KR20210124495A - 스탬프 생성 및 경화를 위한 방법 및 장치 - Google Patents

스탬프 생성 및 경화를 위한 방법 및 장치 Download PDF

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Publication number
KR20210124495A
KR20210124495A KR1020217030983A KR20217030983A KR20210124495A KR 20210124495 A KR20210124495 A KR 20210124495A KR 1020217030983 A KR1020217030983 A KR 1020217030983A KR 20217030983 A KR20217030983 A KR 20217030983A KR 20210124495 A KR20210124495 A KR 20210124495A
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KR
South Korea
Prior art keywords
stamp
substrate
resist
layer
creating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020217030983A
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English (en)
Korean (ko)
Inventor
마이클 와이. 영
루도빅 고데트
로버트 제이. 비서
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 어플라이드 머티어리얼스, 인코포레이티드 filed Critical 어플라이드 머티어리얼스, 인코포레이티드
Publication of KR20210124495A publication Critical patent/KR20210124495A/ko
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020217030983A 2019-03-01 2020-02-28 스탬프 생성 및 경화를 위한 방법 및 장치 Ceased KR20210124495A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/290,635 2019-03-01
US16/290,635 US20200278605A1 (en) 2019-03-01 2019-03-01 Method and apparatus for stamp generation and curing
PCT/US2020/020468 WO2020180718A1 (en) 2019-03-01 2020-02-28 Method and apparatus for stamp generation and curing

Publications (1)

Publication Number Publication Date
KR20210124495A true KR20210124495A (ko) 2021-10-14

Family

ID=72236252

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020217030983A Ceased KR20210124495A (ko) 2019-03-01 2020-02-28 스탬프 생성 및 경화를 위한 방법 및 장치

Country Status (6)

Country Link
US (2) US20200278605A1 (https=)
EP (1) EP3931638A4 (https=)
JP (1) JP2022522424A (https=)
KR (1) KR20210124495A (https=)
CN (1) CN113508336A (https=)
WO (1) WO2020180718A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202332568A (zh) * 2021-11-15 2023-08-16 荷蘭商摩富塔尼克斯控股公司 壓印方法
US20240168207A1 (en) * 2022-11-23 2024-05-23 Google Llc Fabrication of slanted grating master and working stamp using grayscale lithography and plasma etching
US12572067B2 (en) 2023-03-23 2026-03-10 International Business Machines Corporation Guiding structures for fabrication of angled features in a semiconductor device
US12558835B1 (en) 2023-03-23 2026-02-24 International Business Machines Corporation Fabrication of asymmetric mandrel structures in semiconductor device
US20240319584A1 (en) * 2023-03-23 2024-09-26 International Business Machines Corporation Fabrication of angled mandrel structures in semiconductor device

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0580530A (ja) * 1991-09-24 1993-04-02 Hitachi Ltd 薄膜パターン製造方法
WO1997006012A1 (en) 1995-08-04 1997-02-20 International Business Machines Corporation Stamp for a lithographic process
US6387787B1 (en) * 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
US6653030B2 (en) * 2002-01-23 2003-11-25 Hewlett-Packard Development Company, L.P. Optical-mechanical feature fabrication during manufacture of semiconductors and other micro-devices and nano-devices that include micron and sub-micron features
WO2004086471A1 (en) * 2003-03-27 2004-10-07 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization
KR100566700B1 (ko) * 2004-01-15 2006-04-03 삼성전자주식회사 반도체 공정에서 포토레지스트 패턴 형성 방법,포토레지스트 패턴 형성용 템플레이트 및 이의 제조 방법.
KR101413233B1 (ko) * 2007-09-14 2014-06-30 삼성전자 주식회사 나노 임프린트 리소그래피 공정
JP2010245130A (ja) * 2009-04-01 2010-10-28 Jsr Corp スタンパ及びこれを用いた光インプリントリソグラフィ方法
JP2010287625A (ja) * 2009-06-09 2010-12-24 Toshiba Corp テンプレート及びパターン形成方法
KR100988935B1 (ko) * 2009-10-28 2010-10-20 한국기계연구원 롤 임프린트 장치
BR112017013073A2 (pt) * 2014-12-22 2018-01-02 Koninklijke Philips Nv estampa para litografia de estampagem, método de fabricação de uma estampa, uso de uma estampa, e método de impressão
EP3481562A4 (en) * 2016-07-08 2019-06-26 University of Massachusetts STRUCTURING OF NANOSTRUCTURES WITH IMPRINT LITHOGRAPHY
WO2018170474A1 (en) * 2017-03-17 2018-09-20 University Of Massachusetts Direct printing of 3-d microbatteries and electrodes

Also Published As

Publication number Publication date
EP3931638A1 (en) 2022-01-05
JP2022522424A (ja) 2022-04-19
CN113508336A (zh) 2021-10-15
EP3931638A4 (en) 2022-12-28
WO2020180718A1 (en) 2020-09-10
US20220057710A1 (en) 2022-02-24
US20200278605A1 (en) 2020-09-03

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Patent event date: 20210927

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