KR20110114613A - 유체제어방법 및 유체제어장치 - Google Patents

유체제어방법 및 유체제어장치 Download PDF

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Publication number
KR20110114613A
KR20110114613A KR1020117018132A KR20117018132A KR20110114613A KR 20110114613 A KR20110114613 A KR 20110114613A KR 1020117018132 A KR1020117018132 A KR 1020117018132A KR 20117018132 A KR20117018132 A KR 20117018132A KR 20110114613 A KR20110114613 A KR 20110114613A
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KR
South Korea
Prior art keywords
fluid
acid
mixing
concentration
flow path
Prior art date
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Ceased
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KR1020117018132A
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English (en)
Korean (ko)
Inventor
히로시 요코타
Original Assignee
구라시키 보세키 가부시키가이샤
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Publication of KR20110114613A publication Critical patent/KR20110114613A/ko
Ceased legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40Static mixers
    • B01F25/42Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
    • B01F25/43Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
    • B01F25/432Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction with means for dividing the material flow into separate sub-flows and for repositioning and recombining these sub-flows; Cross-mixing, e.g. conducting the outer layer of the material nearer to the axis of the tube or vice-versa
    • B01F25/4323Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction with means for dividing the material flow into separate sub-flows and for repositioning and recombining these sub-flows; Cross-mixing, e.g. conducting the outer layer of the material nearer to the axis of the tube or vice-versa using elements provided with a plurality of channels or using a plurality of tubes which can either be placed between common spaces or collectors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/85Investigating moving fluids or granular solids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80Forming a predetermined ratio of the substances to be mixed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40Mixing liquids with liquids; Emulsifying
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F33/00Other mixers; Mixing plants; Combinations of mixers
    • B01F33/30Micromixers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80Forming a predetermined ratio of the substances to be mixed
    • B01F35/83Forming a predetermined ratio of the substances to be mixed by controlling the ratio of two or more flows, e.g. using flow sensing or flow controlling devices
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F15FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
    • F15DFLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
    • F15D1/00Influencing flow of fluids
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00Etching of wafers, substrates or parts of devices
    • H10P50/60Wet etching
    • H10P50/64Wet etching of semiconductor materials
    • H10P50/642Chemical etching
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/0318Processes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/8593Systems

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Dispersion Chemistry (AREA)
  • Fluid Mechanics (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Weting (AREA)
  • Accessories For Mixers (AREA)
KR1020117018132A 2009-02-12 2010-02-10 유체제어방법 및 유체제어장치 Ceased KR20110114613A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009030366A JP5340760B2 (ja) 2009-02-12 2009-02-12 流体制御方法及び流体制御装置
JPJP-P-2009-030366 2009-02-12

Publications (1)

Publication Number Publication Date
KR20110114613A true KR20110114613A (ko) 2011-10-19

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KR1020117018132A Ceased KR20110114613A (ko) 2009-02-12 2010-02-10 유체제어방법 및 유체제어장치

Country Status (6)

Country Link
US (1) US20110315228A1 (https=)
JP (1) JP5340760B2 (https=)
KR (1) KR20110114613A (https=)
CN (1) CN102316967A (https=)
TW (1) TWI494729B (https=)
WO (1) WO2010092985A1 (https=)

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CN104094383A (zh) * 2011-08-22 2014-10-08 1366科技公司 用于硅晶片的湿法酸化学蚀刻的制剂
JP5752530B2 (ja) * 2011-08-31 2015-07-22 倉敷紡績株式会社 基板処理装置
CN102814143A (zh) * 2012-09-13 2012-12-12 中国海洋石油总公司 即时混配装置
JP5642137B2 (ja) * 2012-10-25 2014-12-17 日機装株式会社 溶液の調製装置および溶液の調製方法
TWI641936B (zh) * 2012-11-13 2018-11-21 美商慧盛材料美國責任有限公司 漿料供應及/或化學品摻合物供應設備、方法、使用方法及製造方法
US9770804B2 (en) 2013-03-18 2017-09-26 Versum Materials Us, Llc Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture
CN105301174B (zh) * 2014-07-16 2017-07-18 中国科学院苏州纳米技术与纳米仿生研究所 用于微流控芯片的试剂滴定方法及装置、微流控芯片
RU2017115832A (ru) * 2014-11-07 2018-12-07 Окси Солюшнз Ас Устройство для растворения газа в жидкости
CN108495809B (zh) * 2016-01-28 2023-04-25 明测生物医疗有限公司 使用微流体装置的多段式靶细胞富集
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CN106841088A (zh) * 2017-01-17 2017-06-13 西安景辉信息科技有限公司 一种油料水分测定仪用传感器及其实施方法
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JP7110558B2 (ja) * 2017-09-01 2022-08-02 日産自動車株式会社 混合燃料供給装置及び混合燃料供給方法
JP6899760B2 (ja) * 2017-12-18 2021-07-07 三菱重工機械システム株式会社 液体混合装置
JP2019158794A (ja) * 2018-03-16 2019-09-19 シスメックス株式会社 検体処理方法、検体処理チップおよび検体処理装置
CN108869410A (zh) * 2018-06-11 2018-11-23 中国科学院工程热物理研究所 一种叶片以及用于叶片的流体控制方法
JP2020055214A (ja) * 2018-10-02 2020-04-09 東芝テック株式会社 液体吐出ヘッド及びプリンタ
CN111640661B (zh) * 2019-03-01 2024-01-30 东京毅力科创株式会社 基板处理方法、基板处理装置以及存储介质
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Also Published As

Publication number Publication date
JP5340760B2 (ja) 2013-11-13
TWI494729B (zh) 2015-08-01
WO2010092985A1 (ja) 2010-08-19
CN102316967A (zh) 2012-01-11
JP2010184203A (ja) 2010-08-26
US20110315228A1 (en) 2011-12-29
TW201044130A (en) 2010-12-16

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