JP7121222B1 - 膜厚測定装置及び膜厚測定方法 - Google Patents

膜厚測定装置及び膜厚測定方法 Download PDF

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Publication number
JP7121222B1
JP7121222B1 JP2022530802A JP2022530802A JP7121222B1 JP 7121222 B1 JP7121222 B1 JP 7121222B1 JP 2022530802 A JP2022530802 A JP 2022530802A JP 2022530802 A JP2022530802 A JP 2022530802A JP 7121222 B1 JP7121222 B1 JP 7121222B1
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film thickness
light
wavelength
measured
information
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Japanese (ja)
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JPWO2022244309A5 (https=
JPWO2022244309A1 (https=
Inventor
邦彦 土屋
諭 荒野
賢一 大塚
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Hamamatsu Photonics KK
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Hamamatsu Photonics KK
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Priority claimed from PCT/JP2022/002675 external-priority patent/WO2022244309A1/ja
Priority to JP2022124611A priority Critical patent/JP7788358B2/ja
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Publication of JPWO2022244309A1 publication Critical patent/JPWO2022244309A1/ja
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Priority to JP2025241756A priority patent/JP2026053393A/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/255—Details, e.g. use of specially adapted sources, lighting or optical systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G01N21/274—Calibration, base line adjustment, drift correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2022530802A 2021-05-21 2022-01-25 膜厚測定装置及び膜厚測定方法 Active JP7121222B1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2022124611A JP7788358B2 (ja) 2021-05-21 2022-08-04 膜厚測定装置及び膜厚測定方法
JP2025241756A JP2026053393A (ja) 2021-05-21 2025-12-08 膜厚測定装置及び膜厚測定方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021086172 2021-05-21
JP2021086172 2021-05-21
PCT/JP2022/002675 WO2022244309A1 (ja) 2021-05-21 2022-01-25 膜厚測定装置及び膜厚測定方法

Related Child Applications (1)

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JP2022124611A Division JP7788358B2 (ja) 2021-05-21 2022-08-04 膜厚測定装置及び膜厚測定方法

Publications (3)

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JP7121222B1 true JP7121222B1 (ja) 2022-08-17
JPWO2022244309A1 JPWO2022244309A1 (https=) 2022-11-24
JPWO2022244309A5 JPWO2022244309A5 (https=) 2023-04-25

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JP2022530802A Active JP7121222B1 (ja) 2021-05-21 2022-01-25 膜厚測定装置及び膜厚測定方法
JP2022124611A Active JP7788358B2 (ja) 2021-05-21 2022-08-04 膜厚測定装置及び膜厚測定方法
JP2025241756A Pending JP2026053393A (ja) 2021-05-21 2025-12-08 膜厚測定装置及び膜厚測定方法

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JP2022124611A Active JP7788358B2 (ja) 2021-05-21 2022-08-04 膜厚測定装置及び膜厚測定方法
JP2025241756A Pending JP2026053393A (ja) 2021-05-21 2025-12-08 膜厚測定装置及び膜厚測定方法

Country Status (5)

Country Link
US (1) US20240240933A1 (https=)
EP (1) EP4343274A4 (https=)
JP (3) JP7121222B1 (https=)
KR (1) KR20240011694A (https=)
CN (1) CN117355724A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026074789A1 (ja) * 2024-10-01 2026-04-09 浜松ホトニクス株式会社 膜厚測定方法及び膜厚測定装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001356050A (ja) * 2000-06-14 2001-12-26 Toray Ind Inc 分光方法及びフィルムの製造方法
JP2006153770A (ja) * 2004-11-30 2006-06-15 Omron Corp 分光計測装置
JP2009092454A (ja) * 2007-10-05 2009-04-30 Otsuka Denshi Co Ltd 多層膜解析装置および多層膜解析方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6137575A (en) * 1997-10-24 2000-10-24 Canon Kabushiki Kaisha Film thickness measuring method and apparatus
JP3852556B2 (ja) * 2000-09-08 2006-11-29 オムロン株式会社 膜厚測定方法およびその方法を用いた膜厚センサ
JP3995579B2 (ja) * 2002-10-18 2007-10-24 大日本スクリーン製造株式会社 膜厚測定装置および反射率測定装置
JP2010117161A (ja) 2008-11-11 2010-05-27 Nikon Corp 検査装置
JP2012063321A (ja) * 2010-09-17 2012-03-29 Hamamatsu Photonics Kk 反射率測定装置、反射率測定方法、膜厚測定装置及び膜厚測定方法
JP2013032981A (ja) * 2011-08-02 2013-02-14 Otsuka Denshi Co Ltd 膜厚測定装置
WO2013088871A1 (ja) 2011-12-16 2013-06-20 東レエンジニアリング株式会社 干渉色のモデル適合による膜厚測定方法およびその装置
JP5997578B2 (ja) 2012-10-19 2016-09-28 東レエンジニアリング株式会社 クロストーク補正係数算出方法およびクロストーク補正係数算出機能を備えた透明膜の膜厚測定装置
JP2017044596A (ja) * 2015-08-27 2017-03-02 東レエンジニアリング株式会社 膜厚測定装置および膜厚測定方法
JP6762221B2 (ja) * 2016-12-19 2020-09-30 大塚電子株式会社 光学特性測定装置および光学特性測定方法
JP2019144118A (ja) * 2018-02-21 2019-08-29 Ｊｆｅテクノリサーチ株式会社 膜厚測定装置及び膜厚測定方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001356050A (ja) * 2000-06-14 2001-12-26 Toray Ind Inc 分光方法及びフィルムの製造方法
JP2006153770A (ja) * 2004-11-30 2006-06-15 Omron Corp 分光計測装置
JP2009092454A (ja) * 2007-10-05 2009-04-30 Otsuka Denshi Co Ltd 多層膜解析装置および多層膜解析方法

Also Published As

Publication number Publication date
CN117355724A (zh) 2024-01-05
JP2026053393A (ja) 2026-03-25
JP2022179471A (ja) 2022-12-02
EP4343274A1 (en) 2024-03-27
EP4343274A4 (en) 2025-05-28
US20240240933A1 (en) 2024-07-18
JP7788358B2 (ja) 2025-12-18
KR20240011694A (ko) 2024-01-26
JPWO2022244309A1 (https=) 2022-11-24

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