KR20130092387A - 플라즈마 프로세싱 장치와, 전기적 스큐들을 조정하기 위한 라이너 어셈블리 - Google Patents

플라즈마 프로세싱 장치와, 전기적 스큐들을 조정하기 위한 라이너 어셈블리 Download PDF

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Publication number
KR20130092387A
KR20130092387A KR1020127027857A KR20127027857A KR20130092387A KR 20130092387 A KR20130092387 A KR 20130092387A KR 1020127027857 A KR1020127027857 A KR 1020127027857A KR 20127027857 A KR20127027857 A KR 20127027857A KR 20130092387 A KR20130092387 A KR 20130092387A
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KR
South Korea
Prior art keywords
slots
liner assembly
chamber
plasma
liner
Prior art date
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Ceased
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KR1020127027857A
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English (en)
Korean (ko)
Inventor
제임스 디. 카르두치
지강 첸
샤히드 라우프
케네스 에스. 콜린스
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
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Publication of KR20130092387A publication Critical patent/KR20130092387A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H01J37/32495—Means for protecting the vessel against plasma
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0421—Apparatus for fluid treatment for etching for drying etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
KR1020127027857A 2010-07-21 2011-07-06 플라즈마 프로세싱 장치와, 전기적 스큐들을 조정하기 위한 라이너 어셈블리 Ceased KR20130092387A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US36646210P 2010-07-21 2010-07-21
US61/366,462 2010-07-21
PCT/US2011/043083 WO2012012200A1 (en) 2010-07-21 2011-07-06 Plasma processing apparatus and liner assembly for tuning electrical skews

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020187007230A Division KR101970615B1 (ko) 2010-07-21 2011-07-06 플라즈마 프로세싱 장치와, 전기적 스큐들을 조정하기 위한 라이너 어셈블리

Publications (1)

Publication Number Publication Date
KR20130092387A true KR20130092387A (ko) 2013-08-20

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KR1020127027857A Ceased KR20130092387A (ko) 2010-07-21 2011-07-06 플라즈마 프로세싱 장치와, 전기적 스큐들을 조정하기 위한 라이너 어셈블리
KR1020187007230A Expired - Fee Related KR101970615B1 (ko) 2010-07-21 2011-07-06 플라즈마 프로세싱 장치와, 전기적 스큐들을 조정하기 위한 라이너 어셈블리

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Country Status (6)

Country Link
US (2) US20120018402A1 (https=)
JP (1) JP6025722B2 (https=)
KR (2) KR20130092387A (https=)
CN (2) CN102860138A (https=)
TW (1) TWI502617B (https=)
WO (1) WO2012012200A1 (https=)

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Also Published As

Publication number Publication date
JP2013539159A (ja) 2013-10-17
CN108538695A (zh) 2018-09-14
US20150279633A1 (en) 2015-10-01
JP6025722B2 (ja) 2016-11-16
CN102860138A (zh) 2013-01-02
US20120018402A1 (en) 2012-01-26
CN108538695B (zh) 2021-01-29
TWI502617B (zh) 2015-10-01
TW201205639A (en) 2012-02-01
WO2012012200A1 (en) 2012-01-26
KR20180030729A (ko) 2018-03-23
KR101970615B1 (ko) 2019-04-19
US10242847B2 (en) 2019-03-26

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