KR20100083125A - 간접적 표면 세정 장치 및 방법 - Google Patents

간접적 표면 세정 장치 및 방법 Download PDF

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Publication number
KR20100083125A
KR20100083125A KR1020107005270A KR20107005270A KR20100083125A KR 20100083125 A KR20100083125 A KR 20100083125A KR 1020107005270 A KR1020107005270 A KR 1020107005270A KR 20107005270 A KR20107005270 A KR 20107005270A KR 20100083125 A KR20100083125 A KR 20100083125A
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KR
South Korea
Prior art keywords
substrate
laser
temperature
photomask
cleaning
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Ceased
Application number
KR1020107005270A
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English (en)
Korean (ko)
Inventor
제프리 이. 르끌레르
케네스 길버 뢰슬러
데이비드 브링클리
Original Assignee
레이브 엘엘씨
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Application filed by 레이브 엘엘씨 filed Critical 레이브 엘엘씨
Publication of KR20100083125A publication Critical patent/KR20100083125A/ko
Ceased legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020107005270A 2007-08-09 2008-07-30 간접적 표면 세정 장치 및 방법 Ceased KR20100083125A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US95498907P 2007-08-09 2007-08-09
US60/954,989 2007-08-09
US12/055,178 2008-03-25
US12/055,178 US7993464B2 (en) 2007-08-09 2008-03-25 Apparatus and method for indirect surface cleaning

Publications (1)

Publication Number Publication Date
KR20100083125A true KR20100083125A (ko) 2010-07-21

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107005270A Ceased KR20100083125A (ko) 2007-08-09 2008-07-30 간접적 표면 세정 장치 및 방법

Country Status (5)

Country Link
US (5) US7993464B2 (enExample)
EP (1) EP2178655B1 (enExample)
JP (1) JP5174910B2 (enExample)
KR (1) KR20100083125A (enExample)
WO (1) WO2009020808A1 (enExample)

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CN108160617B (zh) * 2017-12-12 2021-04-30 深圳市华星光电半导体显示技术有限公司 清洁装置
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JP7597993B2 (ja) * 2020-01-21 2024-12-11 横浜ゴム株式会社 加硫用モールドの洗浄方法
CN111940423B (zh) * 2020-08-07 2021-07-13 武汉金顿激光科技有限公司 一种飞机非导电复合涂层的原位激光清洗方法
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Cited By (1)

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Publication number Priority date Publication date Assignee Title
WO2021003288A1 (en) * 2019-07-02 2021-01-07 Entegris, Inc. Methods of using laser energy to remove particles from a surface

Also Published As

Publication number Publication date
WO2009020808A1 (en) 2009-02-12
JP5174910B2 (ja) 2013-04-03
US20130276818A1 (en) 2013-10-24
US20140283873A1 (en) 2014-09-25
EP2178655B1 (en) 2018-09-19
US8293019B2 (en) 2012-10-23
US8986460B2 (en) 2015-03-24
JP2010536066A (ja) 2010-11-25
US20090065024A1 (en) 2009-03-12
US7993464B2 (en) 2011-08-09
US20140069457A1 (en) 2014-03-13
EP2178655A1 (en) 2010-04-28
US8613803B2 (en) 2013-12-24
EP2178655A4 (en) 2014-05-07
US20090038637A1 (en) 2009-02-12
US8741067B2 (en) 2014-06-03

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