JPWO2025062573A1 - - Google Patents

Info

Publication number
JPWO2025062573A1
JPWO2025062573A1 JP2024515140A JP2024515140A JPWO2025062573A1 JP WO2025062573 A1 JPWO2025062573 A1 JP WO2025062573A1 JP 2024515140 A JP2024515140 A JP 2024515140A JP 2024515140 A JP2024515140 A JP 2024515140A JP WO2025062573 A1 JPWO2025062573 A1 JP WO2025062573A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2024515140A
Other languages
Japanese (ja)
Other versions
JP7827837B2 (ja
JPWO2025062573A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2025062573A1 publication Critical patent/JPWO2025062573A1/ja
Publication of JPWO2025062573A5 publication Critical patent/JPWO2025062573A5/ja
Application granted granted Critical
Publication of JP7827837B2 publication Critical patent/JP7827837B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • B08B5/023—Cleaning travelling work
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
JP2024515140A 2023-09-21 2023-09-21 基材洗浄装置 Active JP7827837B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/034315 WO2025062573A1 (ja) 2023-09-21 2023-09-21 基材洗浄装置

Publications (3)

Publication Number Publication Date
JPWO2025062573A1 true JPWO2025062573A1 (https=) 2025-03-27
JPWO2025062573A5 JPWO2025062573A5 (https=) 2025-08-27
JP7827837B2 JP7827837B2 (ja) 2026-03-10

Family

ID=95072355

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024515140A Active JP7827837B2 (ja) 2023-09-21 2023-09-21 基材洗浄装置

Country Status (6)

Country Link
JP (1) JP7827837B2 (https=)
KR (1) KR20250070073A (https=)
CN (1) CN120035488A (https=)
DE (1) DE112023003433T5 (https=)
TW (1) TW202514776A (https=)
WO (1) WO2025062573A1 (https=)

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6095991U (ja) * 1983-12-02 1985-06-29 株式会社　東京精密 洗浄用ノズル
WO2001000336A1 (en) * 1999-06-24 2001-01-04 Sumitomo Heavy Industries, Ltd. Method and device for washing by fluid spraying
JP2005012197A (ja) * 2003-05-26 2005-01-13 Sumitomo Heavy Ind Ltd エアロゾル洗浄方法及び装置
JP2005166792A (ja) * 2003-12-01 2005-06-23 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2006140306A (ja) * 2004-11-12 2006-06-01 Dainippon Screen Mfg Co Ltd 基板洗浄装置および基板洗浄方法
JP2006287169A (ja) * 2004-07-09 2006-10-19 Sekisui Chem Co Ltd 基材処理装置及び方法
JP2007033730A (ja) * 2005-07-26 2007-02-08 Optrex Corp 洗浄装置及び液晶パネルの製造方法
JP2007201374A (ja) * 2006-01-30 2007-08-09 Shibaura Mechatronics Corp 基板の洗浄処理装置及び洗浄処理方法
JP2007324359A (ja) * 2006-05-31 2007-12-13 Choonpa Jozosho Kk 洗浄方法と洗浄装置
JP2009136742A (ja) * 2007-12-05 2009-06-25 Pioneer Electronic Corp 基板洗浄装置
WO2010071005A1 (ja) * 2008-12-15 2010-06-24 アクアサイエンス株式会社 対象物洗浄方法及び対象物洗浄システム
JP2016112495A (ja) * 2014-12-12 2016-06-23 アクアサイエンス株式会社 液滴噴射流生成装置及び液滴噴射流生成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3565690B2 (ja) 1997-09-02 2004-09-15 株式会社プレテック 密閉型洗浄装置およびこの装置を用いて精密基板を洗浄する方法
JP2020018993A (ja) 2018-08-03 2020-02-06 三菱重工業株式会社 洗浄装置、表面処理装置および洗浄方法

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6095991U (ja) * 1983-12-02 1985-06-29 株式会社　東京精密 洗浄用ノズル
WO2001000336A1 (en) * 1999-06-24 2001-01-04 Sumitomo Heavy Industries, Ltd. Method and device for washing by fluid spraying
JP2005012197A (ja) * 2003-05-26 2005-01-13 Sumitomo Heavy Ind Ltd エアロゾル洗浄方法及び装置
JP2005166792A (ja) * 2003-12-01 2005-06-23 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2006287169A (ja) * 2004-07-09 2006-10-19 Sekisui Chem Co Ltd 基材処理装置及び方法
JP2006140306A (ja) * 2004-11-12 2006-06-01 Dainippon Screen Mfg Co Ltd 基板洗浄装置および基板洗浄方法
JP2007033730A (ja) * 2005-07-26 2007-02-08 Optrex Corp 洗浄装置及び液晶パネルの製造方法
JP2007201374A (ja) * 2006-01-30 2007-08-09 Shibaura Mechatronics Corp 基板の洗浄処理装置及び洗浄処理方法
JP2007324359A (ja) * 2006-05-31 2007-12-13 Choonpa Jozosho Kk 洗浄方法と洗浄装置
JP2009136742A (ja) * 2007-12-05 2009-06-25 Pioneer Electronic Corp 基板洗浄装置
WO2010071005A1 (ja) * 2008-12-15 2010-06-24 アクアサイエンス株式会社 対象物洗浄方法及び対象物洗浄システム
JP2016112495A (ja) * 2014-12-12 2016-06-23 アクアサイエンス株式会社 液滴噴射流生成装置及び液滴噴射流生成方法

Also Published As

Publication number Publication date
JP7827837B2 (ja) 2026-03-10
WO2025062573A1 (ja) 2025-03-27
KR20250070073A (ko) 2025-05-20
CN120035488A (zh) 2025-05-23
TW202514776A (zh) 2025-04-01
DE112023003433T5 (de) 2025-06-12

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