KR20110109901A - 감광성 수지 조성물 - Google Patents

감광성 수지 조성물 Download PDF

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Publication number
KR20110109901A
KR20110109901A KR1020110025830A KR20110025830A KR20110109901A KR 20110109901 A KR20110109901 A KR 20110109901A KR 1020110025830 A KR1020110025830 A KR 1020110025830A KR 20110025830 A KR20110025830 A KR 20110025830A KR 20110109901 A KR20110109901 A KR 20110109901A
Authority
KR
South Korea
Prior art keywords
group
meth
compound
photosensitive resin
acrylate
Prior art date
Application number
KR1020110025830A
Other languages
English (en)
Korean (ko)
Inventor
류이치 마츠우라
가츠하루 이노우에
Original Assignee
스미또모 가가꾸 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스미또모 가가꾸 가부시끼가이샤 filed Critical 스미또모 가가꾸 가부시끼가이샤
Publication of KR20110109901A publication Critical patent/KR20110109901A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020110025830A 2010-03-30 2011-03-23 감광성 수지 조성물 KR20110109901A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010078696A JP2011209594A (ja) 2010-03-30 2010-03-30 感光性樹脂組成物
JPJP-P-2010-078696 2010-03-30

Publications (1)

Publication Number Publication Date
KR20110109901A true KR20110109901A (ko) 2011-10-06

Family

ID=44696583

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110025830A KR20110109901A (ko) 2010-03-30 2011-03-23 감광성 수지 조성물

Country Status (4)

Country Link
JP (1) JP2011209594A (zh)
KR (1) KR20110109901A (zh)
CN (1) CN102207679A (zh)
TW (1) TWI505029B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130086171A (ko) * 2012-01-23 2013-07-31 스미또모 가가꾸 가부시키가이샤 감광성 수지 조성물

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5981167B2 (ja) * 2011-03-24 2016-08-31 東京応化工業株式会社 感光性樹脂組成物
JP6123187B2 (ja) * 2012-08-21 2017-05-10 住友化学株式会社 感光性樹脂組成物
CN104756010B (zh) * 2012-10-26 2019-07-30 富士胶片株式会社 感光性树脂组合物、硬化物及其制造方法、树脂图案制造方法、硬化膜及其应用
KR102145934B1 (ko) * 2014-05-20 2020-08-19 동우 화인켐 주식회사 광경화 패턴의 형성 방법
KR101612673B1 (ko) * 2015-03-11 2016-04-14 동우 화인켐 주식회사 네가티브형 감광성 수지 조성물
KR102054430B1 (ko) * 2015-12-03 2019-12-10 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
CN114466874B (zh) * 2019-10-03 2023-10-20 株式会社大赛璐 共聚物、固化性树脂组合物以及固化物

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4232410B2 (ja) * 2002-08-19 2009-03-04 チッソ株式会社 光硬化性樹脂組成物およびそれを用いた表示素子
JP4821206B2 (ja) * 2005-07-29 2011-11-24 東レ株式会社 カラーフィルター用感光性着色組成物、およびカラーフィルター
JP4736692B2 (ja) * 2005-10-12 2011-07-27 凸版印刷株式会社 感光性赤色着色組成物、それを用いたカラーフィルタ基板、および半透過型液晶表示装置
JP4788485B2 (ja) * 2006-06-13 2011-10-05 住友化学株式会社 着色感光性樹脂組成物
JP5205940B2 (ja) * 2006-12-22 2013-06-05 住友化学株式会社 感光性樹脂組成物
JP4935349B2 (ja) * 2006-12-28 2012-05-23 住友化学株式会社 感光性樹脂組成物
JP5051371B2 (ja) * 2007-11-26 2012-10-17 Ｊｓｒ株式会社 感放射線性樹脂組成物、液晶表示素子のスペーサーおよび保護膜ならびに液晶表示素子
JP2009134078A (ja) * 2007-11-30 2009-06-18 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP5233379B2 (ja) * 2008-04-11 2013-07-10 住友化学株式会社 硬化性樹脂組成物
TWI455984B (zh) * 2008-05-30 2014-10-11 Sumitomo Chemical Co 著色硬化性組成物
JP5187018B2 (ja) * 2008-06-18 2013-04-24 凸版印刷株式会社 感光性着色組成物及びカラーフィルタ基板及び半透過型液晶表示装置
JP2010026362A (ja) * 2008-07-23 2010-02-04 Toyo Ink Mfg Co Ltd 半透過型液晶表示装置のカラ−フィルタ用感光性着色組成物、それを用いたカラ−フィルタの製造方法、該方法で製造されたカラ−フィルタ、及び半透過型液晶表示装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130086171A (ko) * 2012-01-23 2013-07-31 스미또모 가가꾸 가부시키가이샤 감광성 수지 조성물

Also Published As

Publication number Publication date
JP2011209594A (ja) 2011-10-20
TWI505029B (zh) 2015-10-21
TW201202845A (en) 2012-01-16
CN102207679A (zh) 2011-10-05

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E902 Notification of reason for refusal
E601 Decision to refuse application