KR20250150034A - 하전 입자선 장치 - Google Patents

하전 입자선 장치

Info

Publication number
KR20250150034A
KR20250150034A KR1020257030052A KR20257030052A KR20250150034A KR 20250150034 A KR20250150034 A KR 20250150034A KR 1020257030052 A KR1020257030052 A KR 1020257030052A KR 20257030052 A KR20257030052 A KR 20257030052A KR 20250150034 A KR20250150034 A KR 20250150034A
Authority
KR
South Korea
Prior art keywords
charged particle
particle beam
beam device
imaging conditions
paragraph
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257030052A
Other languages
English (en)
Korean (ko)
Inventor
나호 구라사꼬
도시유끼 요꼬스까
히데유끼 고쯔지
가쯔히꼬 시라이시
하지메 가와노
Original Assignee
주식회사 히타치하이테크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 히타치하이테크 filed Critical 주식회사 히타치하이테크
Publication of KR20250150034A publication Critical patent/KR20250150034A/ko
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020257030052A 2023-06-27 2023-06-27 하전 입자선 장치 Pending KR20250150034A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/023832 WO2025004191A1 (ja) 2023-06-27 2023-06-27 荷電粒子線装置

Publications (1)

Publication Number Publication Date
KR20250150034A true KR20250150034A (ko) 2025-10-17

Family

ID=93937826

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257030052A Pending KR20250150034A (ko) 2023-06-27 2023-06-27 하전 입자선 장치

Country Status (4)

Country Link
JP (1) JPWO2025004191A1 (https=)
KR (1) KR20250150034A (https=)
TW (1) TWI908100B (https=)
WO (1) WO2025004191A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022185390A1 (ja) * 2021-03-01 2022-09-09 株式会社日立ハイテク 荷電粒子線装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011210509A (ja) 2010-03-30 2011-10-20 Hitachi High-Technologies Corp 電子ビーム照射方法、及び走査電子顕微鏡
WO2015045498A1 (ja) 2013-09-26 2015-04-02 株式会社 日立ハイテクノロジーズ 荷電粒子線装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6576923B2 (en) * 2000-04-18 2003-06-10 Kla-Tencor Corporation Inspectable buried test structures and methods for inspecting the same
JP4248382B2 (ja) * 2003-12-04 2009-04-02 株式会社日立ハイテクノロジーズ 荷電粒子ビームによる検査方法および検査装置
JP2005268522A (ja) * 2004-03-18 2005-09-29 Sony Corp 露光装置、露光方法および半導体装置の製造方法
JP2009531855A (ja) * 2006-03-27 2009-09-03 マルチビーム システムズ インコーポレイテッド 高電流密度パターン化荷電粒子ビーム生成のための光学系
JP5823136B2 (ja) * 2011-02-10 2015-11-25 株式会社日立ハイテクノロジーズ 走査型荷電粒子顕微鏡及び試料観察方法
JP7305422B2 (ja) * 2019-05-13 2023-07-10 株式会社日立ハイテク パターン評価システム及びパターン評価方法
WO2022185390A1 (ja) * 2021-03-01 2022-09-09 株式会社日立ハイテク 荷電粒子線装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011210509A (ja) 2010-03-30 2011-10-20 Hitachi High-Technologies Corp 電子ビーム照射方法、及び走査電子顕微鏡
WO2015045498A1 (ja) 2013-09-26 2015-04-02 株式会社 日立ハイテクノロジーズ 荷電粒子線装置

Also Published As

Publication number Publication date
WO2025004191A1 (ja) 2025-01-02
JPWO2025004191A1 (https=) 2025-01-02
TW202501532A (zh) 2025-01-01
TWI908100B (zh) 2025-12-11

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PG1501 Laying open of application

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D13 Search requested

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D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000