CN102084272B - 微加工部件的制作方法 - Google Patents

微加工部件的制作方法 Download PDF

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Publication number
CN102084272B
CN102084272B CN200980108705.2A CN200980108705A CN102084272B CN 102084272 B CN102084272 B CN 102084272B CN 200980108705 A CN200980108705 A CN 200980108705A CN 102084272 B CN102084272 B CN 102084272B
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CN
China
Prior art keywords
stamper
shape
optical element
resist layer
electrode
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Expired - Fee Related
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CN200980108705.2A
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English (en)
Chinese (zh)
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CN102084272A (zh
Inventor
远藤惣铭
林部和弥
清水浩一郎
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Sony Corp
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Sony Corp
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Publication of CN102084272A publication Critical patent/CN102084272A/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Liquid Crystal (AREA)
  • Micromachines (AREA)
  • Weting (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
CN200980108705.2A 2008-12-26 2009-12-17 微加工部件的制作方法 Expired - Fee Related CN102084272B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008-335102 2008-12-26
JP2008335102A JP4596072B2 (ja) 2008-12-26 2008-12-26 微細加工体の製造方法、およびエッチング装置
PCT/JP2009/071520 WO2010074190A1 (ja) 2008-12-26 2009-12-17 微細加工体、およびその製造方法、ならびにエッチング装置

Publications (2)

Publication Number Publication Date
CN102084272A CN102084272A (zh) 2011-06-01
CN102084272B true CN102084272B (zh) 2014-06-18

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Family Applications (1)

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CN200980108705.2A Expired - Fee Related CN102084272B (zh) 2008-12-26 2009-12-17 微加工部件的制作方法

Country Status (7)

Country Link
US (1) US20110249338A1 (https=)
JP (1) JP4596072B2 (https=)
KR (1) KR20110109809A (https=)
CN (1) CN102084272B (https=)
RU (1) RU2457518C2 (https=)
TW (1) TWI425507B (https=)
WO (1) WO2010074190A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120135353A1 (en) * 2009-07-03 2012-05-31 Hoya Corporation Functionally gradient inorganic resist, substrate with functionally gradient inorganic resist, cylindrical base material with functionally gradient inorganic resist, method for forming functionally gradient inorganic resist and method for forming fine pattern, and inorganic resist and method for forming the same
JP2011002853A (ja) * 2010-09-21 2011-01-06 Sony Corp 微細加工体の製造方法、およびエッチング装置
RU2013116970A (ru) * 2010-10-22 2014-10-20 Сони Корпорейшн Подложка со схемой, способ ее производства, устройство ввода информации и устройство отображения
TWI577523B (zh) 2011-06-17 2017-04-11 三菱麗陽股份有限公司 表面具有凹凸結構的模具、光學物品、其製造方法、面發光體用透明基材及面發光體
US20150192702A1 (en) 2012-11-16 2015-07-09 Nalux Co., Ltd. Mold, optical element and method for manufacturing the same
JP6107131B2 (ja) * 2012-12-27 2017-04-05 デクセリアルズ株式会社 ナノ構造体及びその作製方法
JP5633617B1 (ja) * 2013-09-27 2014-12-03 大日本印刷株式会社 反射防止物品、画像表示装置、反射防止物品の製造用金型、反射防止物品の製造方法及び反射防止物品の製造用金型の製造方法
JP5848320B2 (ja) 2013-12-20 2016-01-27 デクセリアルズ株式会社 円筒基材、原盤、及び原盤の製造方法
JP6074560B2 (ja) * 2014-03-21 2017-02-08 ナルックス株式会社 光学素子の製造方法及び光学素子用成型型の製造方法
JP2015197560A (ja) * 2014-03-31 2015-11-09 ソニー株式会社 光学素子、原盤およびその製造方法、ならびに撮像装置
JP6818479B2 (ja) 2016-09-16 2021-01-20 デクセリアルズ株式会社 原盤の製造方法
JP7261685B2 (ja) * 2019-07-30 2023-04-20 住友化学株式会社 構造体の製造方法
JP7091438B2 (ja) * 2020-12-25 2022-06-27 デクセリアルズ株式会社 原盤、および転写物

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JP2004268331A (ja) * 2003-03-06 2004-09-30 Minolta Co Ltd 光学素子用金型およびその金型製造方法
CN1573366A (zh) * 2003-06-04 2005-02-02 阿尔卑斯电气株式会社 曲面微细结构的形成方法
CN1956829A (zh) * 2004-03-25 2007-05-02 三洋电机株式会社 曲面模具的制造方法及使用该模具的光学元件的制造方法
CN101048676A (zh) * 2004-10-27 2007-10-03 株式会社尼康 光学元件制造方法、光学元件、尼普科夫盘、共焦光学系统以及三维测量装置
CN101320104A (zh) * 2007-06-06 2008-12-10 索尼株式会社 光学元件及制造方法、形成光学元件的复制基板及制造方法

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JPH11121901A (ja) * 1997-08-11 1999-04-30 Mitsui Chem Inc 回路基板の製造方法
JP2000121802A (ja) * 1998-10-21 2000-04-28 Alps Electric Co Ltd 反射防止フィルムおよびその製造方法ならびに画像表示装置
JP2001023972A (ja) * 1999-07-10 2001-01-26 Nihon Ceratec Co Ltd プラズマ処理装置
EP1679532A1 (en) * 2003-10-29 2006-07-12 Matsushita Electric Industrial Co., Ltd. Optical element having antireflection structure, and method for producing optical element having antireflection structure
KR100893251B1 (ko) * 2004-12-03 2009-04-17 샤프 가부시키가이샤 반사 방지재, 광학 소자, 및 표시 장치 및 스탬퍼의 제조방법 및 스탬퍼를 이용한 반사 방지재의 제조 방법
JP4539657B2 (ja) * 2007-01-18 2010-09-08 ソニー株式会社 反射防止用光学素子
JP2008226340A (ja) * 2007-03-12 2008-09-25 Victor Co Of Japan Ltd 光ディスク用原盤の製造方法及び光ディスク
JP2008256838A (ja) * 2007-04-03 2008-10-23 Canon Inc レチクル及びレチクルの製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004268331A (ja) * 2003-03-06 2004-09-30 Minolta Co Ltd 光学素子用金型およびその金型製造方法
CN1573366A (zh) * 2003-06-04 2005-02-02 阿尔卑斯电气株式会社 曲面微细结构的形成方法
CN1956829A (zh) * 2004-03-25 2007-05-02 三洋电机株式会社 曲面模具的制造方法及使用该模具的光学元件的制造方法
CN101048676A (zh) * 2004-10-27 2007-10-03 株式会社尼康 光学元件制造方法、光学元件、尼普科夫盘、共焦光学系统以及三维测量装置
CN101320104A (zh) * 2007-06-06 2008-12-10 索尼株式会社 光学元件及制造方法、形成光学元件的复制基板及制造方法

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* Cited by examiner, † Cited by third party
Title
JP特開2001-23972A 2001.01.26
JP特開2004-268331A 2004.09.30

Also Published As

Publication number Publication date
WO2010074190A1 (ja) 2010-07-01
RU2457518C2 (ru) 2012-07-27
TW201040959A (en) 2010-11-16
RU2010135583A (ru) 2012-02-27
JP4596072B2 (ja) 2010-12-08
CN102084272A (zh) 2011-06-01
JP2010156843A (ja) 2010-07-15
KR20110109809A (ko) 2011-10-06
US20110249338A1 (en) 2011-10-13
TWI425507B (zh) 2014-02-01

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