KR20110010014A - 반도체 패키지의 제조 방법 - Google Patents
반도체 패키지의 제조 방법 Download PDFInfo
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- KR20110010014A KR20110010014A KR1020090067511A KR20090067511A KR20110010014A KR 20110010014 A KR20110010014 A KR 20110010014A KR 1020090067511 A KR1020090067511 A KR 1020090067511A KR 20090067511 A KR20090067511 A KR 20090067511A KR 20110010014 A KR20110010014 A KR 20110010014A
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- semiconductor
- carrier substrates
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- forming
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 97
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 102
- 239000000853 adhesive Substances 0.000 claims abstract description 21
- 230000001070 adhesive effect Effects 0.000 claims abstract description 21
- 239000010410 layer Substances 0.000 claims description 58
- 238000000034 method Methods 0.000 claims description 34
- 229910000679 solder Inorganic materials 0.000 claims description 18
- 239000012212 insulator Substances 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 8
- 239000011229 interlayer Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 claims description 4
- 230000005855 radiation Effects 0.000 claims description 2
- 230000008054 signal transmission Effects 0.000 abstract description 3
- 239000012779 reinforcing material Substances 0.000 description 6
- 239000012792 core layer Substances 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
- H01L21/0231—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment treatment by exposure to electromagnetic radiation, e.g. UV light
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/7806—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices involving the separation of the active layers from a substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Electromagnetism (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
Claims (8)
- 접착부재를 사이에 두고 서로 대향하도록 접착된 제 1 및 제 2 캐리어 기판을 제공하는 단계;상기 제 1 및 제 2 캐리어 기판의 각 일측면상에 제 1 및 제 2 반도체칩을 각각 실장하는 단계;상기 제 1 및 제 2 반도체칩을 포함하는 상기 제 1 및 제 2 캐리어 기판의 일측면 상에 상기 제 1 및 제 2 반도체칩과 전기적으로 연결된 적어도 한층이상의 제 1 및 제 2 빌드업층을 각각 형성하는 단계; 및상기 접착부재로부터 상기 제 1 반도체칩과 제 1 빌드업층을 구비한 상기 제 1 캐리어 기판과 상기 제 2 반도체칩과 제 2 빌드업층을 구비한 제 2 캐리어 기판을 각각 분리하는 단계;를 포함하는 반도체 패키지의 제조 방법.
- 제 1 항에 있어서,상기 제 1 및 제 2 반도체칩을 실장하는 단계 이전에,상기 제 1 및 제 2 캐리어 기판의 각 일측면상에 개구부를 갖는 제 1 및 제 2 절연체를 각각 형성하는 단계를 더 포함하는 반도체 패키지의 제조 방법.
- 제 1 항에 있어서,상기 제 1 및 제 2 반도체칩을 실장하는 단계 이후에,상기 제 1 및 제 2 캐리어 기판의 각 일측면상에 상기 제 1 및 제 2 반도체칩을 노출하는 제 1 및 제 2 절연체를 각각 형성하는 단계를 포함하는 반도체 패키지의 제조 방법.
- 제 1 항에 있어서,상기 제 1 및 제 2 빌드업층을 각각 형성하는 단계와 상기 제 1 및 제 2 캐리어 기판을 분리하는 단계사이에,상기 제 1 및 제 2 빌드업층을 각각 덮는 제 1 및 제 2 솔더레지스트를 형성하는 단계를 더 포함하는 반도체 패키지의 제조 방법.
- 제 4 항에 있어서,상기 제 1 및 제 2 캐리어 기판을 서로 분리하는 단계 이후에,상기 제 1 및 제 2 솔더레지트상에 상기 제 1 및 제 2 빌드업층과 각각 전기적으로 연결된 제 1 및 제 2 솔더볼을 형성하는 단계를 더 포함하는 반도체 패키지의 제조 방법.
- 제 1 항에 있어서,상기 제 1 및 제 2 캐리어 기판을 분리하는 단계는,열처리 또는 UV 조사를 이용하여 상기 접착부재로부터 상기 제 1 및 제 2 캐리어 기판을 각각 분리하는 반도체 패키지의 제조 방법.
- 제 1 항에 있어서,상기 빌드업 공정에서 층간 접속을 위해 각각 일렬로 적층되도록 비아를 형성하는 반도체 패키지의 제조 방법.
- 제 1 항에 있어서,상기 제 1 및 제 2 캐리어 기판은 방열 재질로 이루어진 반도체 패키지의 제조 방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020090067511A KR101015762B1 (ko) | 2009-07-23 | 2009-07-23 | 반도체 패키지의 제조 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090067511A KR101015762B1 (ko) | 2009-07-23 | 2009-07-23 | 반도체 패키지의 제조 방법 |
Publications (2)
Publication Number | Publication Date |
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KR20110010014A true KR20110010014A (ko) | 2011-01-31 |
KR101015762B1 KR101015762B1 (ko) | 2011-02-22 |
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KR1020090067511A KR101015762B1 (ko) | 2009-07-23 | 2009-07-23 | 반도체 패키지의 제조 방법 |
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KR (1) | KR101015762B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101498649B1 (ko) * | 2012-11-30 | 2015-03-04 | 앰코 테크놀로지 코리아 주식회사 | 반도체 장치 및 그 제조 방법 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20200046265A (ko) | 2018-10-24 | 2020-05-07 | 삼성전자주식회사 | 캐리어 기판 및 이를 이용한 패키징 방법 |
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JP3664720B2 (ja) * | 2001-10-31 | 2005-06-29 | 新光電気工業株式会社 | 半導体装置用多層回路基板の製造方法 |
JP4334005B2 (ja) | 2005-12-07 | 2009-09-16 | 新光電気工業株式会社 | 配線基板の製造方法及び電子部品実装構造体の製造方法 |
TWI327363B (en) | 2006-11-17 | 2010-07-11 | Unimicron Technology Corp | Carrier structure for semiconductor chip and method for manufacturing the same |
JP4866268B2 (ja) * | 2007-02-28 | 2012-02-01 | 新光電気工業株式会社 | 配線基板の製造方法及び電子部品装置の製造方法 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101498649B1 (ko) * | 2012-11-30 | 2015-03-04 | 앰코 테크놀로지 코리아 주식회사 | 반도체 장치 및 그 제조 방법 |
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