KR20120086737A - 방사선 경화성 수지 조성물 및 이를 이용한 급속 성형법 - Google Patents

방사선 경화성 수지 조성물 및 이를 이용한 급속 성형법 Download PDF

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Publication number
KR20120086737A
KR20120086737A KR1020127016516A KR20127016516A KR20120086737A KR 20120086737 A KR20120086737 A KR 20120086737A KR 1020127016516 A KR1020127016516 A KR 1020127016516A KR 20127016516 A KR20127016516 A KR 20127016516A KR 20120086737 A KR20120086737 A KR 20120086737A
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KR
South Korea
Prior art keywords
composition
weight
total weight
group
radiation curable
Prior art date
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Ceased
Application number
KR1020127016516A
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English (en)
Korean (ko)
Inventor
젠스 크리스토프 티에스
에일린 조지 엔겔로 아타나시오스 디아스
존 앨런 로톤
데이비드 엘. 윈밀
지젱 쉬
자오롱 유
Original Assignee
디에스엠 아이피 어셋츠 비.브이.
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Publication of KR20120086737A publication Critical patent/KR20120086737A/ko
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/06—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polyethers, polyoxymethylenes or polyacetals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/16—Cyclic ethers having four or more ring atoms
    • C08G65/18—Oxetanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Epoxy Resins (AREA)
  • Polyethers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Graft Or Block Polymers (AREA)
KR1020127016516A 2002-05-03 2003-05-01 방사선 경화성 수지 조성물 및 이를 이용한 급속 성형법 Ceased KR20120086737A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US37723902P 2002-05-03 2002-05-03
US60/377,239 2002-05-03
PCT/NL2003/000320 WO2003093901A1 (en) 2002-05-03 2003-05-01 Radiation curable resin composition and rapid prototyping process using the same

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020117006984A Division KR101176747B1 (ko) 2002-05-03 2003-05-01 방사선 경화성 수지 조성물 및 이를 이용한 급속 성형법

Publications (1)

Publication Number Publication Date
KR20120086737A true KR20120086737A (ko) 2012-08-03

Family

ID=29401462

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020127016516A Ceased KR20120086737A (ko) 2002-05-03 2003-05-01 방사선 경화성 수지 조성물 및 이를 이용한 급속 성형법
KR10-2004-7017652A Ceased KR20050007372A (ko) 2002-05-03 2003-05-01 방사선 경화성 수지 조성물 및 이를 이용한 쾌속 성형법
KR1020117006984A Expired - Lifetime KR101176747B1 (ko) 2002-05-03 2003-05-01 방사선 경화성 수지 조성물 및 이를 이용한 급속 성형법

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR10-2004-7017652A Ceased KR20050007372A (ko) 2002-05-03 2003-05-01 방사선 경화성 수지 조성물 및 이를 이용한 쾌속 성형법
KR1020117006984A Expired - Lifetime KR101176747B1 (ko) 2002-05-03 2003-05-01 방사선 경화성 수지 조성물 및 이를 이용한 급속 성형법

Country Status (8)

Country Link
US (3) US7183040B2 (https=)
EP (2) EP2466378B1 (https=)
JP (2) JP2005529200A (https=)
KR (3) KR20120086737A (https=)
CN (2) CN100576069C (https=)
AU (1) AU2003224516A1 (https=)
ES (1) ES2405107T3 (https=)
WO (1) WO2003093901A1 (https=)

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CN100576069C (zh) 2009-12-30
US20040142274A1 (en) 2004-07-22
HK1080554A1 (zh) 2006-04-28
CN101706639A (zh) 2010-05-12
EP2466378A3 (en) 2012-09-05
EP1502155A1 (en) 2005-02-02
JP2005529200A (ja) 2005-09-29
US20080064780A1 (en) 2008-03-13
EP1502155B1 (en) 2013-01-30
ES2405107T3 (es) 2013-05-30
KR101176747B1 (ko) 2012-08-23
US20070154840A1 (en) 2007-07-05
JP2010189641A (ja) 2010-09-02
KR20110051258A (ko) 2011-05-17
EP2466378B1 (en) 2014-01-08
WO2003093901A1 (en) 2003-11-13
AU2003224516A1 (en) 2003-11-17
JP5656419B2 (ja) 2015-01-21
KR20050007372A (ko) 2005-01-17
EP2466378A2 (en) 2012-06-20
CN1650231A (zh) 2005-08-03

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