KR20160067940A - 페라이트 막대들을 제조하기 위한 정밀 배치 생성 방법 - Google Patents

페라이트 막대들을 제조하기 위한 정밀 배치 생성 방법 Download PDF

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Publication number
KR20160067940A
KR20160067940A KR1020167011943A KR20167011943A KR20160067940A KR 20160067940 A KR20160067940 A KR 20160067940A KR 1020167011943 A KR1020167011943 A KR 1020167011943A KR 20167011943 A KR20167011943 A KR 20167011943A KR 20160067940 A KR20160067940 A KR 20160067940A
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South Korea
Prior art keywords
ferrite
layer
gold
wafer
etching
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Ceased
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KR1020167011943A
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English (en)
Korean (ko)
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존 브린 밀스
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코닌클리케 필립스 엔.브이.
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Publication of KR20160067940A publication Critical patent/KR20160067940A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P1/00—Auxiliary devices
    • H01P1/18—Phase-shifters
    • H01P1/19—Phase-shifters using a ferromagnetic device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P11/00—Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P3/00—Waveguides; Transmission lines of the waveguide type
    • H01P3/12—Hollow waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/041—Printed circuit coils
    • H01F41/046—Printed circuit coils structurally combined with ferromagnetic material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6938—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
    • H10P14/69398—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides the material having a perovskite structure, e.g. BaTiO3

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
  • Coils Or Transformers For Communication (AREA)
  • Chemically Coating (AREA)
  • Coating By Spraying Or Casting (AREA)
KR1020167011943A 2013-10-07 2014-10-01 페라이트 막대들을 제조하기 위한 정밀 배치 생성 방법 Ceased KR20160067940A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP13187538 2013-10-07
EP13187538.7 2013-10-07
PCT/EP2014/071079 WO2015052059A1 (en) 2013-10-07 2014-10-01 Precision batch production method for manufacturing ferrite rods

Publications (1)

Publication Number Publication Date
KR20160067940A true KR20160067940A (ko) 2016-06-14

Family

ID=49303841

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167011943A Ceased KR20160067940A (ko) 2013-10-07 2014-10-01 페라이트 막대들을 제조하기 위한 정밀 배치 생성 방법

Country Status (7)

Country Link
US (1) US9825347B2 (https=)
EP (1) EP3055871A1 (https=)
JP (1) JP6293875B2 (https=)
KR (1) KR20160067940A (https=)
CN (1) CN105814655B (https=)
SG (1) SG11201602499TA (https=)
WO (1) WO2015052059A1 (https=)

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US12165809B2 (en) 2016-02-25 2024-12-10 3D Glass Solutions, Inc. 3D capacitor and capacitor array fabricating photoactive substrates
WO2017177171A1 (en) 2016-04-08 2017-10-12 3D Glass Solutions, Inc. Methods of fabricating photosensitive substrates suitable for optical coupler
WO2017184352A1 (en) * 2016-04-18 2017-10-26 Eagantu Ltd. A wide band radio frequency circulator
US11101532B2 (en) 2017-04-28 2021-08-24 3D Glass Solutions, Inc. RF circulator
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US10854946B2 (en) 2017-12-15 2020-12-01 3D Glass Solutions, Inc. Coupled transmission line resonate RF filter
AU2018399638B2 (en) 2018-01-04 2021-09-02 3D Glass Solutions, Inc. Impedance matching conductive structure for high efficiency RF circuits
WO2019199470A1 (en) 2018-04-10 2019-10-17 3D Glass Solutions, Inc. Rf integrated power condition capacitor
US10903545B2 (en) 2018-05-29 2021-01-26 3D Glass Solutions, Inc. Method of making a mechanically stabilized radio frequency transmission line device
AU2019344542B2 (en) 2018-09-17 2022-02-24 3D Glass Solutions, Inc. High efficiency compact slotted antenna with a ground plane
EP3881391A4 (en) * 2018-11-14 2022-07-27 Optisys, LLC HOLLOW METAL WAVEGUIDES WITH IRREGULAR HEXAGONAL CROSS-SECTIONS AND METHOD OF MANUFACTURE THEREOF
US11996600B2 (en) 2018-11-14 2024-05-28 Optisys, Inc. Hollow metal waveguides having irregular hexagonal cross sections with specified interior angles
WO2020106774A1 (en) 2018-11-19 2020-05-28 Optisys, LLC Irregular hexagon cross-sectioned hollow metal waveguide filters
EP3903347A4 (en) 2018-12-28 2022-03-09 3D Glass Solutions, Inc. HETEROGENE INTEGRATION FOR HF, MICROWAVE AND MM WAVE SYSTEMS ON PHOTOACTIVE GLASS SUBSTRATES
AU2019416327B2 (en) 2018-12-28 2021-12-09 3D Glass Solutions, Inc. Annular capacitor RF, microwave and MM wave systems
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US10727216B1 (en) 2019-05-10 2020-07-28 Sandisk Technologies Llc Method for removing a bulk substrate from a bonded assembly of wafers
CN110202880B (zh) * 2019-06-03 2020-05-22 西安交通大学 一种柔性微波器件及其制备方法
JP2023516817A (ja) 2020-04-17 2023-04-20 スリーディー グラス ソリューションズ，インク 広帯域誘導
US11501905B2 (en) * 2020-08-31 2022-11-15 Boston Applied Technologies, Inc. Composition and method of making a monolithic heterostructure of multiferroic thin films
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US12183970B2 (en) 2020-10-29 2024-12-31 Optisys, Inc. Integrated balancing radiating elements
CN112103602B (zh) * 2020-11-05 2021-03-16 中国电子科技集团公司第九研究所 一种宽带高频法拉第隔离器
CN112909458B (zh) * 2021-02-08 2021-09-10 湖南国科雷电子科技有限公司 一种w波段e面波导滤波器
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CN116345099B (zh) * 2023-01-13 2026-01-06 西南应用磁学研究所(中国电子科技集团公司第九研究所) 一种硅基腔体环行器/隔离器及其加工方法
CN120824531B (zh) * 2025-06-27 2026-02-06 河北美泰电子科技有限公司 一种晶圆级异质集成的mems环行器及其制备方法

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Also Published As

Publication number Publication date
SG11201602499TA (en) 2016-04-28
CN105814655A (zh) 2016-07-27
US9825347B2 (en) 2017-11-21
US20160254579A1 (en) 2016-09-01
JP6293875B2 (ja) 2018-04-25
WO2015052059A1 (en) 2015-04-16
CN105814655B (zh) 2018-08-07
EP3055871A1 (en) 2016-08-17
JP2016535930A (ja) 2016-11-17

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