KR20240011694A - 막 두께 측정 장치 및 막 두께 측정 방법 - Google Patents

막 두께 측정 장치 및 막 두께 측정 방법 Download PDF

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Publication number
KR20240011694A
KR20240011694A KR1020237039201A KR20237039201A KR20240011694A KR 20240011694 A KR20240011694 A KR 20240011694A KR 1020237039201 A KR1020237039201 A KR 1020237039201A KR 20237039201 A KR20237039201 A KR 20237039201A KR 20240011694 A KR20240011694 A KR 20240011694A
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KR
South Korea
Prior art keywords
film thickness
light
wavelength
measurement object
luminance
Prior art date
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Pending
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KR1020237039201A
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English (en)
Korean (ko)
Inventor
구니히코 츠치야
사토시 아라노
겐이치 오츠카
Original Assignee
하마마츠 포토닉스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 하마마츠 포토닉스 가부시키가이샤 filed Critical 하마마츠 포토닉스 가부시키가이샤
Priority claimed from PCT/JP2022/002675 external-priority patent/WO2022244309A1/ja
Publication of KR20240011694A publication Critical patent/KR20240011694A/ko
Pending legal-status Critical Current

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/255Details, e.g. use of specially adapted sources, lighting or optical systems
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G01N21/274Calibration, base line adjustment, drift correction
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/314Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020237039201A 2021-05-21 2022-01-25 막 두께 측정 장치 및 막 두께 측정 방법 Pending KR20240011694A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021086172 2021-05-21
JPJP-P-2021-086172 2021-05-21
PCT/JP2022/002675 WO2022244309A1 (ja) 2021-05-21 2022-01-25 膜厚測定装置及び膜厚測定方法

Publications (1)

Publication Number Publication Date
KR20240011694A true KR20240011694A (ko) 2024-01-26

Family

ID=82850922

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237039201A Pending KR20240011694A (ko) 2021-05-21 2022-01-25 막 두께 측정 장치 및 막 두께 측정 방법

Country Status (5)

Country Link
US (1) US20240240933A1 (https=)
EP (1) EP4343274A4 (https=)
JP (3) JP7121222B1 (https=)
KR (1) KR20240011694A (https=)
CN (1) CN117355724A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026074789A1 (ja) * 2024-10-01 2026-04-09 浜松ホトニクス株式会社 膜厚測定方法及び膜厚測定装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013145229A (ja) 2011-12-16 2013-07-25 Toray Eng Co Ltd 干渉色のモデル適合による膜厚測定方法およびその装置
JP2014085112A (ja) 2012-10-19 2014-05-12 Toray Eng Co Ltd クロストーク補正係数算出方法およびクロストーク補正係数算出機能を備えた透明膜の膜厚測定装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6137575A (en) * 1997-10-24 2000-10-24 Canon Kabushiki Kaisha Film thickness measuring method and apparatus
JP2001356050A (ja) * 2000-06-14 2001-12-26 Toray Ind Inc 分光方法及びフィルムの製造方法
JP3852556B2 (ja) * 2000-09-08 2006-11-29 オムロン株式会社 膜厚測定方法およびその方法を用いた膜厚センサ
JP3995579B2 (ja) * 2002-10-18 2007-10-24 大日本スクリーン製造株式会社 膜厚測定装置および反射率測定装置
JP2006153770A (ja) * 2004-11-30 2006-06-15 Omron Corp 分光計測装置
JP4834847B2 (ja) * 2007-10-05 2011-12-14 大塚電子株式会社 多層膜解析装置および多層膜解析方法
JP2010117161A (ja) 2008-11-11 2010-05-27 Nikon Corp 検査装置
JP2012063321A (ja) * 2010-09-17 2012-03-29 Hamamatsu Photonics Kk 反射率測定装置、反射率測定方法、膜厚測定装置及び膜厚測定方法
JP2013032981A (ja) * 2011-08-02 2013-02-14 Otsuka Denshi Co Ltd 膜厚測定装置
JP2017044596A (ja) * 2015-08-27 2017-03-02 東レエンジニアリング株式会社 膜厚測定装置および膜厚測定方法
JP6762221B2 (ja) * 2016-12-19 2020-09-30 大塚電子株式会社 光学特性測定装置および光学特性測定方法
JP2019144118A (ja) * 2018-02-21 2019-08-29 Jfeテクノリサーチ株式会社 膜厚測定装置及び膜厚測定方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013145229A (ja) 2011-12-16 2013-07-25 Toray Eng Co Ltd 干渉色のモデル適合による膜厚測定方法およびその装置
JP2014085112A (ja) 2012-10-19 2014-05-12 Toray Eng Co Ltd クロストーク補正係数算出方法およびクロストーク補正係数算出機能を備えた透明膜の膜厚測定装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
기타가와 카츠이치, 오오츠키 마사후미, "간섭색 화상 해석에 의한 투명막의 광(廣)시야 막 두께 분포 측정 장치의 개발", 정밀 공학 회지 79(11), 1078-1082, 2013.

Also Published As

Publication number Publication date
CN117355724A (zh) 2024-01-05
JP2026053393A (ja) 2026-03-25
JP2022179471A (ja) 2022-12-02
JP7121222B1 (ja) 2022-08-17
EP4343274A1 (en) 2024-03-27
EP4343274A4 (en) 2025-05-28
US20240240933A1 (en) 2024-07-18
JP7788358B2 (ja) 2025-12-18
JPWO2022244309A1 (https=) 2022-11-24

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