KR20220104178A - 형광 x선 분석 장치 - Google Patents
형광 x선 분석 장치 Download PDFInfo
- Publication number
- KR20220104178A KR20220104178A KR1020227018222A KR20227018222A KR20220104178A KR 20220104178 A KR20220104178 A KR 20220104178A KR 1020227018222 A KR1020227018222 A KR 1020227018222A KR 20227018222 A KR20227018222 A KR 20227018222A KR 20220104178 A KR20220104178 A KR 20220104178A
- Authority
- KR
- South Korea
- Prior art keywords
- ray
- rays
- fluorescent
- liquid sample
- detector
- Prior art date
Links
- 238000002441 X-ray diffraction Methods 0.000 title claims abstract description 23
- 239000007788 liquid Substances 0.000 claims abstract description 66
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 51
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 51
- 239000010703 silicon Substances 0.000 claims abstract description 51
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 30
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 30
- 239000011574 phosphorus Substances 0.000 claims abstract description 30
- 238000010521 absorption reaction Methods 0.000 claims abstract description 14
- 238000001514 detection method Methods 0.000 claims description 26
- 238000004876 x-ray fluorescence Methods 0.000 claims description 21
- 230000003287 optical effect Effects 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 14
- 230000005540 biological transmission Effects 0.000 claims description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052727 yttrium Inorganic materials 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 239000004642 Polyimide Substances 0.000 claims description 3
- 239000004734 Polyphenylene sulfide Substances 0.000 claims description 3
- 239000004760 aramid Substances 0.000 claims description 3
- 229920003235 aromatic polyamide Polymers 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 229910021389 graphene Inorganic materials 0.000 claims description 3
- 229920001643 poly(ether ketone) Polymers 0.000 claims description 3
- 229920001721 polyimide Polymers 0.000 claims description 3
- 229920000069 polyphenylene sulfide Polymers 0.000 claims description 3
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 claims description 3
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 38
- 239000010408 film Substances 0.000 description 24
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 19
- 238000005259 measurement Methods 0.000 description 10
- 238000004458 analytical method Methods 0.000 description 6
- 238000001816 cooling Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 235000013619 trace mineral Nutrition 0.000 description 3
- 239000011573 trace mineral Substances 0.000 description 3
- 229910052790 beryllium Inorganic materials 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2204—Specimen supports therefor; Sample conveying means therefore
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
- G01N2223/1016—X-ray
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/20—Sources of radiation
- G01N2223/204—Sources of radiation source created from radiated target
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/302—Accessories, mechanical or electrical features comparative arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/307—Accessories, mechanical or electrical features cuvettes-sample holders
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/611—Specific applications or type of materials patterned objects; electronic devices
- G01N2223/6116—Specific applications or type of materials patterned objects; electronic devices semiconductor wafer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/637—Specific applications or type of materials liquid
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/652—Specific applications or type of materials impurities, foreign matter, trace amounts
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019218357 | 2019-12-02 | ||
| JPJP-P-2019-218357 | 2019-12-02 | ||
| PCT/JP2020/044668 WO2021112080A1 (ja) | 2019-12-02 | 2020-12-01 | 蛍光ｘ線分析装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20220104178A true KR20220104178A (ko) | 2022-07-26 |
Family
ID=76221607
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020227018222A KR20220104178A (ko) | 2019-12-02 | 2020-12-01 | 형광 x선 분석 장치 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20220404297A1 (ja) |
| EP (1) | EP4071465A1 (ja) |
| JP (1) | JP7386259B2 (ja) |
| KR (1) | KR20220104178A (ja) |
| CN (1) | CN114746744A (ja) |
| WO (1) | WO2021112080A1 (ja) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016006434A (ja) | 2010-03-25 | 2016-01-14 | イーシーアイ・テクノロジー・インコーポレーテッドＥＣＩ Ｔｅｃｈｎｏｌｏｇｙ，Ｉｎｃ． | エッチング剤溶液中のケイ素濃度の分析 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3117833B2 (ja) * | 1993-03-01 | 2000-12-18 | セイコーインスツルメンツ株式会社 | 蛍光ｘ線分析装置 |
| JP3287069B2 (ja) * | 1993-08-13 | 2002-05-27 | 住友電気工業株式会社 | 全反射蛍光ｘ線分析の測定方法及びその装置 |
| IL120429A (en) * | 1997-03-12 | 2000-09-28 | Jordan Valley Applied Radiation Ltd | X-ray fluorescence analyzer |
| JP2006038822A (ja) * | 2004-07-26 | 2006-02-09 | Tadashi Uko | 蛍光ｘ線分析装置 |
| JP5102549B2 (ja) * | 2006-07-14 | 2012-12-19 | 独立行政法人科学技術振興機構 | Ｘ線分析装置及びｘ線分析方法 |
| JP2009022615A (ja) | 2007-07-23 | 2009-02-05 | Takeo Katsuta | カップ容器 |
| JP4838821B2 (ja) * | 2008-03-18 | 2011-12-14 | 株式会社リガク | 蛍光ｘ線分析用試料保持具ならびにそれを用いる蛍光ｘ線分析方法および装置 |
| JP5553300B2 (ja) | 2009-11-19 | 2014-07-16 | 株式会社日立ハイテクサイエンス | 蛍光ｘ線検査装置及び蛍光ｘ線検査方法 |
| JP2013108759A (ja) | 2011-11-17 | 2013-06-06 | Fuji Electric Co Ltd | 半導体ウェハプロセス用ふっ酸溶液の不純物分析方法および該ふっ酸溶液の交換時期の管理方法 |
| JP2017083346A (ja) * | 2015-10-29 | 2017-05-18 | 株式会社堀場製作所 | 液体試料分析装置 |
| JP7394464B2 (ja) * | 2018-07-04 | 2023-12-08 | 株式会社リガク | 蛍光ｘ線分析装置 |
-
2020
- 2020-12-01 CN CN202080082985.0A patent/CN114746744A/zh active Pending
- 2020-12-01 WO PCT/JP2020/044668 patent/WO2021112080A1/ja unknown
- 2020-12-01 JP JP2021562655A patent/JP7386259B2/ja active Active
- 2020-12-01 KR KR1020227018222A patent/KR20220104178A/ko unknown
- 2020-12-01 EP EP20897252.1A patent/EP4071465A1/en not_active Withdrawn
- 2020-12-01 US US17/780,218 patent/US20220404297A1/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016006434A (ja) | 2010-03-25 | 2016-01-14 | イーシーアイ・テクノロジー・インコーポレーテッドＥＣＩ Ｔｅｃｈｎｏｌｏｇｙ，Ｉｎｃ． | エッチング剤溶液中のケイ素濃度の分析 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114746744A (zh) | 2022-07-12 |
| US20220404297A1 (en) | 2022-12-22 |
| EP4071465A1 (en) | 2022-10-12 |
| JP7386259B2 (ja) | 2023-11-24 |
| JPWO2021112080A1 (ja) | 2021-06-10 |
| WO2021112080A1 (ja) | 2021-06-10 |
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