KR20180096770A - 임프린트 장치, 임프린트 방법 및 물품 제조 방법 - Google Patents

임프린트 장치, 임프린트 방법 및 물품 제조 방법 Download PDF

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Publication number
KR20180096770A
KR20180096770A KR1020187021163A KR20187021163A KR20180096770A KR 20180096770 A KR20180096770 A KR 20180096770A KR 1020187021163 A KR1020187021163 A KR 1020187021163A KR 20187021163 A KR20187021163 A KR 20187021163A KR 20180096770 A KR20180096770 A KR 20180096770A
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KR
South Korea
Prior art keywords
region
processed
mold
heat
pattern
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Ceased
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KR1020187021163A
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English (en)
Korean (ko)
Inventor
다츠야 하야시
요스케 무라카미
Original Assignee
캐논 가부시끼가이샤
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Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20180096770A publication Critical patent/KR20180096770A/ko
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020187021163A 2015-12-25 2016-11-10 임프린트 장치, 임프린트 방법 및 물품 제조 방법 Ceased KR20180096770A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2015-254740 2015-12-25
JP2015254740A JP2017118054A (ja) 2015-12-25 2015-12-25 インプリント装置、インプリント方法、および物品の製造方法
PCT/JP2016/004859 WO2017110032A1 (en) 2015-12-25 2016-11-10 Imprint apparatus, method of imprinting, and method of fabricating product

Publications (1)

Publication Number Publication Date
KR20180096770A true KR20180096770A (ko) 2018-08-29

Family

ID=59089850

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187021163A Ceased KR20180096770A (ko) 2015-12-25 2016-11-10 임프린트 장치, 임프린트 방법 및 물품 제조 방법

Country Status (4)

Country Link
JP (1) JP2017118054A (https=)
KR (1) KR20180096770A (https=)
TW (1) TW201735105A (https=)
WO (1) WO2017110032A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102463923B1 (ko) * 2017-09-18 2022-11-07 에스케이하이닉스 주식회사 임프린트 패턴 형성 방법 및 임프린트 장치
JP7061895B2 (ja) * 2018-02-27 2022-05-02 Hoya株式会社 インプリントモールド用基板、マスクブランク及びインプリントモールドの製造方法
EP4398040A3 (en) 2018-11-08 2025-07-02 Canon Kabushiki Kaisha Imprint apparatus and product manufacturing method
JP7286391B2 (ja) * 2019-04-16 2023-06-05 キヤノン株式会社 インプリント装置及び物品の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013102132A (ja) 2011-10-14 2013-05-23 Canon Inc インプリント装置、それを用いた物品の製造方法
JP2013175671A (ja) 2012-02-27 2013-09-05 Dainippon Printing Co Ltd ナノインプリント用レプリカテンプレートの製造方法及びレプリカテンプレート

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005045168A (ja) * 2003-07-25 2005-02-17 Tokyo Electron Ltd インプリント方法およびインプリント装置
KR100878749B1 (ko) * 2004-12-20 2009-01-14 고마츠 산키 가부시키가이샤 온도 조절 플레이트 및 열 전사 프레스 기계
EP1795497B1 (en) * 2005-12-09 2012-03-14 Obducat AB Apparatus and method for transferring a pattern with intermediate stamp
KR101777905B1 (ko) * 2013-10-17 2017-09-12 캐논 가부시끼가이샤 임프린트 장치 그리고 물품을 제조하는 방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013102132A (ja) 2011-10-14 2013-05-23 Canon Inc インプリント装置、それを用いた物品の製造方法
JP2013175671A (ja) 2012-02-27 2013-09-05 Dainippon Printing Co Ltd ナノインプリント用レプリカテンプレートの製造方法及びレプリカテンプレート

Also Published As

Publication number Publication date
JP2017118054A (ja) 2017-06-29
WO2017110032A1 (en) 2017-06-29
TW201735105A (zh) 2017-10-01

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