KR20230008105A - 에폭시아크릴레이트 수지, 알칼리 가용성 수지, 그것을 포함하는 수지 조성물 및 그 경화물 - Google Patents

에폭시아크릴레이트 수지, 알칼리 가용성 수지, 그것을 포함하는 수지 조성물 및 그 경화물 Download PDF

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Publication number
KR20230008105A
KR20230008105A KR1020227040044A KR20227040044A KR20230008105A KR 20230008105 A KR20230008105 A KR 20230008105A KR 1020227040044 A KR1020227040044 A KR 1020227040044A KR 20227040044 A KR20227040044 A KR 20227040044A KR 20230008105 A KR20230008105 A KR 20230008105A
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South Korea
Prior art keywords
group
resin
parts
alkali
resin composition
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English (en)
Korean (ko)
Inventor
마사히로 소
카즈오 이시하라
유기환
임청래
Original Assignee
닛테츠 케미컬 앤드 머티리얼 가부시키가이샤
국도화학 주식회사
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Publication of KR20230008105A publication Critical patent/KR20230008105A/ko
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C08F290/144—Polymers containing more than one epoxy group per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Epoxy Resins (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020227040044A 2020-05-12 2021-04-30 에폭시아크릴레이트 수지, 알칼리 가용성 수지, 그것을 포함하는 수지 조성물 및 그 경화물 Ceased KR20230008105A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020083923 2020-05-12
JPJP-P-2020-083923 2020-05-12
PCT/JP2021/017135 WO2021230097A1 (ja) 2020-05-12 2021-04-30 エポキシアクリレート樹脂、アルカリ可溶性樹脂、それを含む樹脂組成物及びその硬化物

Publications (1)

Publication Number Publication Date
KR20230008105A true KR20230008105A (ko) 2023-01-13

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KR1020227040044A Ceased KR20230008105A (ko) 2020-05-12 2021-04-30 에폭시아크릴레이트 수지, 알칼리 가용성 수지, 그것을 포함하는 수지 조성물 및 그 경화물

Country Status (5)

Country Link
JP (2) JPWO2021230097A1 (https=)
KR (1) KR20230008105A (https=)
CN (1) CN115551914B (https=)
TW (1) TWI889814B (https=)
WO (1) WO2021230097A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250042120A (ko) * 2022-07-22 2025-03-26 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 다관능 비닐 수지, 그 제조 방법, 다관능 비닐 수지 조성물 및 그 경화물
CN116887527A (zh) * 2023-05-09 2023-10-13 深圳市撒比斯科技有限公司 一种感光型集成电路堆积绝缘膜的制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61243869A (ja) 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
JPH04340965A (ja) 1991-05-17 1992-11-27 Nippon Kayaku Co Ltd カラーフィルター用光重合組成物
JPH09325494A (ja) 1996-06-07 1997-12-16 Nippon Steel Chem Co Ltd アルカリ現像性不飽和樹脂組成物及びこれを用いた高感度ネガ型パターン形成材料
JP2003026762A (ja) 2001-07-12 2003-01-29 Nippon Steel Chem Co Ltd 硬化性樹脂、硬化性樹脂組成物及びその硬化物

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JPS6289719A (ja) * 1985-10-15 1987-04-24 Sanyo Kokusaku Pulp Co Ltd 新規ビニルエステル樹脂およびその製造法
JP2931860B2 (ja) * 1992-01-31 1999-08-09 日石三菱株式会社 光硬化性樹脂組成物およびソルダーレジスト用光硬化性樹脂組成物
JPH101596A (ja) * 1996-06-19 1998-01-06 Dainippon Ink & Chem Inc 多層プリント配線板用層間電気絶縁材料
JP2002220425A (ja) * 2001-01-25 2002-08-09 Nippon Kayaku Co Ltd 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
JP4426123B2 (ja) * 2001-01-31 2010-03-03 昭和高分子株式会社 硬化性樹脂および硬化性樹脂組成物
CN101017324A (zh) * 2003-03-12 2007-08-15 三菱化学株式会社 光敏组合物、光敏着色组合物、滤色器和液晶显示设备
JP3938375B2 (ja) * 2003-03-12 2007-06-27 三菱化学株式会社 感光性着色組成物、カラーフィルタ、及び液晶表示装置
JP2005239817A (ja) * 2004-02-25 2005-09-08 Dainippon Ink & Chem Inc 酸ペンダント型エポキシアクリレート樹脂の製造方法および硬化性樹脂組成物
JP2006350153A (ja) * 2005-06-20 2006-12-28 Mitsubishi Chemicals Corp 感光性組成物、感光性着色成物、カラーフィルタ、及び液晶表示装置
JP5142175B2 (ja) * 2005-07-07 2013-02-13 日本化薬株式会社 エポキシ樹脂、感光性樹脂及び感光性樹脂組成物
JP5255813B2 (ja) * 2007-10-19 2013-08-07 Ｊｆｅケミカル株式会社 ジシクロペンタジエン類変性フェノール樹脂の製造方法および未反応フェノール類の再利用方法
CN107540816B (zh) * 2016-06-23 2020-09-22 南亚塑胶工业股份有限公司 二环戊二烯-酚与2,6-二甲基苯酚的共聚物环氧树脂的制备与应用
JP7132784B2 (ja) * 2018-07-26 2022-09-07 日鉄ケミカル＆マテリアル株式会社 エポキシ樹脂組成物、プリプレグ、積層板およびプリント配線板
US11884773B2 (en) * 2018-12-19 2024-01-30 Nippon Steel Chemical & Material Co., Ltd. Phenolic resin, epoxy resin, epoxy resin composition and cured product of same
JP7479130B2 (ja) * 2019-09-20 2024-05-08 日鉄ケミカル＆マテリアル株式会社 エポキシアクリレート樹脂、アルカリ可溶性樹脂、それを含む樹脂組成物及びその硬化物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61243869A (ja) 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
JPH04340965A (ja) 1991-05-17 1992-11-27 Nippon Kayaku Co Ltd カラーフィルター用光重合組成物
JPH09325494A (ja) 1996-06-07 1997-12-16 Nippon Steel Chem Co Ltd アルカリ現像性不飽和樹脂組成物及びこれを用いた高感度ネガ型パターン形成材料
JP2003026762A (ja) 2001-07-12 2003-01-29 Nippon Steel Chem Co Ltd 硬化性樹脂、硬化性樹脂組成物及びその硬化物

Also Published As

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JP2025020271A (ja) 2025-02-12
WO2021230097A1 (ja) 2021-11-18
TWI889814B (zh) 2025-07-11
CN115551914B (zh) 2025-06-27
JPWO2021230097A1 (https=) 2021-11-18
TW202146505A (zh) 2021-12-16
CN115551914A (zh) 2022-12-30

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