KR20190122273A - 내마모성 코팅 적용 시스템 및 방법 - Google Patents

내마모성 코팅 적용 시스템 및 방법 Download PDF

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Publication number
KR20190122273A
KR20190122273A KR1020197031078A KR20197031078A KR20190122273A KR 20190122273 A KR20190122273 A KR 20190122273A KR 1020197031078 A KR1020197031078 A KR 1020197031078A KR 20197031078 A KR20197031078 A KR 20197031078A KR 20190122273 A KR20190122273 A KR 20190122273A
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South Korea
Prior art keywords
substrate
plasma
precursor
atmospheric plasma
gas
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KR1020197031078A
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English (en)
Korean (ko)
Inventor
리암 에스.씨. 핑리
바산 에스. 순다람
마이클 아르. 시르키스
숀 엠. 페어
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더 보잉 컴파니
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Publication of KR20190122273A publication Critical patent/KR20190122273A/ko
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
KR1020197031078A 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법 Ceased KR20190122273A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/435,110 2009-05-04
US12/435,110 US8206794B2 (en) 2009-05-04 2009-05-04 System and method for applying abrasion-resistant coatings
PCT/US2010/031095 WO2010129149A1 (en) 2009-05-04 2010-04-14 Coating method

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020177015020A Division KR20170064567A (ko) 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법

Publications (1)

Publication Number Publication Date
KR20190122273A true KR20190122273A (ko) 2019-10-29

Family

ID=42269774

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020197031078A Ceased KR20190122273A (ko) 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법
KR1020117019566A Ceased KR20120014113A (ko) 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법
KR1020177015020A Ceased KR20170064567A (ko) 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020117019566A Ceased KR20120014113A (ko) 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법
KR1020177015020A Ceased KR20170064567A (ko) 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법

Country Status (6)

Country Link
US (1) US8206794B2 (enExample)
EP (1) EP2430211A1 (enExample)
JP (2) JP5728469B2 (enExample)
KR (3) KR20190122273A (enExample)
CN (1) CN102414341A (enExample)
WO (1) WO2010129149A1 (enExample)

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KR101702471B1 (ko) * 2011-08-26 2017-02-03 엑사테크 엘.엘.씨. 유기 수지 라미네이트, 이의 제조 및 이용 방법, 및 이를 포함하는 제품
US20130115867A1 (en) * 2011-11-08 2013-05-09 General Electric Company Enclosure system and method for applying coating
US10787591B2 (en) 2012-04-30 2020-09-29 The Boeing Company Composites including silicon-oxy-carbide layers and methods of making the same
US9180289B2 (en) 2012-08-29 2015-11-10 Cardiac Pacemakers, Inc. Enhanced low friction coating for medical leads and methods of making
US9139908B2 (en) 2013-12-12 2015-09-22 The Boeing Company Gradient thin films
EP3992330A1 (en) * 2020-10-29 2022-05-04 PartiX Powder coating method

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US4770940A (en) * 1984-09-10 1988-09-13 Ovonic Synthetic Materials Company Glow discharge method of applying a carbon coating onto a substrate and coating applied thereby
US4927704A (en) * 1987-08-24 1990-05-22 General Electric Company Abrasion-resistant plastic articles and method for making them
US5344712A (en) * 1990-06-29 1994-09-06 Ppg Industries, Inc. Abrasion resistant siloxane coatings containing ceria
US5433786A (en) * 1993-08-27 1995-07-18 The Dow Chemical Company Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein
FR2711556B1 (fr) * 1993-10-29 1995-12-15 Atohaas Holding Cv Procédé de dépôt d'une couche mince sur la surface d'un substrat en matière plastique.
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JPH10119336A (ja) * 1996-10-23 1998-05-12 Alps Electric Co Ltd サーマルヘッド及びその製造方法
US6010967A (en) * 1998-05-22 2000-01-04 Micron Technology, Inc. Plasma etching methods
EP1077479A1 (en) * 1999-08-17 2001-02-21 Applied Materials, Inc. Post-deposition treatment to enchance properties of Si-O-C low K film
US6495208B1 (en) * 1999-09-09 2002-12-17 Virginia Tech Intellectual Properties, Inc. Near-room temperature CVD synthesis of organic polymer/oxide dielectric nanocomposites
DE10131156A1 (de) * 2001-06-29 2003-01-16 Fraunhofer Ges Forschung Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung
TW200409669A (en) * 2002-04-10 2004-06-16 Dow Corning Ireland Ltd Protective coating composition
FR2843408B1 (fr) * 2002-08-06 2005-04-08 Saint Gobain Procede de formation d'un revetement sur un vitrage en matiere plastique
AU2003260000A1 (en) * 2002-08-26 2004-03-11 Sigma Technologies International, Inc. Barrier coatings produced by atmospheric glow discharge
US7468311B2 (en) * 2003-09-30 2008-12-23 Tokyo Electron Limited Deposition of silicon-containing films from hexachlorodisilane
EP1702010A4 (en) * 2003-12-16 2008-12-31 Sun Chemical Corp METHOD FOR FORMING A RADIATION-RESISTABLE COATING AND A COATED ARTICLE
WO2005087977A1 (en) * 2004-03-09 2005-09-22 Exatec, Llc Expanding thermal plasma deposition system
US7030041B2 (en) * 2004-03-15 2006-04-18 Applied Materials Inc. Adhesion improvement for low k dielectrics
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Also Published As

Publication number Publication date
JP5728469B2 (ja) 2015-06-03
US8206794B2 (en) 2012-06-26
CN102414341A (zh) 2012-04-11
EP2430211A1 (en) 2012-03-21
KR20170064567A (ko) 2017-06-09
KR20120014113A (ko) 2012-02-16
JP6022629B2 (ja) 2016-11-09
WO2010129149A1 (en) 2010-11-11
JP2012526190A (ja) 2012-10-25
US20100279027A1 (en) 2010-11-04
JP2015163738A (ja) 2015-09-10

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