CN102316967A - 流体控制方法及流体控制装置 - Google Patents

流体控制方法及流体控制装置 Download PDF

Info

Publication number
CN102316967A
CN102316967A CN2010800072264A CN201080007226A CN102316967A CN 102316967 A CN102316967 A CN 102316967A CN 2010800072264 A CN2010800072264 A CN 2010800072264A CN 201080007226 A CN201080007226 A CN 201080007226A CN 102316967 A CN102316967 A CN 102316967A
Authority
CN
China
Prior art keywords
fluid
acid
fluid control
concentration
mixed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2010800072264A
Other languages
English (en)
Chinese (zh)
Inventor
横田博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kurashiki Spinning Co Ltd
Original Assignee
Kurashiki Spinning Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kurashiki Spinning Co Ltd filed Critical Kurashiki Spinning Co Ltd
Publication of CN102316967A publication Critical patent/CN102316967A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/85—Investigating moving fluids or granular solids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40—Static mixers
    • B01F25/42—Static mixers in which the mixing is affected by moving the components jointly in changing directions, e.g. in tubes provided with baffles or obstructions
    • B01F25/43—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction
    • B01F25/432—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction with means for dividing the material flow into separate sub-flows and for repositioning and recombining these sub-flows; Cross-mixing, e.g. conducting the outer layer of the material nearer to the axis of the tube or vice-versa
    • B01F25/4323—Mixing tubes, e.g. wherein the material is moved in a radial or partly reversed direction with means for dividing the material flow into separate sub-flows and for repositioning and recombining these sub-flows; Cross-mixing, e.g. conducting the outer layer of the material nearer to the axis of the tube or vice-versa using elements provided with a plurality of channels or using a plurality of tubes which can either be placed between common spaces or collectors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F33/00—Other mixers; Mixing plants; Combinations of mixers
    • B01F33/30—Micromixers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • B01F35/83—Forming a predetermined ratio of the substances to be mixed by controlling the ratio of two or more flows, e.g. using flow sensing or flow controlling devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
    • F15D—FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
    • F15D1/00—Influencing flow of fluids
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/60—Wet etching
    • H10P50/64—Wet etching of semiconductor materials
    • H10P50/642—Chemical etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Dispersion Chemistry (AREA)
  • Fluid Mechanics (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Weting (AREA)
  • Accessories For Mixers (AREA)
CN2010800072264A 2009-02-12 2010-02-10 流体控制方法及流体控制装置 Pending CN102316967A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009030366A JP5340760B2 (ja) 2009-02-12 2009-02-12 流体制御方法及び流体制御装置
JP2009-030366 2009-02-12
PCT/JP2010/051973 WO2010092985A1 (ja) 2009-02-12 2010-02-10 流体制御方法及び流体制御装置

Publications (1)

Publication Number Publication Date
CN102316967A true CN102316967A (zh) 2012-01-11

Family

ID=42561826

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010800072264A Pending CN102316967A (zh) 2009-02-12 2010-02-10 流体控制方法及流体控制装置

Country Status (6)

Country Link
US (1) US20110315228A1 (https=)
JP (1) JP5340760B2 (https=)
KR (1) KR20110114613A (https=)
CN (1) CN102316967A (https=)
TW (1) TWI494729B (https=)
WO (1) WO2010092985A1 (https=)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102814143A (zh) * 2012-09-13 2012-12-12 中国海洋石油总公司 即时混配装置
CN102901713A (zh) * 2011-07-28 2013-01-30 株式会社东进世美肯 铜膜蚀刻工序控制方法及铜膜蚀刻液组合物的再生方法
CN105301174A (zh) * 2014-07-16 2016-02-03 中国科学院苏州纳米技术与纳米仿生研究所 用于微流控芯片的试剂滴定方法及装置、微流控芯片
CN106249773A (zh) * 2016-08-31 2016-12-21 张源兴 混合酸中单项酸检测控制装置
CN106841088A (zh) * 2017-01-17 2017-06-13 西安景辉信息科技有限公司 一种油料水分测定仪用传感器及其实施方法
CN108869410A (zh) * 2018-06-11 2018-11-23 中国科学院工程热物理研究所 一种叶片以及用于叶片的流体控制方法

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5180263B2 (ja) * 2010-07-23 2013-04-10 倉敷紡績株式会社 基板処理装置
JP5741056B2 (ja) * 2011-02-25 2015-07-01 栗田工業株式会社 ガス溶解水の製造装置
CN104094383A (zh) * 2011-08-22 2014-10-08 1366科技公司 用于硅晶片的湿法酸化学蚀刻的制剂
JP5752530B2 (ja) * 2011-08-31 2015-07-22 倉敷紡績株式会社 基板処理装置
JP5642137B2 (ja) * 2012-10-25 2014-12-17 日機装株式会社 溶液の調製装置および溶液の調製方法
TWI641936B (zh) * 2012-11-13 2018-11-21 美商慧盛材料美國責任有限公司 漿料供應及／或化學品摻合物供應設備、方法、使用方法及製造方法
US9770804B2 (en) 2013-03-18 2017-09-26 Versum Materials Us, Llc Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture
RU2017115832A (ru) * 2014-11-07 2018-12-07 Окси Солюшнз Ас Устройство для растворения газа в жидкости
CN108495809B (zh) * 2016-01-28 2023-04-25 明测生物医疗有限公司 使用微流体装置的多段式靶细胞富集
AU2018215821B2 (en) 2017-02-06 2023-02-02 Efa - Engineering For All Ltd. Portable digital diagnostic device
JP6909620B2 (ja) * 2017-04-20 2021-07-28 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法
JP7110558B2 (ja) * 2017-09-01 2022-08-02 日産自動車株式会社 混合燃料供給装置及び混合燃料供給方法
JP6899760B2 (ja) * 2017-12-18 2021-07-07 三菱重工機械システム株式会社 液体混合装置
JP2019158794A (ja) * 2018-03-16 2019-09-19 シスメックス株式会社 検体処理方法、検体処理チップおよび検体処理装置
JP2020055214A (ja) * 2018-10-02 2020-04-09 東芝テック株式会社 液体吐出ヘッド及びプリンタ
CN111640661B (zh) * 2019-03-01 2024-01-30 东京毅力科创株式会社 基板处理方法、基板处理装置以及存储介质
WO2021236009A1 (en) 2020-05-18 2021-11-25 National University Of Singapore Microfluidic device and liquid control system therefor
CN112763450A (zh) * 2020-12-14 2021-05-07 中国原子能科学研究院 一种同时测定水溶液中硝酸铝和硝酸浓度的方法
TWI880391B (zh) * 2023-10-11 2025-04-11 弘塑科技股份有限公司 流體流量校正系統及校正方法
CN118253246B (zh) * 2024-02-29 2025-03-14 安瑞科(廊坊)能源装备集成有限公司 甲醇溶液的自动配制装置、方法和电子设备
WO2025239355A1 (ja) * 2024-05-15 2025-11-20 慶應義塾 マイクロ流体デバイスにおける流体の粘度を制御するためのシステム及びマイクロ流体デバイスにおける流体の粘度を制御する方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000254569A (ja) * 1999-03-10 2000-09-19 Melt Giken Kk ホットメルト剤用可変ｔダイ
JP2005214863A (ja) * 2004-01-30 2005-08-11 Kurabo Ind Ltd 紫外光による水および水溶液測定方法
CN1712567A (zh) * 2004-06-25 2005-12-28 长濑产业株式会社 酸性蚀刻液再生方法和酸性蚀刻液再生装置

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8712135D0 (en) * 1987-05-22 1988-01-27 Plessey Co Plc Fibre-optic vapour/liquid ratio sensor
US5268147A (en) * 1992-02-26 1993-12-07 Miles, Inc. Reversible direction capsule chemistry sample liquid analysis system and method
US20020068357A1 (en) * 1995-09-28 2002-06-06 Mathies Richard A. Miniaturized integrated nucleic acid processing and analysis device and method
JP4110304B2 (ja) * 1998-06-30 2008-07-02 株式会社フジキン 流体制御装置および流体制御装置組立て方法
JP3921565B2 (ja) * 1998-07-10 2007-05-30 株式会社フジキン 流体制御装置
DE19959249A1 (de) * 1999-12-08 2001-07-19 Inst Mikrotechnik Mainz Gmbh Modulares Mikroreaktionssystem
US7037416B2 (en) * 2000-01-14 2006-05-02 Caliper Life Sciences, Inc. Method for monitoring flow rate using fluorescent markers
US8329118B2 (en) * 2004-09-02 2012-12-11 Honeywell International Inc. Method and apparatus for determining one or more operating parameters for a microfluidic circuit
JP4258489B2 (ja) * 2000-07-31 2009-04-30 日本化成株式会社 エッチング液の製造方法およびエッチング方法
TW511180B (en) * 2000-07-31 2002-11-21 Mitsubishi Chem Corp Mixed acid solution in etching process, process for producing the same, etching process using the same and process for producing semiconductor device
JP2002236131A (ja) * 2000-12-08 2002-08-23 Minolta Co Ltd マイクロチップ
US7010391B2 (en) * 2001-03-28 2006-03-07 Handylab, Inc. Methods and systems for control of microfluidic devices
US20040109793A1 (en) * 2002-02-07 2004-06-10 Mcneely Michael R Three-dimensional microfluidics incorporating passive fluid control structures
US6892745B2 (en) * 2002-04-10 2005-05-17 Honeywell International Inc. Flow control valve with integral sensor and controller and related method
DE60312186T2 (de) * 2002-09-06 2007-11-08 Epigem Ltd. Modulares mikrofluidsystem
JP2004113987A (ja) * 2002-09-27 2004-04-15 Shibaura Mechatronics Corp 液体の混合装置、混合方法及び基板の処理装置
JP3964850B2 (ja) * 2003-10-14 2007-08-22 株式会社ルネサステクノロジ 半導体装置
JP2006023200A (ja) * 2004-07-08 2006-01-26 Kurabo Ind Ltd 光学プローブ及びそれを用いた分光測定装置
JP2006029485A (ja) * 2004-07-20 2006-02-02 Pentax Corp マイクロバルブ及び該バルブを有するマイクロ流体デバイス
JP4677805B2 (ja) * 2005-03-22 2011-04-27 株式会社フジキン 流体制御装置
EP1922364A4 (en) * 2005-08-09 2010-04-21 Univ North Carolina METHOD AND MATERIALS FOR PRODUCING MICROFLUIDIC DEVICES
US20090145485A1 (en) * 2005-08-11 2009-06-11 Eksigent Technologies, Llc Microfluidic methods and apparatuses for fluid mixing and valving
JP2007133829A (ja) * 2005-11-14 2007-05-31 Hamlet Motoyama Japan:Kk 流体制御装置と圧力調節弁と制御方法
JP2008147637A (ja) * 2006-11-16 2008-06-26 Kurita Water Ind Ltd エッチング方法およびエッチング装置
WO2008144577A1 (en) * 2007-05-18 2008-11-27 Optiscan Biomedical Corporation Fluid mixing systems and methods
WO2009131677A1 (en) * 2008-04-25 2009-10-29 Claros Diagnostics, Inc. Flow control in microfluidic systems
WO2010015279A1 (en) * 2008-08-07 2010-02-11 Agilent Technologies, Inc. Synchronization of supply flow paths

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000254569A (ja) * 1999-03-10 2000-09-19 Melt Giken Kk ホットメルト剤用可変ｔダイ
JP2005214863A (ja) * 2004-01-30 2005-08-11 Kurabo Ind Ltd 紫外光による水および水溶液測定方法
CN1712567A (zh) * 2004-06-25 2005-12-28 长濑产业株式会社 酸性蚀刻液再生方法和酸性蚀刻液再生装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102901713A (zh) * 2011-07-28 2013-01-30 株式会社东进世美肯 铜膜蚀刻工序控制方法及铜膜蚀刻液组合物的再生方法
CN102814143A (zh) * 2012-09-13 2012-12-12 中国海洋石油总公司 即时混配装置
CN105301174A (zh) * 2014-07-16 2016-02-03 中国科学院苏州纳米技术与纳米仿生研究所 用于微流控芯片的试剂滴定方法及装置、微流控芯片
CN105301174B (zh) * 2014-07-16 2017-07-18 中国科学院苏州纳米技术与纳米仿生研究所 用于微流控芯片的试剂滴定方法及装置、微流控芯片
CN106249773A (zh) * 2016-08-31 2016-12-21 张源兴 混合酸中单项酸检测控制装置
CN106841088A (zh) * 2017-01-17 2017-06-13 西安景辉信息科技有限公司 一种油料水分测定仪用传感器及其实施方法
CN108869410A (zh) * 2018-06-11 2018-11-23 中国科学院工程热物理研究所 一种叶片以及用于叶片的流体控制方法

Also Published As

Publication number Publication date
JP5340760B2 (ja) 2013-11-13
TWI494729B (zh) 2015-08-01
WO2010092985A1 (ja) 2010-08-19
JP2010184203A (ja) 2010-08-26
US20110315228A1 (en) 2011-12-29
KR20110114613A (ko) 2011-10-19
TW201044130A (en) 2010-12-16

Similar Documents

Publication Publication Date Title
CN102316967A (zh) 流体控制方法及流体控制装置
CN102969257B (zh) 基板处理装置
CN104062247B (zh) 一种高精度原位检测海水pH的测量装置及测量方法
CN102038538B (zh) 一种多用途大功率半导体激光治疗仪
US10056248B2 (en) Method for measuring overall concentration of oxidizing substances, substrate cleaning method, and substrate cleaning system
CN103155113A (zh) 基板处理装置
EP2589951B1 (en) Calibration method
CN113604344A (zh) 一种高通量一体式微液滴数字pcr的实现系统
US20220199432A1 (en) Apparatus and method for supplying processing liquid
CN105032679B (zh) 一种超声雾化源
CN116057167A (zh) 用于生物反应器中的流体部署的喷嘴
JP2007038058A (ja) 液体処理装置および液体供給方法
CN104198461A (zh) 基于拉曼效应的工业过程气体分析仪
CN203807475U (zh) 一种基于微流控芯片的细菌快速检测装置
CN101135643A (zh) 微型化原子荧光检测装置
CN205008172U (zh) 超声雾化源
JP4472234B2 (ja) 基板処理装置および不活性ガス濃度制御方法
CN101662125B (zh) 对列阵器件进行光束快轴压缩的方法
CN221860057U (zh) 一种标准气体的制备装置及监测系统
CN101071931A (zh) 大功率铥激光器
US20210292702A1 (en) Live cell imaging chamber and measurement thereof
US20090074619A1 (en) Device for measuring total organic carbon
CN119643519A (zh) 一种混合式双层螺旋反应室、单层螺旋捕集阱和大气过氧化氢浓度的测量装置
CN211676336U (zh) 一种制药浓缩装置
KR20190113174A (ko) 전해질 농도 측정 장치를 구비한 레독스 흐름 전지

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20120111