KR830003749A - 자외선 유도 디택키피케이션에 적합한 압력민감접착제 제조방법 - Google Patents
자외선 유도 디택키피케이션에 적합한 압력민감접착제 제조방법 Download PDFInfo
- Publication number
- KR830003749A KR830003749A KR1019800002854A KR800002854A KR830003749A KR 830003749 A KR830003749 A KR 830003749A KR 1019800002854 A KR1019800002854 A KR 1019800002854A KR 800002854 A KR800002854 A KR 800002854A KR 830003749 A KR830003749 A KR 830003749A
- Authority
- KR
- South Korea
- Prior art keywords
- product
- oxirane ring
- salt
- polymer
- adhesive
- Prior art date
Links
- 239000004820 Pressure-sensitive adhesive Substances 0.000 title claims 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 125000000466 oxiranyl group Chemical group 0.000 claims 7
- 239000000463 material Substances 0.000 claims 5
- 229920000642 polymer Polymers 0.000 claims 5
- 150000003839 salts Chemical class 0.000 claims 5
- 239000000853 adhesive Substances 0.000 claims 4
- 230000001070 adhesive effect Effects 0.000 claims 4
- 239000003999 initiator Substances 0.000 claims 4
- 239000000178 monomer Substances 0.000 claims 4
- 230000003287 optical effect Effects 0.000 claims 4
- 238000006116 polymerization reaction Methods 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 239000003054 catalyst Substances 0.000 claims 3
- 229920001971 elastomer Polymers 0.000 claims 3
- 125000005409 triarylsulfonium group Chemical group 0.000 claims 3
- FYELGSIOXSRGGW-UHFFFAOYSA-N (2-aminoacetyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(=O)CN FYELGSIOXSRGGW-UHFFFAOYSA-N 0.000 claims 1
- JECYNCQXXKQDJN-UHFFFAOYSA-N 2-(2-methylhexan-2-yloxymethyl)oxirane Chemical compound CCCCC(C)(C)OCC1CO1 JECYNCQXXKQDJN-UHFFFAOYSA-N 0.000 claims 1
- LSWYGACWGAICNM-UHFFFAOYSA-N 2-(prop-2-enoxymethyl)oxirane Chemical compound C=CCOCC1CO1 LSWYGACWGAICNM-UHFFFAOYSA-N 0.000 claims 1
- JHPNVNIEXXLNTR-UHFFFAOYSA-N 4-(trimethylammonio)butanoate Chemical compound C[N+](C)(C)CCCC([O-])=O JHPNVNIEXXLNTR-UHFFFAOYSA-N 0.000 claims 1
- DXPPIEDUBFUSEZ-UHFFFAOYSA-N 6-methylheptyl prop-2-enoate Chemical group CC(C)CCCCCOC(=O)C=C DXPPIEDUBFUSEZ-UHFFFAOYSA-N 0.000 claims 1
- 239000004593 Epoxy Substances 0.000 claims 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 claims 1
- 238000012423 maintenance Methods 0.000 claims 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- YCWSUKQGVSGXJO-NTUHNPAUSA-N nifuroxazide Chemical group C1=CC(O)=CC=C1C(=O)N\N=C\C1=CC=C([N+]([O-])=O)O1 YCWSUKQGVSGXJO-NTUHNPAUSA-N 0.000 claims 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 230000002285 radioactive effect Effects 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 claims 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
- G09F3/08—Fastening or securing by means not forming part of the material of the label itself
- G09F3/10—Fastening or securing by means not forming part of the material of the label itself by an adhesive layer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
- C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/385—Acrylic polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0012—Processes making use of the tackiness of the photolithographic materials, e.g. for mounting; Packaging for photolithographic material; Packages obtained by processing photolithographic materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
- G09F3/02—Forms or constructions
- G09F2003/023—Adhesive
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
- G09F3/02—Forms or constructions
- G09F2003/023—Adhesive
- G09F2003/0241—Repositionable or pressure sensitive adhesive
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1153—Temperature change for delamination [e.g., heating during delaminating, etc.]
- Y10T156/1158—Electromagnetic radiation applied to work for delamination [e.g., microwave, uv, ir, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
- Y10T428/2809—Web or sheet containing structurally defined element or component and having an adhesive outermost layer including irradiated or wave energy treated component
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
- Epoxy Resins (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (10)
- 접착제가 악티닌방사유지를 위해 용이하게 끈적거림이 제거되고, 옥시란 확의 중합을 향상시키기 위해 효과적인 양에서 트리아랄 썰포늄 착합물염과 Va족 금속 헥사플루오라이드를 포함하는 디아릴 할로늄 Va, VI 염또 Ⅶa족의 오니움 촉매; Va 또는 VIa족의 방사성 방향족 오니움염으로된 것에서 선택한 이온성 광학개시제와 접착제의 에폭시 당량이 400-900임을 특징으로 하는 옥시란환과 이온 성광학개시제를 포함한 끈적끈적하고 압력에 민감한 접착제.
- 광학개시제가 오니움염인 것을 특징으로 하는 청구범위 제1항의 제품.
- 오니움염이 트리아릴 썰포늄염임을 특징으로하는 청구범위 제2항의 제품.
- 트리아릴 썰포늄염이 하기구조식의 트리아릴썰포늄 착합물염임을 특징으로 하는 청구범위 제3항의 제품.상기식에서 X는 F또는 OH이고, R1, R2, R3, R4는 H, 저급알킬 또는 할로겐에서 선택한다.
- 쉬트물질의 한면과 견고하게 결합하는 것을 특징으로하는 청구범위 제2, 3, 4항의 제품의 층.
- 압력-민감 접착제가(가) 하기성분으로 이루어진 모노머의 끈적한 고무질중합체.1) 끈적한 고무질상태에 중합할 수 있는 모노머계의 65-80%2) 글리시딜 아크릴레이트, 글리시딜 메타크릴레이트, 글리시딜 알릴에테르중에서 선택한 모노머로 이루어진 옥시란환의 35-20%.(나) 옥시란환의 중합을 증가시킬 수 있는 이온 광학개시제 촉매로 이루어지고 쉬트물질이 보통조건하에서 강력하게 접착하고 필요한 기질에 적용될 수 있으며, 옥시란환의 중합을 이온적으로 개시하는 자외선 조사후에 용이하게 제거할 수 있고, 중합체의 접착구조를 변경시키며 기질에 접착을 제거하는 것을 특징으로하는 쉬트물질의 1면과 결합하는 청구범위 제2, 3, 4항의 제품의 층.
- 중합체계가 아크릴레이트와 메타크릴레이트로 이루어지는 것으로부터 선택한 모노머로 이루어지는 것을 특징으로하는 청구범위 제6항의 제품.
- 점착질 고무중합체가 이소옥틸 아크릴레이트와 글리실 메타크릴레이트인 것을 특징으로 하는 청구범위 제7항의 제품.
- 점착질 고무중합체가 로릴 아크릴레이트와 끝리시딜 메타크릴레이트의 공중합체인 것을 특징으로하는 청구범위 제7항의 제품.
- 접착제가 점착질이고 하기 물질로 혼합되어 압력 민감접착제로서(가) 옥시란 환의 수지(나) 옥시란 환의 중합을 향상시킬 수 있는 이온성 광학 개시제 촉매쉬트물질이 필요한 기질에 사용할 수 있고, 표준조건하에 견고하게 접착하며, 옥시란환의 중합을 자외선에 의해 이온적으로 개시한 후 용이하게 제거할 수 있으며, 중합체의 구조를 바꾸고, 기질에 대한 접착을 제거하는 것을 특징으로 하여, 쉬트물질의 1면과 결합하는 청구범위 제2, 3, 4항에서의 제품의 층.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US60276 | 1979-07-25 | ||
US06/060,276 US4286047A (en) | 1979-07-25 | 1979-07-25 | Pressure-sensitive adhesive susceptible to ultraviolet light-induced detackification |
Publications (2)
Publication Number | Publication Date |
---|---|
KR830003749A true KR830003749A (ko) | 1983-06-22 |
KR830002705B1 KR830002705B1 (ko) | 1983-12-08 |
Family
ID=22028488
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019800002854A KR830002705B1 (ko) | 1979-07-25 | 1980-07-18 | 감압 접착제 |
Country Status (10)
Country | Link |
---|---|
US (1) | US4286047A (ko) |
EP (1) | EP0032936B1 (ko) |
JP (1) | JPS56500889A (ko) |
KR (1) | KR830002705B1 (ko) |
AT (1) | ATE15727T1 (ko) |
BR (1) | BR8008768A (ko) |
CA (1) | CA1124935A (ko) |
DE (1) | DE3071094D1 (ko) |
IT (1) | IT1188944B (ko) |
WO (1) | WO1981000309A1 (ko) |
Families Citing this family (58)
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US4404246A (en) * | 1982-09-22 | 1983-09-13 | Minnesota Mining And Manufacturing Company | Storable, crosslinkable pressure-sensitive adhesive tape |
US4396675A (en) * | 1982-09-22 | 1983-08-02 | Minnesota Mining And Manufacturing Company | Storable, crosslinkable pressure-sensitive adhesive tape |
US4671975A (en) * | 1983-02-04 | 1987-06-09 | The Garrett Corporation | Radiant heat reflective inflatable structure |
US4582734A (en) * | 1983-02-04 | 1986-04-15 | The Garrett Corporation | Radiant heat reflective inflatable structure and methods for making same |
GB2137626B (en) * | 1983-03-31 | 1986-10-15 | Sericol Group Ltd | Water based photopolymerisable compositions and their use |
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US4558792A (en) * | 1984-04-12 | 1985-12-17 | Baxter Travenol Laboratories, Inc. | Container such as a nursing container, with flexible liner and access site and method of making said access site |
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KR101650693B1 (ko) | 2010-03-09 | 2016-08-25 | 헨켈 아이피 앤드 홀딩 게엠베하 | 압력 감응성 접착제를 위한 양이온성 uv가교성 아크릴 중합체 |
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-
1979
- 1979-07-25 US US06/060,276 patent/US4286047A/en not_active Expired - Lifetime
-
1980
- 1980-06-30 JP JP50185680A patent/JPS56500889A/ja active Pending
- 1980-06-30 BR BR8008768A patent/BR8008768A/pt unknown
- 1980-06-30 WO PCT/US1980/000822 patent/WO1981000309A1/en active IP Right Grant
- 1980-06-30 AT AT80901560T patent/ATE15727T1/de not_active IP Right Cessation
- 1980-06-30 DE DE8080901560T patent/DE3071094D1/de not_active Expired
- 1980-07-03 CA CA355,347A patent/CA1124935A/en not_active Expired
- 1980-07-18 KR KR1019800002854A patent/KR830002705B1/ko active
- 1980-07-24 IT IT49321/80A patent/IT1188944B/it active
-
1981
- 1981-02-09 EP EP80901560A patent/EP0032936B1/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
KR830002705B1 (ko) | 1983-12-08 |
IT8049321A1 (it) | 1982-01-24 |
IT8049321A0 (it) | 1980-07-24 |
EP0032936A1 (en) | 1981-08-05 |
IT1188944B (it) | 1988-01-28 |
DE3071094D1 (en) | 1985-10-24 |
EP0032936A4 (en) | 1982-08-05 |
JPS56500889A (ko) | 1981-07-02 |
CA1124935A (en) | 1982-06-01 |
WO1981000309A1 (en) | 1981-02-05 |
EP0032936B1 (en) | 1985-09-18 |
BR8008768A (pt) | 1981-05-26 |
US4286047A (en) | 1981-08-25 |
ATE15727T1 (de) | 1985-10-15 |
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