KR20230123513A - 화합물, 중합체, 조성물, 막형성용 조성물, 패턴의형성방법, 절연막의 형성방법 및 화합물의 제조방법 - Google Patents

화합물, 중합체, 조성물, 막형성용 조성물, 패턴의형성방법, 절연막의 형성방법 및 화합물의 제조방법 Download PDF

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KR20230123513A
KR20230123513A KR1020237024950A KR20237024950A KR20230123513A KR 20230123513 A KR20230123513 A KR 20230123513A KR 1020237024950 A KR1020237024950 A KR 1020237024950A KR 20237024950 A KR20237024950 A KR 20237024950A KR 20230123513 A KR20230123513 A KR 20230123513A
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group
formula
hydrogen atom
iodine
carbon atoms
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타다시 오마츠
유 오카다
타케루 코구마
마사히로 마츠모토
유시 니미
마사토시 에치고
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미쯔비시 가스 케미칼 컴파니, 인코포레이티드
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Publication of KR20230123513A publication Critical patent/KR20230123513A/ko
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    • C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
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    • C07C59/68—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings the non-carboxylic part of the ether containing six-membered aromatic rings the oxygen atom of the ether group being bound to a non-condensed six-membered aromatic ring
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    • C07C69/734—Ethers
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    • C07D309/08—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
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KR1020237024950A 2020-12-21 2021-12-21 화합물, 중합체, 조성물, 막형성용 조성물, 패턴의형성방법, 절연막의 형성방법 및 화합물의 제조방법 Pending KR20230123513A (ko)

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JP2020211688 2020-12-21
JPJP-P-2020-211688 2020-12-21
JPJP-P-2021-017621 2021-02-05
JP2021017621 2021-02-05
PCT/JP2021/047416 WO2022138670A1 (ja) 2020-12-21 2021-12-21 化合物、重合体、組成物、膜形成用組成物、パターンの形成方法、絶縁膜の形成方法及び化合物の製造方法

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US (1) US20230348351A1 (https=)
JP (1) JP7814674B2 (https=)
KR (1) KR20230123513A (https=)
TW (1) TW202241836A (https=)
WO (1) WO2022138670A1 (https=)

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US20230103685A1 (en) * 2021-09-30 2023-04-06 Rohm And Haas Electronic Materials Llc Iodine-containing acid cleavable compounds, polymers derived therefrom, and photoresist compositions
CN119451998A (zh) * 2022-06-28 2025-02-14 三菱瓦斯化学株式会社 组合物、树脂组合物、膜形成用组合物、图案形成方法及化合物
WO2024135708A1 (ja) * 2022-12-20 2024-06-27 三菱瓦斯化学株式会社 化合物の製造方法、重合体、組成物、パターン形成方法
WO2025079648A1 (ja) * 2023-10-11 2025-04-17 三菱瓦斯化学株式会社 化合物、組成物、樹脂組成物、膜形成用組成物、リソグラフィー用膜形成用組成物、レジスト膜形成用組成物
JP2025182527A (ja) * 2024-06-03 2025-12-15 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、化合物、及び高分子化合物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015108781A (ja) 2013-12-05 2015-06-11 東京応化工業株式会社 ネガ型レジスト組成物、レジストパターン形成方法及び錯体
US20190187342A1 (en) 2017-12-15 2019-06-20 Shin-Etsu Chemical Co., Ltd. Antireflective film, method of producing antireflective film, and eyeglass type display
WO2019187881A1 (ja) 2018-03-30 2019-10-03 富士フイルム株式会社 Ｅｕｖ光用ネガ型感光性組成物、パターン形成方法、電子デバイスの製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000122291A (ja) * 1998-10-09 2000-04-28 Mitsubishi Electric Corp 化学増幅レジスト用材料、感光性樹脂組成物および該組成物を半導体装置の製造に使用する方法
JP6866866B2 (ja) * 2017-09-25 2021-04-28 信越化学工業株式会社 レジスト材料及びパターン形成方法
US20220119336A1 (en) * 2018-12-27 2022-04-21 Mitsubishi Gas Chemical Company, Inc. Compound, (co)polymer, composition, method for forming pattern, and method for producing compound

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015108781A (ja) 2013-12-05 2015-06-11 東京応化工業株式会社 ネガ型レジスト組成物、レジストパターン形成方法及び錯体
US20190187342A1 (en) 2017-12-15 2019-06-20 Shin-Etsu Chemical Co., Ltd. Antireflective film, method of producing antireflective film, and eyeglass type display
WO2019187881A1 (ja) 2018-03-30 2019-10-03 富士フイルム株式会社 Ｅｕｖ光用ネガ型感光性組成物、パターン形成方法、電子デバイスの製造方法

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
H. Yamamoto, et al., J. Vac. Sci. Technol. b 23, 2728(2005)
H. Yamamoto, et al., Jpn. J. Appl. Phys. 46, L142(2007)
오카자키 신지, 외 8명 「리소그래피 기술 그 40년」 S&T출판, 2016년 12월 9일

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