (de) | 1982-04-07 |
BR8106124A (pt) | 1982-06-15 |
US4387151A (en) | 1983-06-07 |
JPS5794747A (en) | 1982-06-12 |
IL63915A0 (en) | 1981-12-31 |
KR880001192B1 (ko) | 1988-07-02 |
SG28985G (en) | 1985-11-15 |
AU539603B2 (en) | 1984-10-04 |
CA1164711A (en) | 1984-04-03 |
DE3036077A1 (de) | 1982-05-06 |
AU7566581A (en) | 1982-04-01 |
FI68130C (fi) | 1985-07-10 |
EP0048876B1 (de) | 1984-04-11 |
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