KR20170066319A - 스트레인 수정된 표면 활성 영역을 가진 iii-질화물 나노와이어 led 및 이의 제조 방법 - Google Patents

스트레인 수정된 표면 활성 영역을 가진 iii-질화물 나노와이어 led 및 이의 제조 방법 Download PDF

Info

Publication number
KR20170066319A
KR20170066319A KR1020177005165A KR20177005165A KR20170066319A KR 20170066319 A KR20170066319 A KR 20170066319A KR 1020177005165 A KR1020177005165 A KR 1020177005165A KR 20177005165 A KR20177005165 A KR 20177005165A KR 20170066319 A KR20170066319 A KR 20170066319A
Authority
KR
South Korea
Prior art keywords
shell
nanowire
indium
region
lower portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020177005165A
Other languages
English (en)
Korean (ko)
Inventor
린다 로마노
핑 왕
Original Assignee
글로 에이비
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 글로 에이비 filed Critical 글로 에이비
Publication of KR20170066319A publication Critical patent/KR20170066319A/ko
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/819Bodies characterised by their shape, e.g. curved or truncated substrates
    • H10H20/821Bodies characterised by their shape, e.g. curved or truncated substrates of the light-emitting regions, e.g. non-planar junctions
    • H01L33/24
    • H01L33/0008
    • H01L33/0075
    • H01L33/06
    • H01L33/18
    • H01L33/32
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/013Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
    • H10H20/0133Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
    • H10H20/01335Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/013Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
    • H10H20/0137Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials the light-emitting regions comprising nitride materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • H10H20/0363Manufacture or treatment of packages of optical field-shaping means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/811Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
    • H10H20/812Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/813Bodies having a plurality of light-emitting regions, e.g. multi-junction LEDs or light-emitting devices having photoluminescent regions within the bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/815Bodies having stress relaxation structures, e.g. buffer layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/817Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
    • H10H20/818Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous within the light-emitting regions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/8215Bodies characterised by crystalline imperfections, e.g. dislocations; characterised by the distribution of dopants, e.g. delta-doping
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/822Materials of the light-emitting regions
    • H10H20/824Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H10H20/825Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/83Electrodes
    • H10H20/832Electrodes characterised by their material
    • H10H20/833Transparent materials
    • H01L2933/0058

Landscapes

  • Led Devices (AREA)
KR1020177005165A 2014-08-12 2015-08-07 스트레인 수정된 표면 활성 영역을 가진 iii-질화물 나노와이어 led 및 이의 제조 방법 Withdrawn KR20170066319A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201462036363P 2014-08-12 2014-08-12
US62/036,363 2014-08-12
PCT/US2015/044245 WO2016025325A1 (en) 2014-08-12 2015-08-07 Iii-nitride nanowire led with strain modified surface active region and method of making thereof

Publications (1)

Publication Number Publication Date
KR20170066319A true KR20170066319A (ko) 2017-06-14

Family

ID=55304513

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020177005165A Withdrawn KR20170066319A (ko) 2014-08-12 2015-08-07 스트레인 수정된 표면 활성 영역을 가진 iii-질화물 나노와이어 led 및 이의 제조 방법

Country Status (6)

Country Link
US (2) US9882086B2 (enExample)
EP (1) EP3180806A4 (enExample)
JP (1) JP6505208B2 (enExample)
KR (1) KR20170066319A (enExample)
CN (1) CN107251239B (enExample)
WO (1) WO2016025325A1 (enExample)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2297794B1 (en) 2008-07-07 2017-09-06 Glo Ab Nanostructured light emitting diode
WO2014138904A1 (en) * 2013-03-14 2014-09-18 The Royal Institution For The Advancement Of Learning/Mcgill University Methods and devices for solid state nanowire devices
WO2016022824A1 (en) 2014-08-08 2016-02-11 Glo Ab Pixilated display device based upon nanowire leds and method for making the same
KR20170066319A (ko) 2014-08-12 2017-06-14 글로 에이비 스트레인 수정된 표면 활성 영역을 가진 iii-질화물 나노와이어 led 및 이의 제조 방법
WO2016049507A1 (en) 2014-09-26 2016-03-31 Glo Ab Monolithic image chip for near-to-eye display
DE102014117892A1 (de) * 2014-12-04 2016-06-09 Osram Opto Semiconductors Gmbh Optoelektronisches Bauelement sowie optoelektronisches Bauteil
KR101787435B1 (ko) 2016-02-29 2017-10-19 피에스아이 주식회사 나노 로드 제조방법
US9978808B2 (en) 2016-05-04 2018-05-22 Glo Ab Monolithic multicolor direct view display containing different color LEDs and method of making thereof
TWI718343B (zh) 2016-10-24 2021-02-11 瑞典商Glo公司 發光二極體、顯示裝置及直視顯示裝置
CN107749437A (zh) * 2017-11-17 2018-03-02 广州市香港科大霍英东研究院 可挠性发光二极管制程及其结构
US11605668B2 (en) * 2018-05-21 2023-03-14 Intel Corporation Pixel architectures for low power micro light-emitting diode displays
CN109037401A (zh) * 2018-06-21 2018-12-18 中国工程物理研究院电子工程研究所 一种氮化镓基水平纳米柱壳核结构阵列led的制备方法
CN109616553B (zh) * 2018-11-22 2020-06-30 中南大学 一种新型纤锌矿GaAs核壳纳米线光电探测器的制备方法
US11302248B2 (en) 2019-01-29 2022-04-12 Osram Opto Semiconductors Gmbh U-led, u-led device, display and method for the same
US11610868B2 (en) 2019-01-29 2023-03-21 Osram Opto Semiconductors Gmbh μ-LED, μ-LED device, display and method for the same
US11156759B2 (en) 2019-01-29 2021-10-26 Osram Opto Semiconductors Gmbh μ-LED, μ-LED device, display and method for the same
US11271143B2 (en) 2019-01-29 2022-03-08 Osram Opto Semiconductors Gmbh μ-LED, μ-LED device, display and method for the same
DE112020000561A5 (de) 2019-01-29 2021-12-02 Osram Opto Semiconductors Gmbh Videowand, treiberschaltung, ansteuerungen und verfahren derselben
CN109860355A (zh) * 2019-02-02 2019-06-07 苏州汉骅半导体有限公司 深紫外led制备方法
JP7642549B2 (ja) 2019-02-11 2025-03-10 エイエムエス-オスラム インターナショナル ゲーエムベーハー 光電子構造素子、光電子配置構造体および方法
WO2020216549A1 (de) 2019-04-23 2020-10-29 Osram Opto Semiconductors Gmbh Led modul, led displaymodul und verfahren zu dessen herstellung
US11538852B2 (en) 2019-04-23 2022-12-27 Osram Opto Semiconductors Gmbh μ-LED, μ-LED device, display and method for the same
JP7608368B2 (ja) 2019-05-13 2025-01-06 エイエムエス-オスラム インターナショナル ゲーエムベーハー マルチチップ用キャリア構造体
JP7494215B2 (ja) 2019-05-23 2024-06-03 エイエムエス-オスラム インターナショナル ゲーエムベーハー 照明配置構造体、光誘導配置構造体およびそれらに関する方法
US10930747B2 (en) * 2019-06-04 2021-02-23 Nxp B.V. Semiconductor device with an encircled electrode
JP7336767B2 (ja) * 2019-10-03 2023-09-01 株式会社小糸製作所 半導体発光素子および半導体発光素子の製造方法
JP7594578B2 (ja) 2019-09-20 2024-12-04 エイエムエス-オスラム インターナショナル ゲーエムベーハー 光電子構造素子、半導体構造およびそれらに関する方法
US11784285B2 (en) 2020-02-04 2023-10-10 Samsung Electronics Co., Ltd. Three dimensionally structured semiconductor light emitting diode and display apparatus
CN116014043B (zh) * 2023-03-24 2023-06-02 江西兆驰半导体有限公司 深紫外发光二极管外延片及其制备方法、led

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3660446B2 (ja) * 1996-11-07 2005-06-15 日亜化学工業株式会社 窒化物半導体素子及びその製造方法
JP3282174B2 (ja) 1997-01-29 2002-05-13 日亜化学工業株式会社 窒化物半導体発光素子
JP4158519B2 (ja) * 2002-12-26 2008-10-01 住友電気工業株式会社 白色発光素子およびその製造方法
US7968359B2 (en) 2006-03-10 2011-06-28 Stc.Unm Thin-walled structures
US20140012224A1 (en) 2006-04-07 2014-01-09 The Regents Of The University Of California Targeted hollow gold nanostructures and methods of use
JP5453105B2 (ja) 2006-12-22 2014-03-26 クナノ アーベー ナノ構造のled及びデバイス
CN101681813B (zh) 2007-01-12 2012-07-11 昆南诺股份有限公司 氮化物纳米线及其制造方法
US8188513B2 (en) * 2007-10-04 2012-05-29 Stc.Unm Nanowire and larger GaN based HEMTS
JP2009105088A (ja) 2007-10-19 2009-05-14 Panasonic Electric Works Co Ltd 半導体発光素子およびそれを用いる照明装置ならびに半導体発光素子の製造方法
JP4856666B2 (ja) * 2008-03-26 2012-01-18 独立行政法人科学技術振興機構 発光ダイオード素子及びその製造方法
US8138493B2 (en) 2008-07-09 2012-03-20 Qunano Ab Optoelectronic semiconductor device
KR101549620B1 (ko) 2009-01-30 2015-09-02 삼성전자주식회사 pn 구조를 지닌 Zn 산화물 나노 와이어 및 그 제조 방법
KR20110064702A (ko) 2009-12-08 2011-06-15 삼성전자주식회사 요철 구조를 지닌 코어-쉘 나노 와이어 및 이를 이용한 열전 소자
US9112240B2 (en) 2010-01-04 2015-08-18 Nanotek Instruments, Inc. Lithium metal-sulfur and lithium ion-sulfur secondary batteries containing a nano-structured cathode and processes for producing same
US8138439B2 (en) 2010-02-11 2012-03-20 Eaton Corporation Limiter including a number of gas channels and electrical switching apparatus employing the same
EP2553696A4 (en) 2010-04-02 2016-07-06 Intel Corp LOAD MEMORY DEVICE, METHOD OF MANUFACTURING THEREFOR, METHOD FOR PRODUCING AN ELECTRICALLY CONDUCTIVE STRUCTURE THEREFOR, MOBILE ELECTRONIC DEVICE THEREWITH AND MICROELECTRONIC DEVICE THEREWITH
EP2586062A4 (en) 2010-06-24 2015-06-03 Glo Ab SUBSTRATE WITH BUFFER LAYER FOR ALIGNED NANODRAHT GROWTH
FR2975532B1 (fr) * 2011-05-18 2013-05-10 Commissariat Energie Atomique Connexion electrique en serie de nanofils emetteurs de lumiere
KR101691906B1 (ko) * 2010-09-14 2017-01-02 삼성전자주식회사 Ⅲ족 질화물 나노로드 발광 소자 제조방법
KR20120052651A (ko) * 2010-11-16 2012-05-24 삼성엘이디 주식회사 나노로드 발광소자
KR20120059064A (ko) 2010-11-30 2012-06-08 삼성엘이디 주식회사 발광소자 및 그 제조방법
US8350251B1 (en) * 2011-09-26 2013-01-08 Glo Ab Nanowire sized opto-electronic structure and method for manufacturing the same
TWI476953B (zh) * 2012-08-10 2015-03-11 Univ Nat Taiwan 半導體發光元件及其製作方法
WO2014066379A1 (en) * 2012-10-26 2014-05-01 Glo Ab Nanowire sized opto-electronic structure and method for modifying selected portions of same
JP6070257B2 (ja) * 2013-02-21 2017-02-01 株式会社リコー 13族窒化物結晶の製造方法、及び13族窒化物結晶の製造装置
US9054233B2 (en) 2013-06-07 2015-06-09 Glo Ab Multicolor LED and method of fabricating thereof
EP3084847B1 (en) * 2013-12-17 2018-02-14 Glo Ab Iii-nitride nanowire led with strain modified surface active region and method of making thereof
WO2016022824A1 (en) * 2014-08-08 2016-02-11 Glo Ab Pixilated display device based upon nanowire leds and method for making the same
KR20170066319A (ko) 2014-08-12 2017-06-14 글로 에이비 스트레인 수정된 표면 활성 영역을 가진 iii-질화물 나노와이어 led 및 이의 제조 방법

Also Published As

Publication number Publication date
CN107251239B (zh) 2019-06-28
CN107251239A (zh) 2017-10-13
EP3180806A1 (en) 2017-06-21
WO2016025325A1 (en) 2016-02-18
WO2016025325A9 (en) 2017-03-23
US20180145218A1 (en) 2018-05-24
JP6505208B2 (ja) 2019-04-24
US9882086B2 (en) 2018-01-30
US20170236975A1 (en) 2017-08-17
EP3180806A4 (en) 2018-03-07
JP2017525159A (ja) 2017-08-31
US10205054B2 (en) 2019-02-12

Similar Documents

Publication Publication Date Title
US10205054B2 (en) III-nitride nanowire LED with strain modified surface active region and method of making thereof
US10026866B2 (en) III-nitride nanowire LED with strain modified surface active region and method of making thereof
JP6486519B2 (ja) ナノワイヤサイズの光電構造及びその選択された部分を改質する方法
CN103022296B (zh) 一种半导体外延结构及其发光器件
KR20110039335A (ko) 광전자 반도체 디바이스
US20160035941A1 (en) High index dielectric film to increase extraction efficiency of nanowire leds
US9196787B2 (en) Nanowire LED structure with decreased leakage and method of making same
US9196792B2 (en) Nanowire LED structure with decreased leakage and method of making same
TW201511334A (zh) 具有經減低漏電之奈米線發光二極體結構及其製造方法

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20170223

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination