DE112023003433T5 - Substratreinigungsgerät - Google Patents

Substratreinigungsgerät Download PDF

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Publication number
DE112023003433T5
DE112023003433T5 DE112023003433.8T DE112023003433T DE112023003433T5 DE 112023003433 T5 DE112023003433 T5 DE 112023003433T5 DE 112023003433 T DE112023003433 T DE 112023003433T DE 112023003433 T5 DE112023003433 T5 DE 112023003433T5
Authority
DE
Germany
Prior art keywords
mist
base material
cleaning
gas
air gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE112023003433.8T
Other languages
German (de)
English (en)
Inventor
Kohsei Gotoh
Takahiro Hiramatsu
Hiroyuki Orita
Akihiro Ichinose
Nobuyoshi NAMITO
Hiroshi Yanagimoto
Keiji Kuroda
Rentaro Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
TMEIC Corp
Original Assignee
Toyota Motor Corp
TMEIC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyota Motor Corp, TMEIC Corp filed Critical Toyota Motor Corp
Publication of DE112023003433T5 publication Critical patent/DE112023003433T5/de
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • B08B5/023—Cleaning travelling work
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
DE112023003433.8T 2023-09-21 2023-09-21 Substratreinigungsgerät Pending DE112023003433T5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/034315 WO2025062573A1 (ja) 2023-09-21 2023-09-21 基材洗浄装置

Publications (1)

Publication Number Publication Date
DE112023003433T5 true DE112023003433T5 (de) 2025-06-12

Family

ID=95072355

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112023003433.8T Pending DE112023003433T5 (de) 2023-09-21 2023-09-21 Substratreinigungsgerät

Country Status (6)

Country Link
JP (1) JP7827837B2 (https=)
KR (1) KR20250070073A (https=)
CN (1) CN120035488A (https=)
DE (1) DE112023003433T5 (https=)
TW (1) TW202514776A (https=)
WO (1) WO2025062573A1 (https=)

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6095991U (ja) * 1983-12-02 1985-06-29 株式会社　東京精密 洗浄用ノズル
JP3565690B2 (ja) 1997-09-02 2004-09-15 株式会社プレテック 密閉型洗浄装置およびこの装置を用いて精密基板を洗浄する方法
WO2001000336A1 (en) * 1999-06-24 2001-01-04 Sumitomo Heavy Industries, Ltd. Method and device for washing by fluid spraying
JP2005012197A (ja) * 2003-05-26 2005-01-13 Sumitomo Heavy Ind Ltd エアロゾル洗浄方法及び装置
JP2005166792A (ja) * 2003-12-01 2005-06-23 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3769583B1 (ja) * 2004-07-09 2006-04-26 積水化学工業株式会社 基材処理装置及び方法
JP2006140306A (ja) * 2004-11-12 2006-06-01 Dainippon Screen Mfg Co Ltd 基板洗浄装置および基板洗浄方法
JP2007033730A (ja) 2005-07-26 2007-02-08 Optrex Corp 洗浄装置及び液晶パネルの製造方法
JP4802002B2 (ja) * 2006-01-30 2011-10-26 芝浦メカトロニクス株式会社 基板の洗浄処理装置及び洗浄処理方法
JP4938357B2 (ja) * 2006-05-31 2012-05-23 ナノミストテクノロジーズ株式会社 洗浄方法と洗浄装置
JP2009136742A (ja) 2007-12-05 2009-06-25 Pioneer Electronic Corp 基板洗浄装置
JP4413266B1 (ja) * 2008-12-15 2010-02-10 アクアサイエンス株式会社 対象物洗浄方法及び対象物洗浄システム
JP5757003B1 (ja) * 2014-12-12 2015-07-29 アクアサイエンス株式会社 液滴噴射流生成装置及び液滴噴射流生成方法
JP2020018993A (ja) 2018-08-03 2020-02-06 三菱重工業株式会社 洗浄装置、表面処理装置および洗浄方法

Also Published As

Publication number Publication date
JP7827837B2 (ja) 2026-03-10
WO2025062573A1 (ja) 2025-03-27
KR20250070073A (ko) 2025-05-20
CN120035488A (zh) 2025-05-23
JPWO2025062573A1 (https=) 2025-03-27
TW202514776A (zh) 2025-04-01

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