KR20250070073A - 기재 세정 장치 - Google Patents

기재 세정 장치 Download PDF

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Publication number
KR20250070073A
KR20250070073A KR1020257012331A KR20257012331A KR20250070073A KR 20250070073 A KR20250070073 A KR 20250070073A KR 1020257012331 A KR1020257012331 A KR 1020257012331A KR 20257012331 A KR20257012331 A KR 20257012331A KR 20250070073 A KR20250070073 A KR 20250070073A
Authority
KR
South Korea
Prior art keywords
mist
substrate
cleaning
gas
air gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257012331A
Other languages
English (en)
Korean (ko)
Inventor
고오세이 고토오
다카히로 히라마츠
히로유키 오리타
아키히로 이치노세
노부요시 나미토
히로시 야나기모토
게이지 구로다
렌타로 모리
Original Assignee
가부시키가이샤 티마이크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 티마이크 filed Critical 가부시키가이샤 티마이크
Publication of KR20250070073A publication Critical patent/KR20250070073A/ko
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • B08B5/023—Cleaning travelling work
    • H01L21/67028—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020257012331A 2023-09-21 2023-09-21 기재 세정 장치 Pending KR20250070073A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/034315 WO2025062573A1 (ja) 2023-09-21 2023-09-21 基材洗浄装置

Publications (1)

Publication Number Publication Date
KR20250070073A true KR20250070073A (ko) 2025-05-20

Family

ID=95072355

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257012331A Pending KR20250070073A (ko) 2023-09-21 2023-09-21 기재 세정 장치

Country Status (6)

Country Link
JP (1) JP7827837B2 (https=)
KR (1) KR20250070073A (https=)
CN (1) CN120035488A (https=)
DE (1) DE112023003433T5 (https=)
TW (1) TW202514776A (https=)
WO (1) WO2025062573A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1176962A (ja) 1997-09-02 1999-03-23 Puretetsuku:Kk 密閉型洗浄装置およびこの装置を用いて精密基板を洗浄する方法
JP2007033730A (ja) 2005-07-26 2007-02-08 Optrex Corp 洗浄装置及び液晶パネルの製造方法
JP2009136742A (ja) 2007-12-05 2009-06-25 Pioneer Electronic Corp 基板洗浄装置
JP2020018993A (ja) 2018-08-03 2020-02-06 三菱重工業株式会社 洗浄装置、表面処理装置および洗浄方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6095991U (ja) * 1983-12-02 1985-06-29 株式会社　東京精密 洗浄用ノズル
WO2001000336A1 (en) * 1999-06-24 2001-01-04 Sumitomo Heavy Industries, Ltd. Method and device for washing by fluid spraying
JP2005012197A (ja) * 2003-05-26 2005-01-13 Sumitomo Heavy Ind Ltd エアロゾル洗浄方法及び装置
JP2005166792A (ja) * 2003-12-01 2005-06-23 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3769583B1 (ja) * 2004-07-09 2006-04-26 積水化学工業株式会社 基材処理装置及び方法
JP2006140306A (ja) * 2004-11-12 2006-06-01 Dainippon Screen Mfg Co Ltd 基板洗浄装置および基板洗浄方法
JP4802002B2 (ja) * 2006-01-30 2011-10-26 芝浦メカトロニクス株式会社 基板の洗浄処理装置及び洗浄処理方法
JP4938357B2 (ja) * 2006-05-31 2012-05-23 ナノミストテクノロジーズ株式会社 洗浄方法と洗浄装置
JP4413266B1 (ja) * 2008-12-15 2010-02-10 アクアサイエンス株式会社 対象物洗浄方法及び対象物洗浄システム
JP5757003B1 (ja) * 2014-12-12 2015-07-29 アクアサイエンス株式会社 液滴噴射流生成装置及び液滴噴射流生成方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1176962A (ja) 1997-09-02 1999-03-23 Puretetsuku:Kk 密閉型洗浄装置およびこの装置を用いて精密基板を洗浄する方法
JP2007033730A (ja) 2005-07-26 2007-02-08 Optrex Corp 洗浄装置及び液晶パネルの製造方法
JP2009136742A (ja) 2007-12-05 2009-06-25 Pioneer Electronic Corp 基板洗浄装置
JP2020018993A (ja) 2018-08-03 2020-02-06 三菱重工業株式会社 洗浄装置、表面処理装置および洗浄方法

Also Published As

Publication number Publication date
JP7827837B2 (ja) 2026-03-10
WO2025062573A1 (ja) 2025-03-27
CN120035488A (zh) 2025-05-23
JPWO2025062573A1 (https=) 2025-03-27
TW202514776A (zh) 2025-04-01
DE112023003433T5 (de) 2025-06-12

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