KR20140129378A - 중합성 자외선 흡수제를 포함하는 미세구조화 광학 필름 - Google Patents
중합성 자외선 흡수제를 포함하는 미세구조화 광학 필름 Download PDFInfo
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- KR20140129378A KR20140129378A KR1020147028635A KR20147028635A KR20140129378A KR 20140129378 A KR20140129378 A KR 20140129378A KR 1020147028635 A KR1020147028635 A KR 1020147028635A KR 20147028635 A KR20147028635 A KR 20147028635A KR 20140129378 A KR20140129378 A KR 20140129378A
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- Prior art keywords
- acrylate
- meth
- polymerizable
- film
- monomer
- Prior art date
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- 239000012788 optical film Substances 0.000 title description 15
- 239000006097 ultraviolet radiation absorber Substances 0.000 title description 5
- 239000000203 mixture Substances 0.000 claims abstract description 44
- 239000002952 polymeric resin Substances 0.000 claims abstract description 19
- 229920003002 synthetic resin Polymers 0.000 claims abstract description 19
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 81
- 239000000178 monomer Substances 0.000 claims description 76
- 125000003118 aryl group Chemical group 0.000 claims description 24
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 16
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 claims description 15
- 229920005989 resin Polymers 0.000 claims description 11
- 239000011347 resin Substances 0.000 claims description 11
- 229910052717 sulfur Inorganic materials 0.000 claims description 8
- 125000001624 naphthyl group Chemical group 0.000 claims description 7
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 5
- 239000011593 sulfur Substances 0.000 claims description 5
- PQHAQYRBYAWNHV-UHFFFAOYSA-N 2-naphthalen-1-yloxyethyl prop-2-enoate Chemical group C1=CC=C2C(OCCOC(=O)C=C)=CC=CC2=C1 PQHAQYRBYAWNHV-UHFFFAOYSA-N 0.000 claims description 3
- 239000010954 inorganic particle Substances 0.000 claims description 3
- RHOOUTWPJJQGSK-UHFFFAOYSA-N 2-phenylsulfanylethyl prop-2-enoate Chemical compound C=CC(=O)OCCSC1=CC=CC=C1 RHOOUTWPJJQGSK-UHFFFAOYSA-N 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 abstract description 27
- 239000011342 resin composition Substances 0.000 abstract description 23
- 239000010408 film Substances 0.000 description 73
- 230000003287 optical effect Effects 0.000 description 35
- 239000002105 nanoparticle Substances 0.000 description 24
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 18
- 239000000463 material Substances 0.000 description 18
- -1 acrylate compound Chemical class 0.000 description 17
- 239000003085 diluting agent Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 239000002245 particle Substances 0.000 description 11
- 238000004383 yellowing Methods 0.000 description 11
- 235000010290 biphenyl Nutrition 0.000 description 9
- 239000004305 biphenyl Substances 0.000 description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 239000004593 Epoxy Substances 0.000 description 8
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 229930185605 Bisphenol Natural products 0.000 description 6
- 239000006096 absorbing agent Substances 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 229920000728 polyester Polymers 0.000 description 6
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 5
- ZCILGMFPJBRCNO-UHFFFAOYSA-N 4-phenyl-2H-benzotriazol-5-ol Chemical compound OC1=CC=C2NN=NC2=C1C1=CC=CC=C1 ZCILGMFPJBRCNO-UHFFFAOYSA-N 0.000 description 5
- 230000001588 bifunctional effect Effects 0.000 description 5
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- 125000001424 substituent group Chemical group 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
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- 239000003431 cross linking reagent Substances 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- 125000005647 linker group Chemical group 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 229920006254 polymer film Polymers 0.000 description 4
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 3
- VMRIVYANZGSGRV-UHFFFAOYSA-N 4-phenyl-2h-triazin-5-one Chemical compound OC1=CN=NN=C1C1=CC=CC=C1 VMRIVYANZGSGRV-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000006267 biphenyl group Chemical group 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
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- 239000011164 primary particle Substances 0.000 description 3
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 3
- 238000004064 recycling Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
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- 239000000758 substrate Substances 0.000 description 3
- 229940096522 trimethylolpropane triacrylate Drugs 0.000 description 3
- ZMZHRHTZJDBLEX-UHFFFAOYSA-N (2-phenylphenyl) prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1C1=CC=CC=C1 ZMZHRHTZJDBLEX-UHFFFAOYSA-N 0.000 description 2
- NMMXJQKTXREVGN-UHFFFAOYSA-N 2-(4-benzoyl-3-hydroxyphenoxy)ethyl prop-2-enoate Chemical compound OC1=CC(OCCOC(=O)C=C)=CC=C1C(=O)C1=CC=CC=C1 NMMXJQKTXREVGN-UHFFFAOYSA-N 0.000 description 2
- VCYCUECVHJJFIQ-UHFFFAOYSA-N 2-[3-(benzotriazol-2-yl)-4-hydroxyphenyl]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 VCYCUECVHJJFIQ-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- VWDNFYTXRIIYLI-UHFFFAOYSA-N 4-phenyl-1,2,3-benzotriazin-5-ol Chemical compound Oc1cccc2nnnc(-c3ccccc3)c12 VWDNFYTXRIIYLI-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000000113 differential scanning calorimetry Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 229910052809 inorganic oxide Inorganic materials 0.000 description 2
- 239000004611 light stabiliser Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
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- 239000004094 surface-active agent Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- FGGRLKWCMJMSKS-UHFFFAOYSA-N (2-phenoxy-2-phenylethyl) prop-2-enoate Chemical compound C=1C=CC=CC=1C(COC(=O)C=C)OC1=CC=CC=C1 FGGRLKWCMJMSKS-UHFFFAOYSA-N 0.000 description 1
- BIFKOXVCOFSXCC-UHFFFAOYSA-N 1,1'-biphenyl;methane Chemical group C.C1=CC=CC=C1C1=CC=CC=C1 BIFKOXVCOFSXCC-UHFFFAOYSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- JWYVGKFDLWWQJX-UHFFFAOYSA-N 1-ethenylazepan-2-one Chemical compound C=CN1CCCCCC1=O JWYVGKFDLWWQJX-UHFFFAOYSA-N 0.000 description 1
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-tetramethylpiperidine Chemical class CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 description 1
- ZCHGODLGROULLT-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;propane-1,2-diol Chemical compound CC(O)CO.OCC(CO)(CO)CO ZCHGODLGROULLT-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NMWRMGLOOJLWIT-UHFFFAOYSA-N 2-(2-phenylphenyl)prop-2-enoic acid Chemical compound OC(=O)C(=C)C1=CC=CC=C1C1=CC=CC=C1 NMWRMGLOOJLWIT-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- RSROEZYGRKHVMN-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;oxirane Chemical compound C1CO1.CCC(CO)(CO)CO RSROEZYGRKHVMN-UHFFFAOYSA-N 0.000 description 1
- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- RIWRBSMFKVOJMN-UHFFFAOYSA-N 2-methyl-1-phenylpropan-2-ol Chemical compound CC(C)(O)CC1=CC=CC=C1 RIWRBSMFKVOJMN-UHFFFAOYSA-N 0.000 description 1
- RYKGTWUEXPSRMP-UHFFFAOYSA-N 2-naphthalen-1-ylsulfanylethyl prop-2-enoate Chemical compound C1=CC=C2C(SCCOC(=O)C=C)=CC=CC2=C1 RYKGTWUEXPSRMP-UHFFFAOYSA-N 0.000 description 1
- TVQDRZGNLJFEQK-UHFFFAOYSA-N 2-naphthalen-2-ylsulfanylethyl prop-2-enoate Chemical compound C1=CC=CC2=CC(SCCOC(=O)C=C)=CC=C21 TVQDRZGNLJFEQK-UHFFFAOYSA-N 0.000 description 1
- MGSBHCXXTFPYAJ-UHFFFAOYSA-N 2-phenoxyethyl 2-methylidenebutaneperoxoate Chemical compound CCC(=C)C(=O)OOCCOC1=CC=CC=C1 MGSBHCXXTFPYAJ-UHFFFAOYSA-N 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
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- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
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- LFOXEOLGJPJZAA-UHFFFAOYSA-N [(2,6-dimethoxybenzoyl)-(2,4,4-trimethylpentyl)phosphoryl]-(2,6-dimethoxyphenyl)methanone Chemical compound COC1=CC=CC(OC)=C1C(=O)P(=O)(CC(C)CC(C)(C)C)C(=O)C1=C(OC)C=CC=C1OC LFOXEOLGJPJZAA-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
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- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
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- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- OVHHHVAVHBHXAK-UHFFFAOYSA-N n,n-diethylprop-2-enamide Chemical compound CCN(CC)C(=O)C=C OVHHHVAVHBHXAK-UHFFFAOYSA-N 0.000 description 1
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- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- FOKZHJCFBNVOAV-UHFFFAOYSA-N propyl 2-hydroxy-3-phenoxyprop-2-enoate Chemical compound CCCOC(=O)C(O)=COC1=CC=CC=C1 FOKZHJCFBNVOAV-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- G02B5/00—Optical elements other than lenses
- G02B5/04—Prisms
- G02B5/045—Prism arrays
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F289/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds not provided for in groups C08F251/00 - C08F287/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
- C08L51/003—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
- C08L51/08—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
- C09D151/003—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
- C09D151/08—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Optical Elements Other Than Lenses (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
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| US13969108P | 2008-12-22 | 2008-12-22 | |
| US61/139,691 | 2008-12-22 | ||
| PCT/US2009/068444 WO2010075161A1 (en) | 2008-12-22 | 2009-12-17 | Microstructured optical films comprising polymerizable ultraviolet absorber |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020117016924A Division KR101729342B1 (ko) | 2008-12-22 | 2009-12-17 | 중합성 자외선 흡수제를 포함하는 미세구조화 광학 필름 |
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| KR20140129378A true KR20140129378A (ko) | 2014-11-06 |
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| KR1020117016924A Expired - Fee Related KR101729342B1 (ko) | 2008-12-22 | 2009-12-17 | 중합성 자외선 흡수제를 포함하는 미세구조화 광학 필름 |
| KR1020177010221A Ceased KR20170044215A (ko) | 2008-12-22 | 2009-12-17 | 중합성 자외선 흡수제를 포함하는 미세구조화 광학 필름 |
Family Applications After (2)
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| KR1020117016924A Expired - Fee Related KR101729342B1 (ko) | 2008-12-22 | 2009-12-17 | 중합성 자외선 흡수제를 포함하는 미세구조화 광학 필름 |
| KR1020177010221A Ceased KR20170044215A (ko) | 2008-12-22 | 2009-12-17 | 중합성 자외선 흡수제를 포함하는 미세구조화 광학 필름 |
Country Status (6)
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| EP (1) | EP2373710B1 (https=) |
| JP (2) | JP5632388B2 (https=) |
| KR (3) | KR20140129378A (https=) |
| CN (2) | CN102307917B (https=) |
| WO (1) | WO2010075161A1 (https=) |
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| JP2012185477A (ja) * | 2011-02-15 | 2012-09-27 | Panasonic Corp | 複合光学素子用樹脂組成物、複合光学素子、ならびに複合光学素子を備えた撮像装置および光学式記録再生装置 |
| EP2707424B1 (en) | 2011-05-13 | 2020-10-28 | 3M Innovative Properties Company | Benzyl (meth)acrylate monomers suitable for microstructured optical films |
| CN102391395B (zh) * | 2011-06-17 | 2013-01-02 | 北京化工大学常州先进材料研究院 | 含二苯甲酮的大分子光引发剂及其制备方法 |
| KR20150129057A (ko) | 2012-09-20 | 2015-11-18 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 나노입자 및 알킬렌 옥사이드 반복 단위를 포함하는 단량체를 포함하는 미세구조화 필름 |
| CN104871035B (zh) | 2012-12-20 | 2018-01-30 | 3M创新有限公司 | 制备包括层层自组装层的多层光学膜的方法以及制品 |
| BR112015023291B1 (pt) | 2013-03-15 | 2022-01-04 | Swimc Llc | Método para preparar uma composição à base de água, e, composição à base de água |
| US10196537B2 (en) | 2013-03-15 | 2019-02-05 | The Sherwin-Williams Company | Dirt pick-up resistant composition |
| EP3004261A1 (en) | 2013-05-31 | 2016-04-13 | 3M Innovative Properties Company | Methods of layer by layer self-assembly of a polyelectrolyte comprising light absorbing or stabilizing compound and articles |
| JP6237986B2 (ja) * | 2013-07-11 | 2017-11-29 | 日産化学工業株式会社 | 固体撮像素子用高屈折率膜形成組成物 |
| JP6631092B2 (ja) * | 2015-08-24 | 2020-01-15 | 三菱ケミカル株式会社 | 透明光学部材用硬化性樹脂組成物、硬化物、透明光学部材、レンズ及びカメラモジュール |
| CN107829115B (zh) * | 2017-02-23 | 2020-05-22 | 常州华威新材料有限公司 | 一种背涂模具珍珠镍的电镀工艺与用途 |
| CN110117338B (zh) * | 2018-02-05 | 2022-03-29 | 荒川化学工业株式会社 | 聚合物、组合物、固化物和保护膜 |
| WO2019232051A1 (en) | 2018-05-29 | 2019-12-05 | Swimc Llc | Water-based compositions with long term gloss retention |
| EP3981822B1 (en) * | 2019-06-10 | 2025-12-31 | Mitsubishi Gas Chemical Company, Inc. | POLYCARBONATE RESIN |
| CN113150614A (zh) * | 2021-05-28 | 2021-07-23 | 南京玖泰新材料科技有限公司 | 一种可辐射固化喷墨流体、喷涂油墨及其用途 |
| CN119409865B (zh) * | 2024-12-05 | 2025-04-15 | 苏州易昇光学材料股份有限公司 | 一种大分子转光剂及其制备方法与光伏封装转光胶膜 |
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| US5175030A (en) | 1989-02-10 | 1992-12-29 | Minnesota Mining And Manufacturing Company | Microstructure-bearing composite plastic articles and method of making |
| US5183597A (en) | 1989-02-10 | 1993-02-02 | Minnesota Mining And Manufacturing Company | Method of molding microstructure bearing composite plastic articles |
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| US5882774A (en) | 1993-12-21 | 1999-03-16 | Minnesota Mining And Manufacturing Company | Optical film |
| US5828488A (en) | 1993-12-21 | 1998-10-27 | Minnesota Mining And Manufacturing Co. | Reflective polarizer display |
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| US5825543A (en) | 1996-02-29 | 1998-10-20 | Minnesota Mining And Manufacturing Company | Diffusely reflecting polarizing element including a first birefringent phase and a second phase |
| JPH09254345A (ja) * | 1996-03-26 | 1997-09-30 | Toray Ind Inc | 積層フイルム |
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| US6777070B1 (en) | 1998-10-14 | 2004-08-17 | Tomoegawa Paper Co., Ltd. | Antireflection material and polarizing film using the same |
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| TW200307733A (en) * | 2002-02-01 | 2003-12-16 | Natoco Co Ltd | Composition curable with actinic energy ray and use thereof |
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| US7074463B2 (en) | 2003-09-12 | 2006-07-11 | 3M Innovative Properties Company | Durable optical element |
| US7282272B2 (en) * | 2003-09-12 | 2007-10-16 | 3M Innovative Properties Company | Polymerizable compositions comprising nanoparticles |
| US7124651B2 (en) | 2004-08-09 | 2006-10-24 | 3M Innovative Properties Company | Method of accelerated testing of illuminated device components |
| US7312290B2 (en) * | 2004-09-24 | 2007-12-25 | General Electric Company | Curable formulations, cured compositions, and articles derived thereform |
| JP2006152115A (ja) | 2004-11-29 | 2006-06-15 | Omron Corp | 硬化型樹脂組成物、耐光性光学部品および光学機器 |
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| KR100544824B1 (ko) * | 2005-01-27 | 2006-01-24 | 주식회사 코오롱 | 프리즘층 형성용 조성물 및 이로부터 제조된 프리즘 필름 |
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| JP2008094987A (ja) | 2006-10-13 | 2008-04-24 | Nippon Kayaku Co Ltd | 光学材料用高屈折率樹脂組成物およびその硬化物 |
| TW200900723A (en) | 2007-02-27 | 2009-01-01 | 3M Innovative Properties Co | Brightness enhancing film comprising nanocomposite structure having improved crack resistance |
| WO2008112451A2 (en) | 2007-03-09 | 2008-09-18 | 3M Innovative Properties Company | Microstructured optical films comprising biphenyl difunctional monomers |
| US8586154B2 (en) * | 2007-03-09 | 2013-11-19 | 3M Innovative Properties Company | Triphenyl monomers suitable for microstructured optical films |
| US20100183845A1 (en) * | 2007-06-07 | 2010-07-22 | Kolon Industries, Inc | Eco-optical sheet |
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- 2009-12-17 JP JP2011542428A patent/JP5632388B2/ja not_active Expired - Fee Related
- 2009-12-17 KR KR1020147028635A patent/KR20140129378A/ko not_active Ceased
- 2009-12-17 CN CN201410608509.4A patent/CN104371068B/zh active Active
- 2009-12-17 KR KR1020117016924A patent/KR101729342B1/ko not_active Expired - Fee Related
- 2009-12-17 EP EP09796205.4A patent/EP2373710B1/en not_active Not-in-force
- 2009-12-17 KR KR1020177010221A patent/KR20170044215A/ko not_active Ceased
- 2009-12-17 WO PCT/US2009/068444 patent/WO2010075161A1/en not_active Ceased
-
2013
- 2013-06-06 US US13/911,336 patent/US9244193B2/en active Active
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2014
- 2014-10-09 JP JP2014208101A patent/JP6023144B2/ja not_active Expired - Fee Related
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2015
- 2015-12-14 US US14/968,217 patent/US20160097884A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| EP2373710A1 (en) | 2011-10-12 |
| JP2012513496A (ja) | 2012-06-14 |
| US20130266763A1 (en) | 2013-10-10 |
| CN102307917A (zh) | 2012-01-04 |
| KR101729342B1 (ko) | 2017-04-21 |
| CN104371068B (zh) | 2017-06-09 |
| US8530595B2 (en) | 2013-09-10 |
| US9244193B2 (en) | 2016-01-26 |
| US20160097884A1 (en) | 2016-04-07 |
| KR20110114588A (ko) | 2011-10-19 |
| EP2373710B1 (en) | 2016-04-13 |
| US20110244182A1 (en) | 2011-10-06 |
| JP5632388B2 (ja) | 2014-11-26 |
| KR20170044215A (ko) | 2017-04-24 |
| WO2010075161A1 (en) | 2010-07-01 |
| JP2015038220A (ja) | 2015-02-26 |
| CN102307917B (zh) | 2019-07-12 |
| CN104371068A (zh) | 2015-02-25 |
| JP6023144B2 (ja) | 2016-11-09 |
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