BR112017013073A2 - estampa para litografia de estampagem, método de fabricação de uma estampa, uso de uma estampa, e método de impressão - Google Patents

estampa para litografia de estampagem, método de fabricação de uma estampa, uso de uma estampa, e método de impressão

Info

Publication number
BR112017013073A2
BR112017013073A2 BR112017013073A BR112017013073A BR112017013073A2 BR 112017013073 A2 BR112017013073 A2 BR 112017013073A2 BR 112017013073 A BR112017013073 A BR 112017013073A BR 112017013073 A BR112017013073 A BR 112017013073A BR 112017013073 A2 BR112017013073 A2 BR 112017013073A2
Authority
BR
Brazil
Prior art keywords
pattern
malleable
stamp
layer
curvilinear surface
Prior art date
Application number
BR112017013073A
Other languages
English (en)
Inventor
Antonius Verschuuren Marcus
Van Brakel Remco
Original Assignee
Koninklijke Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Nv filed Critical Koninklijke Philips Nv
Publication of BR112017013073A2 publication Critical patent/BR112017013073A2/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Micromachines (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Methods (AREA)

Abstract

a presente invenção refere-se a um método de fabricação de uma estampa dotada de um padrão (110) para formar um padrão em uma superfície curvilínea (10). o método compreende aplicar uma camada (115) de um precursor de material maleável sobre um original (50) com um padrão inverso (52) para formar um padrão desejado (122) na dita camada; curar o precursor de material maleável para formar uma camada de estampa maleável (120) que compreende o padrão desejado; fornecer uma estrutura de estampa intermediária pela adesão de uma camada de suporte porosa maleável (130) à camada de estampa maleável; liberar a estrutura de estampa intermediária do original; forçar a estrutura de estampa intermediária sobre a superfície curvilínea com o dito padrão de características voltado para a superfície curvilínea; formar a estampa dotada de um padrão pelo preenchimento da camada porosa de suporte maleável com um material de enchimento para reduzir a maleabilidade da camada de suporte; e remover a estampa dotada de um padrão da superfície curvilínea. uma estampa dotada de um padrão, método de impressão e artigo estampado correspondentes são também revelados.
BR112017013073A 2014-12-22 2015-12-09 estampa para litografia de estampagem, método de fabricação de uma estampa, uso de uma estampa, e método de impressão BR112017013073A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP14199595 2014-12-22
PCT/EP2015/079048 WO2016102185A1 (en) 2014-12-22 2015-12-09 Patterned stamp manufacturing method, patterned stamp and imprinting method

Publications (1)

Publication Number Publication Date
BR112017013073A2 true BR112017013073A2 (pt) 2018-01-02

Family

ID=52282482

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112017013073A BR112017013073A2 (pt) 2014-12-22 2015-12-09 estampa para litografia de estampagem, método de fabricação de uma estampa, uso de uma estampa, e método de impressão

Country Status (9)

Country Link
US (1) US11086217B2 (pt)
EP (1) EP3237971B1 (pt)
JP (1) JP6398010B2 (pt)
KR (1) KR102540395B1 (pt)
CN (1) CN107111226B (pt)
BR (1) BR112017013073A2 (pt)
RU (1) RU2695290C2 (pt)
SG (1) SG11201704948TA (pt)
WO (1) WO2016102185A1 (pt)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6565321B2 (ja) * 2015-05-18 2019-08-28 凸版印刷株式会社 積層構造体、これを用いた有機ｅｌ素子、およびこれらの製造方法
CN109600996B (zh) * 2016-07-27 2021-11-30 皇家飞利浦有限公司 基于聚有机硅氧烷的印模、其制造方法、其用于印刷工艺的用途以及利用其的压印方法
CN106647165B (zh) * 2016-09-28 2020-04-10 西安交通大学 一种基于柔性的可在任意曲面制造微纳结构的方法
EP3551411A4 (en) * 2016-12-09 2020-08-19 The University of Massachusetts SAMPLE FORM FOR SAMPLE TRANSFER
KR20230007371A (ko) * 2020-04-07 2023-01-12 스마트 머티리얼 솔루션즈, 인크 컨포멀 마이크로패터닝 또는 나노패터닝된 나노임프린트 리소그래피 마스터 및 이를 제조하고 사용하는 방법
CN111830609B (zh) * 2020-07-28 2022-04-15 温州大学 一种3d人工复眼及其制备方法
CN113189840A (zh) * 2021-04-16 2021-07-30 深圳先进技术研究院 微纳结构制作方法及微纳结构制作装置
EP4329947A1 (en) * 2021-04-30 2024-03-06 Magic Leap, Inc. Imprint lithography process and methods on curved surfaces
CN116779465B (zh) * 2023-08-25 2023-10-31 青岛天仁微纳科技有限责任公司 一种纳米压印晶圆缺陷检测方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3339710B2 (ja) * 1992-12-28 2002-10-28 ブラザー工業株式会社 浸透型印字体の形成方法
RU2278406C2 (ru) * 2004-06-07 2006-06-20 Открытое акционерное общество "Научно-исследовательский институт газоразрядных приборов "Плазма" (ОАО "Плазма") Способ изготовления трафаретной печатной формы (варианты)
JP2006007567A (ja) * 2004-06-25 2006-01-12 Shachihata Inc 印判
EP1763704A2 (en) * 2004-06-30 2007-03-21 Koninklijke Philips Electronics N.V. Soft lithographic stamp with a chemically patterned surface
EE200400117A (et) 2004-10-19 2006-06-15 Humal Leo-Henn Meetod tindiga täidetava templi valmistamiseks jatempli tööorgan
US7906058B2 (en) * 2005-12-01 2011-03-15 Molecular Imprints, Inc. Bifurcated contact printing technique
US8318253B2 (en) 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US20080011834A1 (en) 2006-07-14 2008-01-17 Kinkade Donald R Job-site inspector communications and plan storage unit
WO2008091571A2 (en) 2007-01-22 2008-07-31 Nano Terra Inc. High-throughput apparatus for patterning flexible substrates and method of using the same
JP2009080434A (ja) * 2007-09-27 2009-04-16 Ricoh Opt Ind Co Ltd 光学素子製造方法および光学素子
CN102056990B (zh) 2008-06-06 2014-02-19 皇家飞利浦电子股份有限公司 用于软光刻的硅酮橡胶材料
JP5383110B2 (ja) * 2008-07-25 2014-01-08 株式会社東芝 インプリント装置
JP5117318B2 (ja) * 2008-08-07 2013-01-16 株式会社日立ハイテクノロジーズ ナノインプリント用スタンパ及び該スタンパを使用する微細構造転写装置
CN101477304B (zh) * 2008-11-04 2011-08-17 南京大学 在复杂形状表面复制高分辨率纳米结构的压印方法
KR101293133B1 (ko) * 2008-12-04 2013-08-12 코닌클리케 필립스 일렉트로닉스 엔.브이. 임프린트 리소그래피 장치 및 방법
WO2012027050A2 (en) * 2010-08-23 2012-03-01 Rolith, Inc. Mask for near-field lithography and fabrication the same
CN102385083B (zh) * 2010-09-03 2014-09-03 株式会社Lg化学 毯及其制造方法、和滤色器衬底及其制造装置和方法
JP2013064836A (ja) * 2011-09-16 2013-04-11 Olympus Corp 微細構造形成用型および光学素子の製造方法
JP2013210504A (ja) * 2012-03-30 2013-10-10 Dainippon Printing Co Ltd 反射防止フィルムの製造方法
JP6205731B2 (ja) 2012-07-20 2017-10-04 シヤチハタ株式会社 多孔質印判の製造方法、多孔質印判、および多孔質印判の製造装置
DE102012112030A1 (de) 2012-12-10 2014-06-12 Ev Group E. Thallner Gmbh Verfahren zum Mikrokontaktprägen
TWI665078B (zh) 2013-07-22 2019-07-11 皇家飛利浦有限公司 製造圖案化印模以圖案化輪廓表面之方法、供在壓印微影製程中使用之圖案化印模、壓印微影方法、包括圖案化輪廓表面之物件及圖案化印模用於壓印微影之用法

Also Published As

Publication number Publication date
SG11201704948TA (en) 2017-07-28
EP3237971B1 (en) 2021-11-17
RU2017126139A (ru) 2019-01-25
EP3237971A1 (en) 2017-11-01
US20180004084A1 (en) 2018-01-04
JP6398010B2 (ja) 2018-09-26
US11086217B2 (en) 2021-08-10
JP2018503251A (ja) 2018-02-01
CN107111226A (zh) 2017-08-29
RU2017126139A3 (pt) 2019-05-21
CN107111226B (zh) 2021-04-13
KR20170097180A (ko) 2017-08-25
WO2016102185A1 (en) 2016-06-30
RU2695290C2 (ru) 2019-07-22
KR102540395B1 (ko) 2023-06-07

Similar Documents

Publication Publication Date Title
BR112017013073A2 (pt) estampa para litografia de estampagem, método de fabricação de uma estampa, uso de uma estampa, e método de impressão
EP3594293A4 (en) ACTINIC RAYS HARDENABLE INK FOR LITHOGRAPHIC PRINTING AND PROCESS FOR THE MANUFACTURING OF PRINTED PRODUCTS THEREOF
AR111162A1 (es) Procedimiento para producir una calcomanía y una calcomanía como también un dispositivo para producir una calcomanía y un procedimiento para decorar las superficies de objetos
ES2543154T3 (es) Procedimiento para la fabricación de una placa de material provista de una capa decorativa
ES2981581T3 (es) Tinta de impresión litográfica, barniz para tintas litográficas y procedimiento para preparar material impreso utilizando dicha tinta
BR112016010214A2 (pt) ?estampas de impressão por microcontato com características funcionais?
SG11201804742SA (en) Release film for ceramic green sheet production process
CO2017008847A2 (es) Método de impresión por inyección de tinta
IL253083A0 (en) Ink compound for fast screen photography, printed material made by taking a screen shot of an ink compound, and method of producing said screen shot material
EP4406748A3 (en) Methods for manufacturing panels having a decorative surface
DE502008002210D1 (de) Verfahren zum herstellen eines flächigen, bedruckten bauteils
BR112018067683A2 (pt) formulação pré-revestimento para impressão, substrato para impressão, método de preparo de uma superfície para impressão, métodos para impressão de um padrão em um substrato, métodos para padronização de uma superfície, artigos padronizados, método de formação de um padrão linear sobre uma superfície, sistemas de impressão de tinta, e kit
ECSP17067530A (es) Impresión de inyección de tinta en productos de fibrocemento
BR112018070494A2 (pt) carimbo para um processo de litografia por impressão, método de fabricação de um carimbo, kit de peças para a fabricação de um carimbo, método de formação de uma camada dotada de um padrão e uso de um carimbo
BR112015009655A2 (pt) método e aparelho para formar em um substrato um padrão de um material
WO2014120596A3 (en) Printed textile substrate and process for making it
BR112013020834A2 (pt) método para fabricação de uma folha de vidro de decorado
BR112019001453A2 (pt) método de fabricação de uma estampa à base de poliorganossiloxano, estampa à base de poliorganossiloxano, uso da mesma e método de formação de uma camada dotada de um padrão
BR112017012746A2 (pt) produção camada por camada de artigos moldados
BR112017027904A2 (pt) processo para produção de um laminado consistindo em uma placa de suporte e em papel decorativo disposto sobre a placa de suporte
BR112017011380A2 (pt) método para produzir uma parte de plástico de veículo
BR112016029321A2 (pt) método de formação de um dispositivo eletrônico sobre um substrato flexível
EP3660588A4 (en) ORIGINAL LITHOGRAPH PRINTING PLATE, METHOD FOR MANUFACTURING AN ORIGINAL LITHOGRAPH PRINTING PLATE AND CHROMOGENIC COMPOSITION
BR112015028535A2 (pt) método para a decoração de um substrato
PL3519200T3 (pl) Sposób wytwarzania odcisku pieczątki tuszem utwardzanym promieniami ultrafioletowymi, korzystnie pieczątką samotuszującą oraz pieczątka stosowana z tym sposobem

Legal Events

Date Code Title Description
B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B11B Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements