KR20100138984A - 열처리 장치 - Google Patents

열처리 장치 Download PDF

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Publication number
KR20100138984A
KR20100138984A KR1020107021779A KR20107021779A KR20100138984A KR 20100138984 A KR20100138984 A KR 20100138984A KR 1020107021779 A KR1020107021779 A KR 1020107021779A KR 20107021779 A KR20107021779 A KR 20107021779A KR 20100138984 A KR20100138984 A KR 20100138984A
Authority
KR
South Korea
Prior art keywords
processing container
heating
irradiation window
processed
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020107021779A
Other languages
English (en)
Korean (ko)
Inventor
신타로 아오야마
고우지 시모무라
센쇼 고바야시
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20100138984A publication Critical patent/KR20100138984A/ko
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection
KR1020107021779A 2008-03-31 2009-03-18 열처리 장치 Ceased KR20100138984A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2008-089069 2008-03-31
JP2008089069A JP5077018B2 (ja) 2008-03-31 2008-03-31 熱処理装置

Publications (1)

Publication Number Publication Date
KR20100138984A true KR20100138984A (ko) 2010-12-31

Family

ID=41135299

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107021779A Ceased KR20100138984A (ko) 2008-03-31 2009-03-18 열처리 장치

Country Status (5)

Country Link
JP (1) JP5077018B2 (https=)
KR (1) KR20100138984A (https=)
CN (1) CN101855708B (https=)
TW (1) TW200949950A (https=)
WO (1) WO2009122913A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101297981B1 (ko) * 2011-10-07 2013-08-23 (주) 예스티 기판의 열처리 장치
KR20220033432A (ko) * 2020-09-09 2022-03-16 가부시키가이샤 스크린 홀딩스 열처리 장치

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5466670B2 (ja) * 2010-10-28 2014-04-09 株式会社日立国際電気 基板処理装置および半導体装置の製造方法
JP5640890B2 (ja) * 2011-05-23 2014-12-17 ウシオ電機株式会社 光照射装置および光照射方法
JP6038503B2 (ja) * 2011-07-01 2016-12-07 株式会社日立国際電気 基板処理装置及び半導体装置の製造方法
JP5964630B2 (ja) * 2012-03-27 2016-08-03 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置
US8785815B2 (en) * 2012-06-22 2014-07-22 Applied Materials, Inc. Aperture control of thermal processing radiation
CN105261576A (zh) * 2014-07-15 2016-01-20 北京北方微电子基地设备工艺研究中心有限责任公司 一种加热腔室及半导体加工设备
US11089657B2 (en) * 2015-03-06 2021-08-10 SCREEN Holdings Co., Ltd. Light-irradiation heat treatment apparatus
JP6518548B2 (ja) * 2015-08-10 2019-05-22 東京応化工業株式会社 紫外線照射装置、レジストパターン形成装置、紫外線照射方法及びレジストパターン形成方法
JP6546512B2 (ja) * 2015-11-04 2019-07-17 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置
CN107706139A (zh) * 2017-11-13 2018-02-16 上海华力微电子有限公司 一种半导体加工机台的温度控制装置
JP7048372B2 (ja) * 2018-03-20 2022-04-05 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置および熱処理方法
KR102737498B1 (ko) 2019-12-13 2024-12-04 삼성전자주식회사 비-접촉식 온도 센서를 가진 공정 설비
CN115064471B (zh) * 2022-08-01 2023-11-28 北京屹唐半导体科技股份有限公司 晶圆的热处理装置
CN115411174A (zh) * 2022-08-30 2022-11-29 三三智能科技(日照)有限公司 一种用于压电薄膜稳定连续退火装置
FR3142757A1 (fr) * 2022-12-05 2024-06-07 Annealsys Four de recuit thermique rapide à uniformité de chauffage améliorée
CN118712105B (zh) * 2024-08-29 2025-02-14 一塔半导体(安徽)有限公司 一种快速热退火装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09270390A (ja) * 1996-03-29 1997-10-14 Dainippon Screen Mfg Co Ltd 基板の光照射式熱処理装置
JPH10321547A (ja) * 1997-05-22 1998-12-04 Kokusai Electric Co Ltd 熱処理装置
JP4200844B2 (ja) * 2003-08-11 2008-12-24 東京エレクトロン株式会社 熱処理装置
JP2006005177A (ja) * 2004-06-17 2006-01-05 Tokyo Electron Ltd 熱処理装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101297981B1 (ko) * 2011-10-07 2013-08-23 (주) 예스티 기판의 열처리 장치
KR20220033432A (ko) * 2020-09-09 2022-03-16 가부시키가이샤 스크린 홀딩스 열처리 장치
US12283498B2 (en) 2020-09-09 2025-04-22 SCREEN Holdings Co., Ltd. Light irradiation type heat treatment apparatus

Also Published As

Publication number Publication date
WO2009122913A1 (ja) 2009-10-08
TW200949950A (en) 2009-12-01
JP5077018B2 (ja) 2012-11-21
CN101855708A (zh) 2010-10-06
CN101855708B (zh) 2012-10-10
JP2009246061A (ja) 2009-10-22

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