KR20170038654A - Die bonder and manufacturing method of semiconductor device - Google Patents
Die bonder and manufacturing method of semiconductor device Download PDFInfo
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- KR20170038654A KR20170038654A KR1020160106879A KR20160106879A KR20170038654A KR 20170038654 A KR20170038654 A KR 20170038654A KR 1020160106879 A KR1020160106879 A KR 1020160106879A KR 20160106879 A KR20160106879 A KR 20160106879A KR 20170038654 A KR20170038654 A KR 20170038654A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4885—Wire-like parts or pins
- H01L21/4896—Mechanical treatment, e.g. cutting, bending
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68313—Auxiliary support including a cavity for storing a finished device, e.g. IC package, or a partly finished device, e.g. die, during manufacturing or mounting
Abstract
Description
The present disclosure relates to a die bonder and is applicable to a die bonder having a die bond head that moves, for example, by a servo motor and a ball screw.
In the die bonder, the die is vacuum-adsorbed by the bonding head, and the die is raised at high speed, moved horizontally, and lowered to be mounted on the substrate. In this case, it is the elevation drive shaft (Z drive shaft) that raises and lowers, and the Y drive shaft that horizontally moves. The Z drive shaft is constituted by a drive motor and a ball screw provided in the vertical direction (Z direction) (for example, Japanese Patent Application Laid-Open No. 233578/1990 (patent document 1)).
In the mechanism of
The object of the present invention is to provide a die bonding technique capable of improving the precision of a drive shaft for lifting and lowering a bonding head.
Other tasks and novel features will become apparent from the description of the present specification and the accompanying drawings.
An outline of representative examples of the present disclosure will be briefly described below.
That is, the die bonder has a first drive shaft for moving the bonding head in the first axial direction and a second drive shaft for moving in the horizontal direction. The first drive shaft includes a servo motor, a ball screw rotated by the servo motor, a nut for receiving the ball screw, a first inclined cam provided on the nut, A first supporting member connected to the first inclined cam, and a second supporting member connected to the second inclined cam.
According to the die bonder, the precision of the drive shaft for lifting and lowering the bonding head can be improved.
BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is a schematic top view showing a configuration of a die bonder according to an embodiment; FIG.
Fig. 2 is an external perspective view showing the configuration of the die supply unit of Fig. 1; Fig.
3 is a schematic cross-sectional view showing the main part of the die supply portion of Fig.
Fig. 4 is a view for explaining a schematic configuration of the die bonder of Fig. 1 and its operation. Fig.
5 is a view for explaining the bonding head table of FIG.
6 is a side view showing a configuration of a ZY drive shaft of the bonding head table of FIG.
7 is a side view showing a configuration of a ZY drive shaft of a bonding head table according to Comparative Example 1. Fig.
8 is a side view showing a configuration of a ZY drive shaft of a bonding head table according to Comparative Example 2. Fig.
9 is a side view showing a configuration of a ZY drive shaft of a bonding head table according to a third comparative example.
10 is a schematic top view showing a configuration of a die bonder according to a modification.
There is a step of assembling a package by mounting a semiconductor chip (hereinafter simply referred to as a semiconductor chip) on a wiring board or a lead frame (hereinafter, simply referred to as a board) in a part of the manufacturing process of the semiconductor device, In part, there are a step of dividing a die from a semiconductor wafer (hereinafter simply referred to as a wafer) and a bonding step of mounting the divided die on a substrate. The manufacturing apparatus used in the bonding process is a die bonder.
The die bonder is a device for bonding (mounting and bonding) a die on a substrate or an already bonded die, using solder, gold plating, or resin as a bonding material. In a die bonder for bonding a die, for example, to a surface of a substrate, a die is picked up from a wafer by using a suction nozzle called a collet, and the die is carried on a substrate to give a pressing force, (Operation) for performing bonding is repeatedly performed. The collet has a suction hole, a suction port for sucking air and sucking and holding the die, and has the same size as the die.
The
According to the embodiment, the accuracy of the first drive shaft can be increased.
Hereinafter, examples, comparative examples and modified examples will be described with reference to the drawings. In the following description, the same constituent elements are denoted by the same reference numerals, and repeated explanation may be omitted. In order to make the description more clear, the drawings are schematically shown in terms of width, thickness, shape, and the like of each part in comparison with the actual shape, but they are merely examples and do not limit the interpretation of the present invention.
[Example]
1 is a schematic top view of a die bonder according to an embodiment. The
The
Each of the
Each of the
Each of the
With this configuration, the bonding head BBH corrects the pickup position / posture based on the image pickup data of the stage recognition camera VSA, picks up the die D from the intermediate stage BAS, (D) is bonded to the substrate (P) based on the imaging data of the substrate (VSB).
The transport section 5 includes a
Next, a detailed configuration of the wafer supply unit will be described with reference to Figs. 2 and 3. Fig. 2 is an external perspective view showing a main part of the wafer supply unit. 3 is a schematic cross-sectional view showing a main part of the wafer supply unit. A die attach film (DAF) 18 is attached to the back surface of the
The wafer ring holder WRH lowers the expanding
Fig. 4 is a schematic side view of the main part of the die bonder. Fig. The
The
The
The
Hereinafter, the bonding head table BHT and the bonding head BBH of the
FIG. 5A is a side view for explaining the bonding head table of FIG. 1; FIG. FIG. 5B is a top view for explaining the bonding head table of FIG. 1; FIG. 6A is a side view showing the configuration of the ZY drive shaft of the bonding head table of FIG. 6 (B) is an arrow A of FIG. 6 (A).
The bonding head table BHT includes a
6 (B), the
The
The
6A, the
One end of the first supporting body 85_1 is connected to the first inclined cam 84c1 and extends in the X direction. The upper portion of the first Z axis movable portion 81_1 is connected to the other end of the first support 85_1 and extends in the Z direction. The lower portion of the first Z axis movable part 81_1 is fixed to the Y direction guide 86. [ One end of the second support body 85_2 is connected to the second inclined cam 84c2 and extends in the X direction. The upper portion of the second Z axis movable portion 81_2 is connected to the other end of the second support member 85_2 and elongated in the Z direction. The lower portion of the second Z-axis movable portion 81_2 is fixed to the Y-
The Y-
The bonding head BBH is connected to the Y-axis
≪ Comparative Example 1 &
Fig. 7A is a side view in the X-direction showing the structure of the ZY drive shaft of the bonding head table according to Comparative Example 1. Fig. Fig. 7B is an arrow A in Fig. 7A.
The
The
The
The first driving portion 84_1R includes a first driving motor (servo motor) 84a1R fixed to the Z-
The second driving portion 84_2R includes a second driving motor (servo motor) 84a2R fixed to the Z-
The Y-
In the first comparative example, there is a fear of synchronous operation of the first driver 84_1R and the second driver 84_2R.
≪ Comparative Example 2 &
8A is a side view in the X direction showing the structure of the ZY drive shaft of the bonding head table according to the second comparative example. 8 (B) is an arrow A of FIG. 8 (A).
The
The
The first driving part 84_1S includes a first driving motor (servo motor) 84a1 fixed to the Z-
The first drive unit 84_1S performs a circular motion in which the Y direction of the first drive motor 84a1 is the center of rotation by the first ball screw 84b1S and the first nut 84d1S to the first inclined cam 84c1 And the linear motion in the Y direction is converted by the first tilt cam 84c1 into the linear movement in the Z direction of the first support body 85_1 and the first Z axis movable part 81_1 Vertical motion). The second drive unit 84_2S is configured to move the circular motion with the Y direction of the second drive motor 84a2 as the center of rotation as the second ball screw 84b2S and the second nut 84d1S to the second inclined cam 84c2 And the linear motion in the Y direction is converted by the second tilt cam 84c2 into the linear motion in the Z direction of the second support body 85_2 and the second Z axis movable part 81_2 Vertical motion).
In Comparative Example 2, the height of the bonding head table can be made lower than that in Comparative Example 1, but there is a fear of synchronous operation of the two pairs of drivers 84S as in Comparative Example 1. [
≪ Comparative Example 3 &
9A is a side view in the X direction showing the structure of the ZY drive shaft of the bonding head table according to Comparative Example 3. Fig. 9 (B) is an arrow A in Fig. 9 (A).
The
The
The driving
The driving
In Comparative Example 3, as in Comparative Example 2, the height of the bonding head table can be made lower than that of Comparative Example 1. However, there is a risk of occurrence of thread scuffing due to a change in distance between the two nuts.
<Modifications>
10 is a schematic top view showing a configuration of a die bonder according to a modification.
The
The
In the die bonder according to the modified example, the bonding head table BHT and the bonding head BBH are configured in the same manner as in the embodiment, since the Y-axis long stroke of the bonding head is the same as in the embodiment.
When screws or nuts are arranged in two places as in the comparative example, problems are likely to occur due to differences in load and precision. On the other hand, in the present embodiment, one ball screw arranged in the Y direction and two inclined cams with one nut are operated to perform the Z-axis (vertical) operation. Thereby, two deviations can be eliminated, and the precision of the Z drive shaft can be increased.
Further, in the Z drive shaft by the linear motor, the weight and cost of the Z stator (magnet) are increased by the Y axis long stroke. On the other hand, in the present embodiment, since no linear motor is used for the Z drive shaft, the increase in weight and cost can be suppressed even by the Y-axis long stroke.
The invention made by the present inventors has been specifically described based on the embodiments, examples, comparative examples and modified examples. However, the present invention is not limited to the above-mentioned embodiments, examples, Of course.
For example, although two inclined cams are used in the embodiment, two revolving cams and link mechanisms may be operated by one ball screw.
10: die bonder
1: wafer supply section
D: Die
2A, 2B: Pickup section
3A, 3B: alignment part
BAS: Intermediate stage
4A and 4B:
BBH: Bonding head
42: Collet
BHT: bonding head table
60: ZY drive shaft
70: Y drive shaft
80: Z drive shaft
81_1: First Z axis movable part
81_2: Second Z-axis movable part
84:
84a: Servo motor
84b: Ball Screw
84c1: First inclined cam
84c2: 2nd inclined cam
84d: nut
85_1: first support
85_2: second support
90: X drive shaft
5:
BS: Bonding stage
P: substrate
8: Control device
Claims (19)
An intermediate stage for loading the pickup die,
A bonding head for bonding the die loaded on the intermediate stage onto a substrate or a die already bonded to the substrate,
A bonding head table for driving the bonding head
And,
The bonding head table includes:
A first driving shaft for moving the bonding head in a first direction,
A second driving shaft for moving the bonding head in a horizontal direction in a second direction,
And,
The first drive shaft
A servo motor,
A ball screw rotated by the servomotor,
A nut for receiving the ball screw,
A first inclined cam provided on the nut,
A second inclined cam disposed on the nut at a predetermined distance from the first inclined cam,
A first first shaft movable part connected to the first inclined cam,
And a second first shaft movable part connected to the second slant cam
And a die bonder.
Wherein the first drive shaft is configured to move a circular motion having the center of rotation as the center of rotation of the servo motor to the horizontal movement of the first inclined cam and the second inclined cam in the second direction by the ball screw and the nut And the horizontal movement in the second direction is transmitted to the first inclined cam and the second inclined cam respectively by upward and downward movement in the first direction of the first first shaft movable portion and the second first shaft movable portion, Converting, die bonder.
The bonding head table also includes
A second direction guide connected to the bonding head,
A first support body having one end connected to the first inclined cam and the other end connected to the first first shaft movable part;
And the other end of which is connected to the second tilt cam;
And,
Wherein the first first shaft movable part and the second first shaft movable part fix the second direction guide and move the first shaft movable part and the second first shaft movable part in accordance with the up- And the second direction guide moves up and down.
The bonding head table also includes
A connection portion connecting the bonding head and the second drive shaft,
A rail fixed to the connection portion and extending in a first direction,
And a slider fixed on the bonding head to move on the rail,
And a die bonder.
The second direction guide includes a rail connected to the first first movable shaft and the second movable shaft, and a slider connected to the bonding head,
And a die bonder.
Wherein the distance between the nearest bonding point that is bondable from the die pick-up position of the intermediate stage and the farthest bonding point that can be bonded is longer than the distance from the die pick-up position to the closest bonding point that is bondable.
And the second drive shaft drives the bonding head with a linear motor.
The second drive shaft
A second shaft fixing part having a stationary magnet arranged in the second direction fixed to the support,
A second shaft movable part which is fixed to the connection part and inserted in the concave part of the second shaft fixed shaft and moves in the concave part,
And a die bonder.
And the second drive shaft further comprises a second axial linear guide provided between the connecting portion and the support.
The second linear linear guide includes a linear rail extending in a second direction,
A linear slider for moving the linear rail,
And a die bonder.
(a) preparing a cut wafer mounted on a dicing film,
(b) first and second pick heads for picking up a die pushed up from the wafer, first and second intermediate stages for loading the picked-up die, and first and second intermediate stages A first bonding head and a second bonding head for bonding the die to a substrate or a die already bonded to the substrate, and first and second bonding head tables for driving the first and second bonding heads, respectively, Each of the first and second bonding head tables includes a first drive shaft for driving the ball screw by a servo motor to move the first and second bonding heads in a first direction and a second drive shaft for driving the first and second bonding heads And a second drive shaft for moving the bonding head in a horizontal direction in a second direction, wherein the nearest bonding point that can be bonded from each of the die pick-up positions of the first and second intermediate stages, Its distance, the step of preparing a long, the die bonder than the distance to the nearest die-bonding point bondable from the pick-up position and,
(c) bonding the die in the wafer to the substrate or the die already bonded
And a step of forming the semiconductor device.
The step (c)
(c1) alternately picking up dies in the wafer by the first pick-up head and the second pick-up head, respectively, and loading the dies in the first and second intermediate stages,
(c2) picking up the dies loaded in the first and second intermediate stages with the first and second bonding heads and bonding them onto the substrates or pre-bonded dies, respectively, mounted on the first and second bonding stages
And a step of forming the semiconductor device.
Each of the first drive shafts of the first and second bonding head tables further includes:
A first inclined cam,
A second inclined cam,
A nut for receiving the ball screw,
A first first shaft movable part,
The second first axis moving part
And,
The circular motion of the servo motor with the second axial direction as the center of rotation is converted into the horizontal motion of the first inclined cam and the second inclined cam in the second direction by the ball screw and the nut,
The horizontal movement in the second direction is converted into the vertical movement of the first first movable portion in the first direction by the first inclined cam,
And the horizontal movement in the second direction is converted into the vertical movement in the first direction of the second first shaft movable part by the second inclined cam.
Each of the first and second bonding head tables further includes:
A second direction guide connected to the bonding head,
A first support body having one end connected to the first inclined cam and the other end connected to the first first shaft movable part;
And the other end of which is connected to the second tilt cam;
And,
The first first shaft movable part and the second first shaft movable part fix the second direction guide,
And the second direction guide moves up and down in accordance with the upward and downward movement of the first first shaft movable portion and the second first shaft movable portion.
Each of the first and second bonding head tables further includes:
A connecting portion connecting the first driving shaft and the second driving shaft,
A rail fixed to the connection portion and extending in the first direction,
And a slider fixed on the bonding head to move on the rail,
Wherein the semiconductor device is a semiconductor device.
Wherein the second direction guide includes a rail connected to the second support and a slider connected to the first shaft movable part.
The second drive shaft of each of the first and second bonding head tables,
A second shaft fixing part having a stationary magnet arranged in the second direction fixed to the support,
A second shaft movable part which is fixed to the connection part and inserted in the concave part of the second shaft fixed shaft and moves in the concave part,
Wherein the semiconductor device is a semiconductor device.
And the second drive shaft further includes a second axial linear guide provided between the connecting portion and the support.
The second linear linear guide includes a linear rail extending in a second direction,
A linear slider for moving the linear rail,
Wherein the semiconductor device is a semiconductor device.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2015194093A JP6573813B2 (en) | 2015-09-30 | 2015-09-30 | Die bonder and semiconductor device manufacturing method |
JPJP-P-2015-194093 | 2015-09-30 |
Publications (2)
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KR20170038654A true KR20170038654A (en) | 2017-04-07 |
KR101886923B1 KR101886923B1 (en) | 2018-08-08 |
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KR1020160106879A KR101886923B1 (en) | 2015-09-30 | 2016-08-23 | Die bonder and manufacturing method of semiconductor device |
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JP (1) | JP6573813B2 (en) |
KR (1) | KR101886923B1 (en) |
CN (1) | CN106558524B (en) |
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Cited By (3)
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KR20180131425A (en) * | 2017-05-31 | 2018-12-10 | 파스포드 테크놀로지 주식회사 | Semiconductor manufacturing apparatus and method for manufacturing semiconductor device |
KR20190100036A (en) * | 2018-02-19 | 2019-08-28 | 파스포드 테크놀로지 주식회사 | Mounting device and manufacturing method of semiconductor device |
KR20210144899A (en) * | 2019-04-15 | 2021-11-30 | 가부시키가이샤 신가와 | mounting device |
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KR101969555B1 (en) * | 2017-08-18 | 2019-04-16 | 주식회사 한라정밀엔지니어링 | Apparatus and method for ejecting a semiconductor chip |
JP6967411B2 (en) * | 2017-09-19 | 2021-11-17 | ファスフォードテクノロジ株式会社 | Semiconductor manufacturing equipment, semiconductor equipment manufacturing methods and collets |
JP7291586B2 (en) | 2019-09-19 | 2023-06-15 | ファスフォードテクノロジ株式会社 | Die bonding apparatus and semiconductor device manufacturing method |
CN113873781B (en) * | 2021-12-06 | 2022-03-11 | 常州铭赛机器人科技股份有限公司 | Mounting head |
CN114783938B (en) * | 2022-03-09 | 2023-05-05 | 恩纳基智能科技无锡有限公司 | High-precision mounting equipment capable of automatically feeding and discharging and use method thereof |
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Also Published As
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CN106558524B (en) | 2019-07-05 |
JP6573813B2 (en) | 2019-09-11 |
TWI613738B (en) | 2018-02-01 |
TW201724287A (en) | 2017-07-01 |
KR101886923B1 (en) | 2018-08-08 |
CN106558524A (en) | 2017-04-05 |
JP2017069418A (en) | 2017-04-06 |
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