KR20160020567A - 감광성 수지 엘리먼트 - Google Patents
감광성 수지 엘리먼트 Download PDFInfo
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- KR20160020567A KR20160020567A KR1020167001362A KR20167001362A KR20160020567A KR 20160020567 A KR20160020567 A KR 20160020567A KR 1020167001362 A KR1020167001362 A KR 1020167001362A KR 20167001362 A KR20167001362 A KR 20167001362A KR 20160020567 A KR20160020567 A KR 20160020567A
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- KR
- South Korea
- Prior art keywords
- photosensitive resin
- mass
- solvent
- group
- integer
- Prior art date
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- 125000005641 methacryl group Chemical group 0.000 description 1
- 229940086559 methyl benzoin Drugs 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- JFTBTTPUYRGXDG-UHFFFAOYSA-N methyl violet Chemical compound Cl.C1=CC(=NC)C=CC1=C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 JFTBTTPUYRGXDG-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- HVSJOYHTKPGCIG-UHFFFAOYSA-N n,n-dibutyl-2h-triazol-4-amine Chemical compound CCCCN(CCCC)C=1C=NNN=1 HVSJOYHTKPGCIG-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000056 polyoxyethylene ether Polymers 0.000 description 1
- 229940051841 polyoxyethylene ether Drugs 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- KOUKXHPPRFNWPP-UHFFFAOYSA-N pyrazine-2,5-dicarboxylic acid;hydrate Chemical compound O.OC(=O)C1=CN=C(C(O)=O)C=N1 KOUKXHPPRFNWPP-UHFFFAOYSA-N 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- XFKVYXCRNATCOO-UHFFFAOYSA-M rhodamine 6G Chemical compound [Cl-].C=12C=C(C)C(NCC)=CC2=[O+]C=2C=C(NCC)C(C)=CC=2C=1C1=CC=CC=C1C(=O)OCC XFKVYXCRNATCOO-UHFFFAOYSA-M 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229950006451 sorbitan laurate Drugs 0.000 description 1
- 235000011067 sorbitan monolaureate Nutrition 0.000 description 1
- 229950004959 sorbitan oleate Drugs 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- DWWMSEANWMWMCB-UHFFFAOYSA-N tribromomethylsulfonylbenzene Chemical compound BrC(Br)(Br)S(=O)(=O)C1=CC=CC=C1 DWWMSEANWMWMCB-UHFFFAOYSA-N 0.000 description 1
- WEAPVABOECTMGR-UHFFFAOYSA-N triethyl 2-acetyloxypropane-1,2,3-tricarboxylate Chemical compound CCOC(=O)CC(C(=O)OCC)(OC(C)=O)CC(=O)OCC WEAPVABOECTMGR-UHFFFAOYSA-N 0.000 description 1
- 239000001069 triethyl citrate Substances 0.000 description 1
- VMYFZRTXGLUXMZ-UHFFFAOYSA-N triethyl citrate Natural products CCOC(=O)C(O)(C(=O)OCC)C(=O)OCC VMYFZRTXGLUXMZ-UHFFFAOYSA-N 0.000 description 1
- 235000013769 triethyl citrate Nutrition 0.000 description 1
- ZLZAOJXNPKEAQD-UHFFFAOYSA-N tripropyl 2-hydroxy-4-oxopentane-1,2,3-tricarboxylate Chemical compound CCCOC(=O)CC(O)(C(=O)OCCC)C(C(C)=O)C(=O)OCCC ZLZAOJXNPKEAQD-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Laminated Bodies (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013248365 | 2013-11-29 | ||
| JPJP-P-2013-248365 | 2013-11-29 | ||
| PCT/JP2014/081599 WO2015080257A1 (ja) | 2013-11-29 | 2014-11-28 | 感光性樹脂エレメント |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020187010592A Division KR102139035B1 (ko) | 2013-11-29 | 2014-11-28 | 감광성 수지 엘리먼트 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20160020567A true KR20160020567A (ko) | 2016-02-23 |
Family
ID=53199192
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020187010592A KR102139035B1 (ko) | 2013-11-29 | 2014-11-28 | 감광성 수지 엘리먼트 |
| KR1020167001362A KR20160020567A (ko) | 2013-11-29 | 2014-11-28 | 감광성 수지 엘리먼트 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020187010592A KR102139035B1 (ko) | 2013-11-29 | 2014-11-28 | 감광성 수지 엘리먼트 |
Country Status (6)
| Country | Link |
|---|---|
| JP (2) | JPWO2015080257A1 (ja) |
| KR (2) | KR102139035B1 (ja) |
| CN (1) | CN105474094B (ja) |
| MY (1) | MY176799A (ja) |
| TW (5) | TWI630459B (ja) |
| WO (1) | WO2015080257A1 (ja) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102494967B1 (ko) * | 2017-02-01 | 2023-02-02 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치 |
| CN108490737B (zh) * | 2018-03-14 | 2021-11-02 | 杭州福斯特电子材料有限公司 | 一种感光性树脂组合物及其用途 |
| CN114787711A (zh) * | 2019-12-31 | 2022-07-22 | 可隆工业株式会社 | 光敏树脂组合物以及使用其的干膜光致抗蚀剂、光敏元件、电路板和显示装置 |
| CN114761874A (zh) * | 2019-12-31 | 2022-07-15 | 可隆工业株式会社 | 光敏树脂层和使用该光敏树脂层的干膜光致抗蚀剂、光敏元件 |
| CN114830033A (zh) * | 2019-12-31 | 2022-07-29 | 可隆工业株式会社 | 光敏树脂层和使用其的干膜光致抗蚀剂、光敏元件 |
| WO2021137468A1 (ko) * | 2019-12-31 | 2021-07-08 | 코오롱인더스트리 주식회사 | 감광성 수지층, 이를 이용한 드라이 필름 포토레지스트, 및 감광성 엘리먼트 |
| WO2021137546A1 (ko) * | 2019-12-31 | 2021-07-08 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 회로기판, 및 디스플레이 장치 |
| CN118355324A (zh) * | 2022-03-29 | 2024-07-16 | 株式会社力森诺科 | 感光性树脂组合物、感光性元件、固化物的制造方法、固化物图案的制造方法及线路板的制造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11143069A (ja) | 1997-11-10 | 1999-05-28 | Fuji Photo Film Co Ltd | プリント配線用原板 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG85613A1 (en) * | 1998-02-06 | 2002-01-15 | Morton Int Inc | Photoimageable compositions having hydrophilic binder polymers and hydrophilic monomers |
| JP2001312056A (ja) * | 2000-04-27 | 2001-11-09 | Nichigo Morton Co Ltd | 感光性樹脂組成物およびそれを用いてなる感光性フィルム |
| JP3824508B2 (ja) * | 2001-08-10 | 2006-09-20 | 旭化成エレクトロニクス株式会社 | ドライフィルムレジスト及びその製造方法 |
| JP2006106287A (ja) * | 2004-10-04 | 2006-04-20 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント及び感光性エレメントの製造方法 |
| JP4966528B2 (ja) * | 2005-09-14 | 2012-07-04 | 旭化成イーマテリアルズ株式会社 | パターン形成材料、並びにパターン形成装置及びパターン形成方法 |
| JP2007310201A (ja) * | 2006-05-19 | 2007-11-29 | Kaneka Corp | 感光性ドライフィルムレジスト及びこれを用いたプリント配線板 |
| JP2008239743A (ja) * | 2007-03-27 | 2008-10-09 | Toray Ind Inc | ドライフィルムレジスト支持体用ポリエステルフィルム |
| JP2011048270A (ja) * | 2009-08-28 | 2011-03-10 | Hitachi Chem Co Ltd | 感光性エレメント、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法 |
| KR20110041925A (ko) * | 2009-10-16 | 2011-04-22 | 삼성전자주식회사 | 이중층 패턴형성용 접착필름, 이의 제조방법, 및 이를 이용한 패턴 접착층의 형성방법 |
| JP2011257632A (ja) * | 2010-06-10 | 2011-12-22 | Hitachi Chem Co Ltd | 感光性エレメント及びそれを用いたレジストパターンの形成法、リードフレーム並びにプリント配線板の製造方法 |
| JP5688116B2 (ja) * | 2013-05-13 | 2015-03-25 | 太陽ホールディングス株式会社 | 光硬化性熱硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板 |
-
2014
- 2014-11-28 CN CN201480043077.5A patent/CN105474094B/zh active Active
- 2014-11-28 WO PCT/JP2014/081599 patent/WO2015080257A1/ja active Application Filing
- 2014-11-28 KR KR1020187010592A patent/KR102139035B1/ko active IP Right Grant
- 2014-11-28 TW TW105114210A patent/TWI630459B/zh active
- 2014-11-28 TW TW105114212A patent/TW201631392A/zh unknown
- 2014-11-28 TW TW105114222A patent/TWI633388B/zh active
- 2014-11-28 MY MYUI2016701738A patent/MY176799A/en unknown
- 2014-11-28 TW TW103141486A patent/TWI592753B/zh active
- 2014-11-28 KR KR1020167001362A patent/KR20160020567A/ko active Search and Examination
- 2014-11-28 JP JP2015551017A patent/JPWO2015080257A1/ja not_active Withdrawn
- 2014-11-28 TW TW105114221A patent/TW201631393A/zh unknown
-
2017
- 2017-09-27 JP JP2017187014A patent/JP6518304B2/ja active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11143069A (ja) | 1997-11-10 | 1999-05-28 | Fuji Photo Film Co Ltd | プリント配線用原板 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI630459B (zh) | 2018-07-21 |
| CN105474094B (zh) | 2020-09-22 |
| KR102139035B1 (ko) | 2020-07-29 |
| TW201525615A (zh) | 2015-07-01 |
| TW201631393A (zh) | 2016-09-01 |
| TW201631394A (zh) | 2016-09-01 |
| TWI592753B (zh) | 2017-07-21 |
| TWI633388B (zh) | 2018-08-21 |
| JP2018013799A (ja) | 2018-01-25 |
| TW201631391A (zh) | 2016-09-01 |
| WO2015080257A1 (ja) | 2015-06-04 |
| MY176799A (en) | 2020-08-21 |
| TW201631392A (zh) | 2016-09-01 |
| KR20180040739A (ko) | 2018-04-20 |
| JP6518304B2 (ja) | 2019-05-22 |
| JPWO2015080257A1 (ja) | 2017-03-16 |
| CN105474094A (zh) | 2016-04-06 |
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