KR20160022760A - 취성재료 기판의 분단방법, 취성재료 기판 분단용의 기판 지지 부재, 및 취성재료 기판의 분단시에 사용하는 점착필름 부착용 프레임체 - Google Patents
취성재료 기판의 분단방법, 취성재료 기판 분단용의 기판 지지 부재, 및 취성재료 기판의 분단시에 사용하는 점착필름 부착용 프레임체 Download PDFInfo
- Publication number
- KR20160022760A KR20160022760A KR1020150079948A KR20150079948A KR20160022760A KR 20160022760 A KR20160022760 A KR 20160022760A KR 1020150079948 A KR1020150079948 A KR 1020150079948A KR 20150079948 A KR20150079948 A KR 20150079948A KR 20160022760 A KR20160022760 A KR 20160022760A
- Authority
- KR
- South Korea
- Prior art keywords
- brittle material
- material substrate
- substrate
- dividing
- adhesive film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 185
- 239000000463 material Substances 0.000 title claims abstract description 143
- 239000002313 adhesive film Substances 0.000 title claims abstract description 42
- 238000000034 method Methods 0.000 title claims abstract description 37
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 8
- 238000013001 point bending Methods 0.000 claims description 9
- 238000000926 separation method Methods 0.000 claims description 6
- 239000004065 semiconductor Substances 0.000 description 5
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000008521 reorganization Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
Landscapes
- Engineering & Computer Science (AREA)
- Dicing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014167298A JP2016043503A (ja) | 2014-08-20 | 2014-08-20 | 脆性材料基板の分断方法、脆性材料基板分断用の基板保持部材、および、脆性材料基板の分断時に使用する粘着フィルム張設用の枠体 |
JPJP-P-2014-167298 | 2014-08-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20160022760A true KR20160022760A (ko) | 2016-03-02 |
Family
ID=55416045
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020150079948A Withdrawn KR20160022760A (ko) | 2014-08-20 | 2015-06-05 | 취성재료 기판의 분단방법, 취성재료 기판 분단용의 기판 지지 부재, 및 취성재료 기판의 분단시에 사용하는 점착필름 부착용 프레임체 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2016043503A (enrdf_load_stackoverflow) |
KR (1) | KR20160022760A (enrdf_load_stackoverflow) |
CN (1) | CN105382945A (enrdf_load_stackoverflow) |
TW (1) | TWI644774B (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017130630A1 (ja) | 2016-01-29 | 2017-08-03 | 株式会社カネカ | 植物における高温ストレス耐性向上剤、高温ストレス耐性を向上させる方法、白化抑制剤、及びdreb2a遺伝子発現促進剤 |
DE102017201154B4 (de) * | 2017-01-25 | 2025-02-27 | Disco Corporation | Verfahren zum Bearbeiten eines Wafers und Waferbearbeitungssystem |
JP2020151929A (ja) | 2019-03-20 | 2020-09-24 | 三星ダイヤモンド工業株式会社 | 脆性材料基板のブレイク装置およびブレイク方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014083821A (ja) | 2012-10-26 | 2014-05-12 | Mitsuboshi Diamond Industrial Co Ltd | 脆性材料基板の分断方法並びに分断装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4989475A (enrdf_load_stackoverflow) * | 1972-12-27 | 1974-08-27 | ||
JP2000306864A (ja) * | 1999-04-22 | 2000-11-02 | Apic Yamada Corp | 短冊ワークダイシング用フィルム取付フレーム |
JP2004026539A (ja) * | 2002-06-24 | 2004-01-29 | Nakamura Tome Precision Ind Co Ltd | ガラス基板の割断加工方法及びその装置 |
JP2006173269A (ja) * | 2004-12-14 | 2006-06-29 | Hamamatsu Photonics Kk | 基板加工方法及びフィルム伸張装置 |
JP4589201B2 (ja) * | 2005-08-23 | 2010-12-01 | 株式会社ディスコ | 基板の切削装置 |
KR100748305B1 (ko) * | 2006-03-02 | 2007-08-09 | 삼성에스디아이 주식회사 | 절단된 기판의 이송방법 |
JP5121746B2 (ja) * | 2009-01-29 | 2013-01-16 | 昭和電工株式会社 | 基板切断方法および電子素子の製造方法 |
JP5182339B2 (ja) * | 2010-08-31 | 2013-04-17 | 三星ダイヤモンド工業株式会社 | 基板ブレーク装置 |
JP2013071335A (ja) * | 2011-09-28 | 2013-04-22 | Mitsuboshi Diamond Industrial Co Ltd | マザー基板の分断方法 |
-
2014
- 2014-08-20 JP JP2014167298A patent/JP2016043503A/ja active Pending
-
2015
- 2015-03-17 TW TW104108443A patent/TWI644774B/zh not_active IP Right Cessation
- 2015-06-05 KR KR1020150079948A patent/KR20160022760A/ko not_active Withdrawn
- 2015-07-15 CN CN201510417153.0A patent/CN105382945A/zh active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014083821A (ja) | 2012-10-26 | 2014-05-12 | Mitsuboshi Diamond Industrial Co Ltd | 脆性材料基板の分断方法並びに分断装置 |
Also Published As
Publication number | Publication date |
---|---|
CN105382945A (zh) | 2016-03-09 |
TW201607713A (zh) | 2016-03-01 |
JP2016043503A (ja) | 2016-04-04 |
TWI644774B (zh) | 2018-12-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20150605 |
|
PG1501 | Laying open of application | ||
PC1203 | Withdrawal of no request for examination |