KR20220097889A - 수지 조성물, 화합물 (z), 광학 필터 및 그 용도 - Google Patents

수지 조성물, 화합물 (z), 광학 필터 및 그 용도 Download PDF

Info

Publication number
KR20220097889A
KR20220097889A KR1020227013997A KR20227013997A KR20220097889A KR 20220097889 A KR20220097889 A KR 20220097889A KR 1020227013997 A KR1020227013997 A KR 1020227013997A KR 20227013997 A KR20227013997 A KR 20227013997A KR 20220097889 A KR20220097889 A KR 20220097889A
Authority
KR
South Korea
Prior art keywords
group
compound
formula
atom
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020227013997A
Other languages
English (en)
Korean (ko)
Inventor
요스케 우치다
가츠야 나가야
히토시 오사키
야스노리 가와베
히로유키 시모가와
가즈토 나카무라
Original Assignee
제이에스알 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 제이에스알 가부시끼가이샤 filed Critical 제이에스알 가부시끼가이샤
Publication of KR20220097889A publication Critical patent/KR20220097889A/ko
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3442—Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
    • C08K5/3445—Five-membered rings
    • C08K5/3447—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04—Indoles; Hydrogenated indoles
    • C07D209/08—Indoles; Hydrogenated indoles with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to carbon atoms of the hetero ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/90—Benzo [c, d] indoles; Hydrogenated benzo [c, d] indoles
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D309/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
    • C07D309/34—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/04—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
    • C07D311/58—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring other than with oxygen or sulphur atoms in position 2 or 4
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/02—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/22—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains four or more hetero rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/38—Boron-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/15—Heterocyclic compounds having oxygen in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • C08K5/3432—Six-membered rings
    • C08K5/3437—Six-membered rings condensed with carbocyclic rings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/26—Reflecting filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
KR1020227013997A 2019-11-01 2020-10-26 수지 조성물, 화합물 (z), 광학 필터 및 그 용도 Pending KR20220097889A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2019199897 2019-11-01
JPJP-P-2019-199897 2019-11-01
JPJP-P-2020-135282 2020-08-07
JP2020135282 2020-08-07
PCT/JP2020/040085 WO2021085372A1 (ja) 2019-11-01 2020-10-26 樹脂組成物、化合物（ｚ）、光学フィルターおよびその用途

Publications (1)

Publication Number Publication Date
KR20220097889A true KR20220097889A (ko) 2022-07-08

Family

ID=75715972

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227013997A Pending KR20220097889A (ko) 2019-11-01 2020-10-26 수지 조성물, 화합물 (z), 광학 필터 및 그 용도

Country Status (5)

Country Link
JP (2) JP7663505B2 (https=)
KR (1) KR20220097889A (https=)
CN (1) CN114616291B (https=)
TW (1) TWI851844B (https=)
WO (1) WO2021085372A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7360665B2 (ja) * 2019-11-01 2023-10-13 Jsr株式会社 樹脂組成物、樹脂層および光学フィルター
JP7630759B2 (ja) * 2020-02-21 2025-02-18 Jsr株式会社 樹脂組成物、化合物（Ｚ）、基材（ｉ）、光学フィルターおよびその用途
TWI831649B (zh) 2023-03-03 2024-02-01 大立光電股份有限公司 成像鏡頭、相機模組與電子裝置
TWI829562B (zh) * 2023-03-21 2024-01-11 澤米科技股份有限公司 雙通帶濾光元件
WO2025142714A1 (ja) * 2023-12-25 2025-07-03 株式会社日本触媒 樹脂組成物、その製造方法、その用途、成形体の製造方法、及び、撮像素子の製造方法
KR20250105164A (ko) * 2023-12-29 2025-07-08 (주)이녹스첨단소재 웨이퍼 이면 연삭용 점착 필름

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06200113A (ja) 1992-12-28 1994-07-19 Nippon Zeon Co Ltd 近赤外線吸収樹脂組成物、および成形品
JP2014506252A (ja) 2010-12-28 2014-03-13 エスケー ケミカルズ カンパニー リミテッド ジイモニウム系化合物およびこれを利用した近赤外線吸収フィルター

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4365017A (en) * 1981-07-01 1982-12-21 Eastman Kodak Company Telluropyrylium electron accepting dye sensitizers for electron donating photoconductive compositions
JPS63168392A (ja) * 1986-12-30 1988-07-12 Canon Inc 光学記録媒体
US5262549A (en) * 1991-05-30 1993-11-16 Polaroid Corporation Benzpyrylium dyes, and processes for their preparation and use
US5989772A (en) * 1996-11-08 1999-11-23 Eastman Kodak Company Stabilizing IR dyes for laser imaging
JPH10195319A (ja) * 1997-01-13 1998-07-28 Mitsubishi Paper Mills Ltd ポリメチンシアニン化合物の製造方法
US5766956A (en) * 1997-05-27 1998-06-16 American Research Corporation Diode laser-based chemical and biological sensor
JP2000330271A (ja) * 1999-05-21 2000-11-30 Fuji Photo Film Co Ltd ポジ型感光性組成物
JP2004083799A (ja) * 2002-08-28 2004-03-18 Fuji Photo Film Co Ltd セルロースアシレートフィルム及びその製造方法、並びに該フィルムを用いた光学フィルム、液晶表示装置及びハロゲン化銀写真感光材料
JP4086871B2 (ja) * 2004-11-18 2008-05-14 日立マクセル株式会社 近赤外線遮蔽体及びディスプレイ用前面板
JP2006313303A (ja) * 2004-11-24 2006-11-16 Dainippon Printing Co Ltd 光学フィルタおよびこれを用いたディスプレイ
JP5665204B2 (ja) * 2006-09-06 2015-02-04 日本化薬株式会社 新規シアニン化合物及びその用途
JP2008088426A (ja) * 2006-09-06 2008-04-17 Nippon Kayaku Co Ltd 新規シアニン化合物及びその用途
JP5782797B2 (ja) * 2010-11-12 2015-09-24 信越化学工業株式会社 近赤外光吸収色素化合物、近赤外光吸収膜形成材料、及びこれにより形成される近赤外光吸収膜
TWI588192B (zh) * 2011-10-14 2017-06-21 Jsr Corp Optical filter, solid-state imaging device and camera module using the optical filter
JP2014095007A (ja) * 2012-11-08 2014-05-22 Nippon Kayaku Co Ltd 新規シアニン色素化合物、樹脂組成物及び近赤外線カットフィルタ
CN110669318A (zh) * 2013-08-20 2020-01-10 Jsr株式会社 树脂组成物
JP6720969B2 (ja) * 2015-05-12 2020-07-08 Ａｇｃ株式会社 光学フィルタおよび撮像装置
JP7200985B2 (ja) * 2018-03-02 2023-01-10 Jsr株式会社 光学フィルター、カメラモジュールおよび電子機器
JP7155855B2 (ja) 2018-10-18 2022-10-19 Jsr株式会社 光学フィルターおよびその用途
JP7293875B2 (ja) 2019-05-31 2023-06-20 Jsr株式会社 光学フィルターおよび光学センサー装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06200113A (ja) 1992-12-28 1994-07-19 Nippon Zeon Co Ltd 近赤外線吸収樹脂組成物、および成形品
JP2014506252A (ja) 2010-12-28 2014-03-13 エスケー ケミカルズ カンパニー リミテッド ジイモニウム系化合物およびこれを利用した近赤外線吸収フィルター

Also Published As

Publication number Publication date
JP2025060840A (ja) 2025-04-10
CN114616291B (zh) 2023-07-04
CN114616291A (zh) 2022-06-10
JP7663505B2 (ja) 2025-04-16
TWI851844B (zh) 2024-08-11
JPWO2021085372A1 (https=) 2021-05-06
JP7816477B2 (ja) 2026-02-18
TW202118835A (zh) 2021-05-16
WO2021085372A1 (ja) 2021-05-06

Similar Documents

Publication Publication Date Title
KR20220097889A (ko) 수지 조성물, 화합물 (z), 광학 필터 및 그 용도
TWI792256B (zh) 光學濾波器及光學感測裝置
KR102388961B1 (ko) 광학 필터 및 광학 필터를 사용한 장치
KR102384896B1 (ko) 광학 필터 및 광학 필터를 사용한 장치
CN103858028B (zh) 固体摄影装置用滤光器及使用该滤光器的固体摄影装置及照相机模块
KR102890767B1 (ko) 광학 부재 및 카메라 모듈
JP7707377B2 (ja) 樹脂組成物、化合物（Ｚ）、基材（ｉ）、光学フィルターおよびその用途
JP6398980B2 (ja) 光学フィルターおよび光学フィルターを用いた装置
KR102775397B1 (ko) 광학 필터
JP7360665B2 (ja) 樹脂組成物、樹脂層および光学フィルター
JP2023153056A (ja) 組成物、光学部材、固体撮像装置、光学センサー装置および化合物
KR102269949B1 (ko) 광학 필터, 광학 필터를 이용한 장치, 신규 시아닌 화합물, 및 수지 조성물
JP2020076990A (ja) 光学フィルターおよびその用途
KR20220146334A (ko) 기재, 광학 필터, 고체 촬상 장치 및 카메라 모듈
JP7293875B2 (ja) 光学フィルターおよび光学センサー装置
CN116891617A (zh) 组合物、光学构件、固体摄像装置、光学传感装置及化合物
TW202248203A (zh) 組成物、光學構件及包括光學構件的裝置

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R11-asn-PN2301

D21 Rejection of application intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13 Pre-grant limitation requested

Free format text: ST27 STATUS EVENT CODE: A-2-3-E10-E13-LIM-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11 Amendment of application requested

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000