KR20220159344A - 기재 필름 및 워크 가공용 시트 - Google Patents
기재 필름 및 워크 가공용 시트 Download PDFInfo
- Publication number
- KR20220159344A KR20220159344A KR1020227017622A KR20227017622A KR20220159344A KR 20220159344 A KR20220159344 A KR 20220159344A KR 1020227017622 A KR1020227017622 A KR 1020227017622A KR 20227017622 A KR20227017622 A KR 20227017622A KR 20220159344 A KR20220159344 A KR 20220159344A
- Authority
- KR
- South Korea
- Prior art keywords
- base film
- tensile
- less
- polyester resin
- mpa
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
- C09J7/25—Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/255—Polyesters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/16—Dicarboxylic acids and dihydroxy compounds
- C08G63/18—Dicarboxylic acids and dihydroxy compounds the acids or hydroxy compounds containing carbocyclic rings
- C08G63/199—Acids or hydroxy compounds containing cycloaliphatic rings
-
- H01L21/6836—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7402—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7416—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
-
- H01L2221/68327—
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Dicing (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2020-060612 | 2020-03-30 | ||
| JP2020060612 | 2020-03-30 | ||
| PCT/JP2021/012780 WO2021200619A1 (ja) | 2020-03-30 | 2021-03-26 | 基材フィルムおよびワーク加工用シート |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20220159344A true KR20220159344A (ko) | 2022-12-02 |
Family
ID=77930040
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020227017622A Ceased KR20220159344A (ko) | 2020-03-30 | 2021-03-26 | 기재 필름 및 워크 가공용 시트 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7728246B2 (https=) |
| KR (1) | KR20220159344A (https=) |
| WO (1) | WO2021200619A1 (https=) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11199840A (ja) | 1998-01-16 | 1999-07-27 | Kureha Chem Ind Co Ltd | 粘着テープ用基材、粘着テープ及び離型テープ付き粘着テープ |
| JP5494132B2 (ja) | 2010-03-31 | 2014-05-14 | 住友ベークライト株式会社 | ダイシングフィルム |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3618641B2 (ja) * | 2000-06-29 | 2005-02-09 | カネボウ株式会社 | ポリエステル樹脂組成物及びその用途 |
| US20030030172A1 (en) | 2001-06-15 | 2003-02-13 | Gabrie Hoogland | Formed decorative film |
| JP4549239B2 (ja) * | 2005-06-22 | 2010-09-22 | 日東電工株式会社 | ダイシング用粘着シート |
| KR20100097155A (ko) | 2007-11-15 | 2010-09-02 | 후루카와 덴키 고교 가부시키가이샤 | 반도체 웨이퍼 가공용 점착 테이프 |
| JP2011219563A (ja) * | 2010-04-06 | 2011-11-04 | Mitsubishi Chemicals Corp | 脂環式ポリエステル系樹脂組成物及びその成形体 |
| JP6278178B2 (ja) * | 2013-11-11 | 2018-02-14 | 日立化成株式会社 | ウエハ加工用テープ |
| JP6522307B6 (ja) * | 2014-10-01 | 2019-07-17 | 大和製罐株式会社 | ポリエステル樹脂組成物 |
| CN106832823B (zh) | 2017-03-20 | 2018-11-30 | 江苏裕兴薄膜科技股份有限公司 | 一种耐高温pet聚酯膜及其制备方法 |
-
2021
- 2021-03-26 WO PCT/JP2021/012780 patent/WO2021200619A1/ja not_active Ceased
- 2021-03-26 JP JP2022512101A patent/JP7728246B2/ja active Active
- 2021-03-26 KR KR1020227017622A patent/KR20220159344A/ko not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11199840A (ja) | 1998-01-16 | 1999-07-27 | Kureha Chem Ind Co Ltd | 粘着テープ用基材、粘着テープ及び離型テープ付き粘着テープ |
| JP5494132B2 (ja) | 2010-03-31 | 2014-05-14 | 住友ベークライト株式会社 | ダイシングフィルム |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7728246B2 (ja) | 2025-08-22 |
| CN114902378A (zh) | 2022-08-12 |
| JPWO2021200619A1 (https=) | 2021-10-07 |
| WO2021200619A1 (ja) | 2021-10-07 |
| TW202200684A (zh) | 2022-01-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102603367B1 (ko) | 반도체 가공용 점착 테이프 및 반도체 장치의 제조 방법 | |
| TW202020096A (zh) | 半導體加工用黏著帶及半導體裝置的製造方法 | |
| TWI808170B (zh) | 半導體晶片之製造方法 | |
| JP6306362B2 (ja) | 伸長可能シートおよび積層チップの製造方法 | |
| JP2025182039A (ja) | 粘着シート | |
| JP6009188B2 (ja) | ワーク加工用シート基材およびワーク加工用シート | |
| JP7828765B2 (ja) | ワーク加工用シート | |
| KR102905550B1 (ko) | 점착 시트 | |
| JP7773973B2 (ja) | 粘着シート | |
| WO2021200616A1 (ja) | 粘着シート | |
| KR20210149610A (ko) | 다이싱 테이프용의 기재 필름 및 다이싱 테이프 | |
| KR20220159344A (ko) | 기재 필름 및 워크 가공용 시트 | |
| JP7805284B2 (ja) | ワーク加工用シート | |
| CN114902378B (zh) | 基材膜及工件加工用片 | |
| TWI916357B (zh) | 基材膜及工件加工用片 | |
| JP2024021491A (ja) | 基材フィルム | |
| JP2017152499A (ja) | ダイシング用粘着テープおよび半導体ウェハのフルカットダイシング方法 | |
| JP2024021488A (ja) | 粘着シート | |
| JPWO2020003919A1 (ja) | 半導体加工用粘着テープおよび半導体装置の製造方法 | |
| JP2025133343A (ja) | 粘着テープ | |
| KR20220136091A (ko) | 워크 가공용 시트 | |
| KR20230160228A (ko) | 반도체 가공용 점착 테이프 및 반도체 장치의 제조방법 | |
| JP2023136637A (ja) | 基材フィルムおよびワーク加工用シート |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| A201 | Request for examination | ||
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| E14-X000 | Pre-grant third party observation filed |
St.27 status event code: A-2-3-E10-E14-opp-X000 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| B15 | Application refused following examination |
Free format text: ST27 STATUS EVENT CODE: N-2-6-B10-B15-EXM-PE0601 (AS PROVIDED BY THE NATIONAL OFFICE) |
|
| PE0601 | Decision on rejection of patent |
St.27 status event code: N-2-6-B10-B15-exm-PE0601 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |
|
| P11 | Amendment of application requested |
Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |