KR20110109809A - 미세 가공체 및 그 제조 방법과 에칭 장치 - Google Patents
미세 가공체 및 그 제조 방법과 에칭 장치 Download PDFInfo
- Publication number
- KR20110109809A KR20110109809A KR1020107018855A KR20107018855A KR20110109809A KR 20110109809 A KR20110109809 A KR 20110109809A KR 1020107018855 A KR1020107018855 A KR 1020107018855A KR 20107018855 A KR20107018855 A KR 20107018855A KR 20110109809 A KR20110109809 A KR 20110109809A
- Authority
- KR
- South Korea
- Prior art keywords
- disk
- shape
- etching
- resist layer
- optical element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000005977 Ethylene Substances 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Liquid Crystal (AREA)
- Micromachines (AREA)
- Weting (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008335102A JP4596072B2 (ja) | 2008-12-26 | 2008-12-26 | 微細加工体の製造方法、およびエッチング装置 |
| JPJP-P-2008-335102 | 2008-12-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20110109809A true KR20110109809A (ko) | 2011-10-06 |
Family
ID=42287795
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020107018855A Withdrawn KR20110109809A (ko) | 2008-12-26 | 2009-12-17 | 미세 가공체 및 그 제조 방법과 에칭 장치 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20110249338A1 (https=) |
| JP (1) | JP4596072B2 (https=) |
| KR (1) | KR20110109809A (https=) |
| CN (1) | CN102084272B (https=) |
| RU (1) | RU2457518C2 (https=) |
| TW (1) | TWI425507B (https=) |
| WO (1) | WO2010074190A1 (https=) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120135353A1 (en) * | 2009-07-03 | 2012-05-31 | Hoya Corporation | Functionally gradient inorganic resist, substrate with functionally gradient inorganic resist, cylindrical base material with functionally gradient inorganic resist, method for forming functionally gradient inorganic resist and method for forming fine pattern, and inorganic resist and method for forming the same |
| JP2011002853A (ja) * | 2010-09-21 | 2011-01-06 | Sony Corp | 微細加工体の製造方法、およびエッチング装置 |
| RU2013116970A (ru) * | 2010-10-22 | 2014-10-20 | Сони Корпорейшн | Подложка со схемой, способ ее производства, устройство ввода информации и устройство отображения |
| TWI577523B (zh) | 2011-06-17 | 2017-04-11 | 三菱麗陽股份有限公司 | 表面具有凹凸結構的模具、光學物品、其製造方法、面發光體用透明基材及面發光體 |
| US20150192702A1 (en) | 2012-11-16 | 2015-07-09 | Nalux Co., Ltd. | Mold, optical element and method for manufacturing the same |
| JP6107131B2 (ja) * | 2012-12-27 | 2017-04-05 | デクセリアルズ株式会社 | ナノ構造体及びその作製方法 |
| JP5633617B1 (ja) * | 2013-09-27 | 2014-12-03 | 大日本印刷株式会社 | 反射防止物品、画像表示装置、反射防止物品の製造用金型、反射防止物品の製造方法及び反射防止物品の製造用金型の製造方法 |
| JP5848320B2 (ja) | 2013-12-20 | 2016-01-27 | デクセリアルズ株式会社 | 円筒基材、原盤、及び原盤の製造方法 |
| JP6074560B2 (ja) * | 2014-03-21 | 2017-02-08 | ナルックス株式会社 | 光学素子の製造方法及び光学素子用成型型の製造方法 |
| JP2015197560A (ja) * | 2014-03-31 | 2015-11-09 | ソニー株式会社 | 光学素子、原盤およびその製造方法、ならびに撮像装置 |
| JP6818479B2 (ja) | 2016-09-16 | 2021-01-20 | デクセリアルズ株式会社 | 原盤の製造方法 |
| JP7261685B2 (ja) * | 2019-07-30 | 2023-04-20 | 住友化学株式会社 | 構造体の製造方法 |
| JP7091438B2 (ja) * | 2020-12-25 | 2022-06-27 | デクセリアルズ株式会社 | 原盤、および転写物 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11121901A (ja) * | 1997-08-11 | 1999-04-30 | Mitsui Chem Inc | 回路基板の製造方法 |
| JP2000121802A (ja) * | 1998-10-21 | 2000-04-28 | Alps Electric Co Ltd | 反射防止フィルムおよびその製造方法ならびに画像表示装置 |
| JP2001023972A (ja) * | 1999-07-10 | 2001-01-26 | Nihon Ceratec Co Ltd | プラズマ処理装置 |
| JP4218372B2 (ja) * | 2003-03-06 | 2009-02-04 | コニカミノルタオプト株式会社 | 光学素子用金型の製造方法 |
| JP2004361635A (ja) * | 2003-06-04 | 2004-12-24 | Alps Electric Co Ltd | 曲面微細構造の形成方法 |
| EP1679532A1 (en) * | 2003-10-29 | 2006-07-12 | Matsushita Electric Industrial Co., Ltd. | Optical element having antireflection structure, and method for producing optical element having antireflection structure |
| US20070144700A1 (en) * | 2004-03-25 | 2007-06-28 | Sanyo Electric Co., Ltd. | Production method of curved-surface metal mold having fine uneven structure and production method of optical element using this metal mold |
| US7704402B2 (en) * | 2004-10-27 | 2010-04-27 | Nikon Corporation | Optical element manufacturing method, optical element, Nipkow disk, confocal optical system and 3-D measurement device |
| KR100893251B1 (ko) * | 2004-12-03 | 2009-04-17 | 샤프 가부시키가이샤 | 반사 방지재, 광학 소자, 및 표시 장치 및 스탬퍼의 제조방법 및 스탬퍼를 이용한 반사 방지재의 제조 방법 |
| JP4539657B2 (ja) * | 2007-01-18 | 2010-09-08 | ソニー株式会社 | 反射防止用光学素子 |
| JP2008226340A (ja) * | 2007-03-12 | 2008-09-25 | Victor Co Of Japan Ltd | 光ディスク用原盤の製造方法及び光ディスク |
| JP2008256838A (ja) * | 2007-04-03 | 2008-10-23 | Canon Inc | レチクル及びレチクルの製造方法 |
| JP4935513B2 (ja) * | 2007-06-06 | 2012-05-23 | ソニー株式会社 | 光学素子およびその製造方法、ならびに光学素子作製用複製基板およびその製造方法 |
-
2008
- 2008-12-26 JP JP2008335102A patent/JP4596072B2/ja not_active Expired - Fee Related
-
2009
- 2009-12-17 RU RU2010135583/28A patent/RU2457518C2/ru not_active IP Right Cessation
- 2009-12-17 KR KR1020107018855A patent/KR20110109809A/ko not_active Withdrawn
- 2009-12-17 US US12/919,666 patent/US20110249338A1/en not_active Abandoned
- 2009-12-17 WO PCT/JP2009/071520 patent/WO2010074190A1/ja not_active Ceased
- 2009-12-17 CN CN200980108705.2A patent/CN102084272B/zh not_active Expired - Fee Related
- 2009-12-23 TW TW098144568A patent/TWI425507B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| WO2010074190A1 (ja) | 2010-07-01 |
| RU2457518C2 (ru) | 2012-07-27 |
| TW201040959A (en) | 2010-11-16 |
| RU2010135583A (ru) | 2012-02-27 |
| JP4596072B2 (ja) | 2010-12-08 |
| CN102084272A (zh) | 2011-06-01 |
| JP2010156843A (ja) | 2010-07-15 |
| US20110249338A1 (en) | 2011-10-13 |
| CN102084272B (zh) | 2014-06-18 |
| TWI425507B (zh) | 2014-02-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20100825 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |