CN117355724A - 膜厚测定装置及膜厚测定方法 - Google Patents

膜厚测定装置及膜厚测定方法 Download PDF

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Publication number
CN117355724A
CN117355724A CN202280036313.5A CN202280036313A CN117355724A CN 117355724 A CN117355724 A CN 117355724A CN 202280036313 A CN202280036313 A CN 202280036313A CN 117355724 A CN117355724 A CN 117355724A
Authority
CN
China
Prior art keywords
film thickness
light
wavelength
information
luminance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280036313.5A
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English (en)
Chinese (zh)
Inventor
土屋邦彦
荒野谕
大塚贤一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hamamatsu Photonics KK
Original Assignee
Hamamatsu Photonics KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics KK filed Critical Hamamatsu Photonics KK
Priority claimed from PCT/JP2022/002675 external-priority patent/WO2022244309A1/ja
Publication of CN117355724A publication Critical patent/CN117355724A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/255—Details, e.g. use of specially adapted sources, lighting or optical systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G01N21/274—Calibration, base line adjustment, drift correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Length Measuring Devices By Optical Means (AREA)
CN202280036313.5A 2021-05-21 2022-01-25 膜厚测定装置及膜厚测定方法 Pending CN117355724A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021086172 2021-05-21
JP2021-086172 2021-05-21
PCT/JP2022/002675 WO2022244309A1 (ja) 2021-05-21 2022-01-25 膜厚測定装置及び膜厚測定方法

Publications (1)

Publication Number Publication Date
CN117355724A true CN117355724A (zh) 2024-01-05

Family

ID=82850922

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280036313.5A Pending CN117355724A (zh) 2021-05-21 2022-01-25 膜厚测定装置及膜厚测定方法

Country Status (5)

Country Link
US (1) US20240240933A1 (https=)
EP (1) EP4343274A4 (https=)
JP (3) JP7121222B1 (https=)
KR (1) KR20240011694A (https=)
CN (1) CN117355724A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026074789A1 (ja) * 2024-10-01 2026-04-09 浜松ホトニクス株式会社 膜厚測定方法及び膜厚測定装置

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6137575A (en) * 1997-10-24 2000-10-24 Canon Kabushiki Kaisha Film thickness measuring method and apparatus
JP2001356050A (ja) * 2000-06-14 2001-12-26 Toray Ind Inc 分光方法及びフィルムの製造方法
JP2002081910A (ja) * 2000-09-08 2002-03-22 Omron Corp 膜厚測定方法およびその方法を用いた膜厚センサ
US20040075836A1 (en) * 2002-10-18 2004-04-22 Dainippon Screen Mfg. Co., Ltd. Apparatus for measuring film thickness formed on object, apparatus and method of measuring spectral reflectance of object, and apparatus and method of inspecting foreign material on object
CN1782662A (zh) * 2004-11-30 2006-06-07 欧姆龙株式会社 分光计测装置
JP2009092454A (ja) * 2007-10-05 2009-04-30 Otsuka Denshi Co Ltd 多層膜解析装置および多層膜解析方法
CN102914268A (zh) * 2011-08-02 2013-02-06 大塚电子株式会社 膜厚测量装置
CN103140750A (zh) * 2010-09-17 2013-06-05 浜松光子学株式会社 反射率测定装置、反射率测定方法、膜厚测定装置及膜厚测定方法
JP2017044596A (ja) * 2015-08-27 2017-03-02 東レエンジニアリング株式会社 膜厚測定装置および膜厚測定方法
US20180172431A1 (en) * 2016-12-19 2018-06-21 Otsuka Electronics Co., Ltd. Optical characteristic measuring apparatus and optical characteristic measuring method
JP2019144118A (ja) * 2018-02-21 2019-08-29 Ｊｆｅテクノリサーチ株式会社 膜厚測定装置及び膜厚測定方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010117161A (ja) 2008-11-11 2010-05-27 Nikon Corp 検査装置
WO2013088871A1 (ja) 2011-12-16 2013-06-20 東レエンジニアリング株式会社 干渉色のモデル適合による膜厚測定方法およびその装置
JP5997578B2 (ja) 2012-10-19 2016-09-28 東レエンジニアリング株式会社 クロストーク補正係数算出方法およびクロストーク補正係数算出機能を備えた透明膜の膜厚測定装置

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6137575A (en) * 1997-10-24 2000-10-24 Canon Kabushiki Kaisha Film thickness measuring method and apparatus
JP2001356050A (ja) * 2000-06-14 2001-12-26 Toray Ind Inc 分光方法及びフィルムの製造方法
JP2002081910A (ja) * 2000-09-08 2002-03-22 Omron Corp 膜厚測定方法およびその方法を用いた膜厚センサ
US20040075836A1 (en) * 2002-10-18 2004-04-22 Dainippon Screen Mfg. Co., Ltd. Apparatus for measuring film thickness formed on object, apparatus and method of measuring spectral reflectance of object, and apparatus and method of inspecting foreign material on object
CN1782662A (zh) * 2004-11-30 2006-06-07 欧姆龙株式会社 分光计测装置
JP2006153770A (ja) * 2004-11-30 2006-06-15 Omron Corp 分光計測装置
JP2009092454A (ja) * 2007-10-05 2009-04-30 Otsuka Denshi Co Ltd 多層膜解析装置および多層膜解析方法
CN103140750A (zh) * 2010-09-17 2013-06-05 浜松光子学株式会社 反射率测定装置、反射率测定方法、膜厚测定装置及膜厚测定方法
CN102914268A (zh) * 2011-08-02 2013-02-06 大塚电子株式会社 膜厚测量装置
JP2017044596A (ja) * 2015-08-27 2017-03-02 東レエンジニアリング株式会社 膜厚測定装置および膜厚測定方法
US20180172431A1 (en) * 2016-12-19 2018-06-21 Otsuka Electronics Co., Ltd. Optical characteristic measuring apparatus and optical characteristic measuring method
JP2019144118A (ja) * 2018-02-21 2019-08-29 Ｊｆｅテクノリサーチ株式会社 膜厚測定装置及び膜厚測定方法

Also Published As

Publication number Publication date
JP2026053393A (ja) 2026-03-25
JP2022179471A (ja) 2022-12-02
JP7121222B1 (ja) 2022-08-17
EP4343274A1 (en) 2024-03-27
EP4343274A4 (en) 2025-05-28
US20240240933A1 (en) 2024-07-18
JP7788358B2 (ja) 2025-12-18
KR20240011694A (ko) 2024-01-26
JPWO2022244309A1 (https=) 2022-11-24

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