KR20110074451A - 감광성 조성물, 하드 코트재, 및 화상 표시 장치 - Google Patents

감광성 조성물, 하드 코트재, 및 화상 표시 장치 Download PDF

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Publication number
KR20110074451A
KR20110074451A KR1020100129736A KR20100129736A KR20110074451A KR 20110074451 A KR20110074451 A KR 20110074451A KR 1020100129736 A KR1020100129736 A KR 1020100129736A KR 20100129736 A KR20100129736 A KR 20100129736A KR 20110074451 A KR20110074451 A KR 20110074451A
Authority
KR
South Korea
Prior art keywords
polymeric compound
photosensitive composition
hard coat
group
compound
Prior art date
Application number
KR1020100129736A
Other languages
English (en)
Korean (ko)
Inventor
아야 모모자와
도모유키 이노우에
Original Assignee
도오꾜오까고오교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도오꾜오까고오교 가부시끼가이샤 filed Critical 도오꾜오까고오교 가부시끼가이샤
Publication of KR20110074451A publication Critical patent/KR20110074451A/ko

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/61Additives non-macromolecular inorganic
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020100129736A 2009-12-24 2010-12-17 감광성 조성물, 하드 코트재, 및 화상 표시 장치 KR20110074451A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2009-291931 2009-12-24
JP2009291931A JP2011132322A (ja) 2009-12-24 2009-12-24 感光性組成物、ハードコート材、及び画像表示装置

Publications (1)

Publication Number Publication Date
KR20110074451A true KR20110074451A (ko) 2011-06-30

Family

ID=44173955

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020100129736A KR20110074451A (ko) 2009-12-24 2010-12-17 감광성 조성물, 하드 코트재, 및 화상 표시 장치

Country Status (4)

Country Link
JP (1) JP2011132322A (ja)
KR (1) KR20110074451A (ja)
CN (1) CN102109762A (ja)
TW (1) TW201122725A (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5789183B2 (ja) * 2010-12-17 2015-10-07 日立マクセル株式会社 インクジェット記録用プライマー
CN103781804B (zh) * 2011-08-11 2015-09-09 日本曹达株式会社 有机无机复合体及其形成用组合物
CN103013222B (zh) * 2011-09-27 2014-12-24 中钞特种防伪科技有限公司 紫外光固化油墨及其用途与制备方法
KR20170102373A (ko) 2012-07-10 2017-09-08 닛뽕소다 가부시키가이샤 유기 무기 복합체 및 그 형성용 조성물

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002060529A (ja) * 2000-08-22 2002-02-26 Fuji Photo Film Co Ltd 高密着ハードコートフィルム
AU2003302526A1 (en) * 2002-12-02 2004-06-23 Tokyo Ohka Kogyo Co., Ltd. Composition for forming antireflection coating
JP2006003570A (ja) * 2004-06-16 2006-01-05 Tokyo Ohka Kogyo Co Ltd 印刷版製造用感光性組成物、並びに、これを用いた感光性印刷原版積層体および印刷版
US7268172B2 (en) * 2004-10-15 2007-09-11 Bayer Materialscience Llc Radiation curable compositions
JP4514049B2 (ja) * 2005-08-01 2010-07-28 日本化薬株式会社 感光性樹脂組成物並びにその硬化物
JP5396732B2 (ja) * 2008-03-27 2014-01-22 コニカミノルタ株式会社 ハードコートフィルム

Also Published As

Publication number Publication date
CN102109762A (zh) 2011-06-29
JP2011132322A (ja) 2011-07-07
TW201122725A (en) 2011-07-01

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