KR20240001162A - 화합물, 경화성 조성물 및 경화물 - Google Patents

화합물, 경화성 조성물 및 경화물 Download PDF

Info

Publication number
KR20240001162A
KR20240001162A KR1020237038261A KR20237038261A KR20240001162A KR 20240001162 A KR20240001162 A KR 20240001162A KR 1020237038261 A KR1020237038261 A KR 1020237038261A KR 20237038261 A KR20237038261 A KR 20237038261A KR 20240001162 A KR20240001162 A KR 20240001162A
Authority
KR
South Korea
Prior art keywords
group
compound
compounds
carbon atoms
curable composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020237038261A
Other languages
English (en)
Korean (ko)
Inventor
슌스케 다카히
šœ스케 다카히
다이스케 사와모토
사토유키 지카오카
Original Assignee
가부시키가이샤 아데카
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 아데카 filed Critical 가부시키가이샤 아데카
Publication of KR20240001162A publication Critical patent/KR20240001162A/ko
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B61/00—Other general methods
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
    • C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D211/06—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
    • C07D211/36—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D211/60—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C07D211/62—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals attached in position 4
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/66—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D233/90—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
    • C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
    • C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
    • C07D303/22—Ethers with hydroxy compounds containing no oxirane rings with monohydroxy compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D307/56—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D307/68—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D307/87—Benzo [c] furans; Hydrogenated benzo [c] furans
    • C07D307/89—Benzo [c] furans; Hydrogenated benzo [c] furans with two oxygen atoms directly attached in positions 1 and 3
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D331/00—Heterocyclic compounds containing rings of less than five members, having one sulfur atom as the only ring hetero atom
    • C07D331/02—Three-membered rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/30—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00—Coating compositions based on unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/63—Additives non-macromolecular organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02—Non-macromolecular additives
    • C09J11/06—Non-macromolecular additives organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00—Adhesives based on unspecified macromolecular compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Epoxy Resins (AREA)
  • Hydrogenated Pyridines (AREA)
  • Epoxy Compounds (AREA)
KR1020237038261A 2021-04-27 2022-04-21 화합물, 경화성 조성물 및 경화물 Pending KR20240001162A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021074798 2021-04-27
JPJP-P-2021-074798 2021-04-27
PCT/JP2022/018378 WO2022230745A1 (ja) 2021-04-27 2022-04-21 化合物、硬化性組成物及び硬化物

Publications (1)

Publication Number Publication Date
KR20240001162A true KR20240001162A (ko) 2024-01-03

Family

ID=83847104

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237038261A Pending KR20240001162A (ko) 2021-04-27 2022-04-21 화합물, 경화성 조성물 및 경화물

Country Status (5)

Country Link
JP (1) JPWO2022230745A1 (https=)
KR (1) KR20240001162A (https=)
CN (1) CN117203187A (https=)
TW (1) TW202311205A (https=)
WO (1) WO2022230745A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023153444A1 (ja) * 2022-02-14 2023-08-17 株式会社Adeka 接着性組成物、硬化物、積層体、積層体の製造方法及び接着性付与剤
WO2024143072A1 (ja) * 2022-12-28 2024-07-04 株式会社Adeka 組成物及び硬化物
JPWO2024203514A1 (https=) * 2023-03-30 2024-10-03

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007069765A1 (ja) 2005-12-16 2007-06-21 Japan Advanced Institute Of Science And Technology 自己修復材料
WO2013162019A1 (ja) 2012-04-27 2013-10-31 国立大学法人大阪大学 自己修復性及び形状記憶性を有するゲル、及びその製造方法
WO2014201290A1 (en) 2013-06-13 2014-12-18 Autonomic Materials, Inc. Self-healing polymeric materials via unsaturated polyesters
WO2016006413A1 (ja) 2014-07-08 2016-01-14 国立大学法人大阪大学 自己修復性を有する高分子材料及びその製造方法
JP2017202980A (ja) 2016-05-09 2017-11-16 国立大学法人東京工業大学 動的共有結合化合物及びその組換え方法
JP2017218519A (ja) 2016-06-08 2017-12-14 国立大学法人 鹿児島大学 自己修復性材料と修復剤内包マイクロカプセルの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56125326A (en) * 1980-03-07 1981-10-01 Asahi Kagaku Kogyo Kk Preparation of chlorinated phenoxytoluenes in high selectivity
US11667609B2 (en) * 2019-02-28 2023-06-06 Adeka Corporation Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007069765A1 (ja) 2005-12-16 2007-06-21 Japan Advanced Institute Of Science And Technology 自己修復材料
WO2013162019A1 (ja) 2012-04-27 2013-10-31 国立大学法人大阪大学 自己修復性及び形状記憶性を有するゲル、及びその製造方法
WO2014201290A1 (en) 2013-06-13 2014-12-18 Autonomic Materials, Inc. Self-healing polymeric materials via unsaturated polyesters
WO2016006413A1 (ja) 2014-07-08 2016-01-14 国立大学法人大阪大学 自己修復性を有する高分子材料及びその製造方法
JP2017202980A (ja) 2016-05-09 2017-11-16 国立大学法人東京工業大学 動的共有結合化合物及びその組換え方法
JP2017218519A (ja) 2016-06-08 2017-12-14 国立大学法人 鹿児島大学 自己修復性材料と修復剤内包マイクロカプセルの製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
A. Takahashi, R. Goseki, K. Ito, H. Otsuka, ACS Macro Letters, 6, 1280 (2017).

Also Published As

Publication number Publication date
TW202311205A (zh) 2023-03-16
CN117203187A (zh) 2023-12-08
WO2022230745A1 (ja) 2022-11-03
JPWO2022230745A1 (https=) 2022-11-03

Similar Documents

Publication Publication Date Title
KR20240001162A (ko) 화합물, 경화성 조성물 및 경화물
KR102699215B1 (ko) 신규 화합물, 그 화합물을 포함하는 조성물, 자기 수복 재료, 표면 코트제, 도료, 접착제, 전지용 재료 및 경화물
KR102853449B1 (ko) 경화성 조성물
CN110023294B (zh) 无溶剂离子液体环氧树脂
US8450498B2 (en) Ionic liquid epoxy resin monomers
JP6613649B2 (ja) 接着剤組成物、積層シート、太陽電池用裏面保護シート
JP7236041B2 (ja) 硬化剤及びその用途
JP7577482B2 (ja) 化合物、該化合物を含む組成物及び硬化物
US20200002465A1 (en) Resin composition, molded article, laminate, coating material, and adhesive
JP2022037478A (ja) 化合物、該化合物を含む組成物及び硬化物
JPWO2019017418A1 (ja) 組成物、これを含む接着剤、組成物の硬化物およびその製造方法
JP7588753B1 (ja) 硬化性組成物、硬化物、接着剤および封止剤
US20250382514A1 (en) Curable adhesive composition comprising maleimide and thiol
KR20200047444A (ko) 광습기 경화형 수지 조성물, 전자 부품용 접착제 및 표시 소자용 접착제
CN115003709A (zh) 化合物、化合物的制造方法及固化性组合物
KR20250072555A (ko) 화합물, 상기 화합물의 제조 방법, 경화성 재료, 경화성 조성물, 경화물의 제조 방법 및 경화물
JP7580065B2 (ja) 熱硬化性樹脂組成物、硬化物及び接着剤
KR20210003869A (ko) 경화성 조성물에서 잠재성 촉매로서 사용하기 위한 4급 질소 화합물
TW202344532A (zh) 接著性組合物、硬化物、積層體、積層體之製造方法及接著性賦予劑
JP7838583B2 (ja) プライマー層形成用組成物、積層体、及び積層体の分解方法
KR20260043802A (ko) 접착제 조성물 및 이로부터 제조되는 경화물
EP4665573A1 (en) Method for encapsulating electrical cells bearing a nickel-based surface
JP2024171844A (ja) 樹脂組成物
KR20150125355A (ko) 대전 방지성 점착제 조성물 및 이를 이용하여 제조되는 편광판
KR20180026237A (ko) 점착제 조성물

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20231106

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application